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1. 发明申请

US20120051622A1 DETERMINATION METHOD, EXPOSURE METHOD, AND STORAGE MEDIUM 有权
标题翻译：测定方法，曝光方法和储存介质
公开(公告)号：US20120051622A1
公开(公告)日：2012-03-01
申请号：US13217558
申请日：2011-08-25
申请人： Yuichi GYODA , Hiroyuki ISHII , Koji MIKAMI , Youzou FUKAGAWA
发明人： Yuichi GYODA , Hiroyuki ISHII , Koji MIKAMI , Youzou FUKAGAWA
IPC分类号： G06K9/00
CPC分类号： G03F7/70091 , G03F7/705
摘要： The present invention provides a determination method of determining a light intensity distribution to be formed on a pupil plane of an illumination optical system in an exposure apparatus, the method including a step of setting a cutline used to evaluate an image of a pattern of a mask, which is formed on an image plane of a projection optical system, and a target position of the image, and a step of determining an intensity of an element light source such that the position of a midpoint between edges of the image of the pattern of the mask on the cutline from a calculated image comes close to the target position, thereby determining the light intensity distribution.
摘要翻译：本发明提供一种确定在曝光装置中确定在照明光学系统的光瞳平面上形成的光强度分布的方法，该方法包括设置用于评估掩模图案的图像的切割线的步骤，其形成在投影光学系统的图像平面上，以及图像的目标位置，以及确定元件光源的强度的步骤，使得图案的图像的边缘之间的中点的位置来自计算图像的切割线上的掩模接近目标位置，由此确定光强度分布。

2. 发明申请

US20120033194A1 DECISION METHOD AND STORAGE MEDIUM 审中-公开
标题翻译：决策方法和存储介质
公开(公告)号：US20120033194A1
公开(公告)日：2012-02-09
申请号：US13198032
申请日：2011-08-04
申请人： Koji MIKAMI , Yuichi GYODA , Kouichirou TSUJITA , Hiroyuki ISHII
发明人： Koji MIKAMI , Yuichi GYODA , Kouichirou TSUJITA , Hiroyuki ISHII
IPC分类号： G03B27/32
CPC分类号： G03F7/70125 , G03F7/705 , G03F7/70525 , G03F7/70625
摘要： The present invention provides a decision method of causing a computer to decide an exposure condition to be set in an exposure apparatus including an illumination optical system that illuminates a pattern including a plurality of pattern elements, and a projection optical system that projects the pattern onto a substrate, including a step of obtaining a distance between intersections of a first line, used to evaluate dimensions of images of the pattern elements, and contours of the images of the pattern elements by obtaining the image of the pattern formed on the image plane of the projection optical system, and a step of determining whether there exist intersections of a second line, used to evaluate whether the images of the pattern elements are resolved, and the contours of the images of the pattern elements to evaluate whether the images of the pattern elements are resolved.
摘要翻译：本发明提供一种使计算机确定在包括照明包括多个图形元素的图案的照明光学系统的曝光设备中设置的曝光条件的决定方法，以及将图案投影到衬底，包括通过获得形成在图像的图像平面上的图案的图像，获得用于评估图案元素的图像的尺寸的第一行的交点之间的距离和图案元素的图像的轮廓的步骤投影光学系统，以及确定是否存在用于评估图案元素的图像是否被解析的第二行的交叉点以及图案元素的图像的轮廓以评估图案元素的图像的步骤解决了

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