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1. 发明申请

US20130280909A1 METAL CUT PROCESS FLOW 有权
标题翻译：金属切割工艺流程
公开(公告)号：US20130280909A1
公开(公告)日：2013-10-24
申请号：US13451605
申请日：2012-04-20
申请人： Yuan-Hsiang Lung , Kuei-Shun Chen , Meng-Wei Chen , Chia-Ying Lee
发明人： Yuan-Hsiang Lung , Kuei-Shun Chen , Meng-Wei Chen , Chia-Ying Lee
IPC分类号： H01L21/306 , G03F1/70
CPC分类号： H01L21/31144 , G03F1/70 , H01L21/76816
摘要： A method for optimizing masks used for forming conductive features and a method for creating the mask features on an IC device are disclosed. An exemplary embodiment includes receiving a design database including a plurality of conductive features. First and second features suitable for joining are identified from the plurality of conductive features. A joined feature corresponding to the first and the second features is characterized. A cut shape configured to separate the first and second features from the joined feature is also characterized. The joined feature is categorized into a first conductive mask, the cut shape is categorized into a cut mask, and a third feature is categorized into a second conductive mask. The categorized shapes and features of the first conductive mask, the second conductive mask, and the cut mask are provided for manufacturing a mask set corresponding to the categorized shapes and features.
摘要翻译：公开了一种用于优化用于形成导电特征的掩模的方法和用于在IC器件上产生掩模特征的方法。示例性实施例包括接收包括多个导电特征的设计数据库。从多个导电特征中识别适合于接合的第一和第二特征。表征与第一和第二特征对应的连接特征。被配置为将第一和第二特征与接合的特征分离的切割形状也被表征。连接的特征被分类为第一导电掩模，切割形状被分为切割掩模，第三特征被分类为第二导电掩模。提供第一导电掩模，第二导电掩模和切割掩模的分类形状和特征，用于制造对应于分类形状和特征的掩模组。

2. 发明授权

US08850369B2 Metal cut process flow 有权
标题翻译：金属切割工艺流程
公开(公告)号：US08850369B2
公开(公告)日：2014-09-30
申请号：US13451605
申请日：2012-04-20
申请人： Yuan-Hsiang Lung , Kuei-Shun Chen , Meng-Wei Chen , Chia-Ying Lee
发明人： Yuan-Hsiang Lung , Kuei-Shun Chen , Meng-Wei Chen , Chia-Ying Lee
IPC分类号： G06F17/50
CPC分类号： H01L21/31144 , G03F1/70 , H01L21/76816
摘要： A method for optimizing masks used for forming conductive features and a method for creating the mask features on an IC device are disclosed. An exemplary embodiment includes receiving a design database including a plurality of conductive features. First and second features suitable for joining are identified from the plurality of conductive features. A joined feature corresponding to the first and the second features is characterized. A cut shape configured to separate the first and second features from the joined feature is also characterized. The joined feature is categorized into a first conductive mask, the cut shape is categorized into a cut mask, and a third feature is categorized into a second conductive mask. The categorized shapes and features of the first conductive mask, the second conductive mask, and the cut mask are provided for manufacturing a mask set corresponding to the categorized shapes and features.
摘要翻译：公开了一种用于优化用于形成导电特征的掩模的方法和用于在IC器件上产生掩模特征的方法。示例性实施例包括接收包括多个导电特征的设计数据库。从多个导电特征中识别适合于接合的第一和第二特征。表征与第一和第二特征对应的连接特征。被配置为将第一和第二特征与接合的特征分离的切割形状也被表征。连接的特征被分类为第一导电掩模，切割形状被分为切割掩模，第三特征被分类为第二导电掩模。提供第一导电掩模，第二导电掩模和切割掩模的分类形状和特征，用于制造对应于分类形状和特征的掩模组。

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