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    • 1. 发明授权
    • Detachable sponge device for spin-coating machines
    • 可剥离海绵装置用于旋涂机
    • US5868843A
    • 1999-02-09
    • US783103
    • 1997-01-14
    • Yu-Chen YangChang-Chi HuangWen-Ping Yen
    • Yu-Chen YangChang-Chi HuangWen-Ping Yen
    • B05C11/08B05C11/10H01L21/00B05C21/00
    • H01L21/6715B05C11/08B05C11/1039
    • A detachable sponge device for a spin coating machine used to coat a liquid material over a semiconductor wafer is provided. The detachable sponge device is used to prevent the solvent that is jetted on the edge of the wafer from being oversprayed elsewhere on the wafer. The detachable sponge device is composed of a curved mounting piece and a corrugated piece of sponge attached on the curved inner side of the mounting piece. The mounting piece can be detachably mounted on the spin coating machine. The corrugated piece of sponge can absorb splattered particles of solvent from the wafer which can thus be prevented from bouncing back onto the wafer. The planarization of the coating of SOG on the wafer thus will not be affected by splattering particles of the solvent. Excellent results of planarization of SOG or photoresist layers can thus be achieved.
    • 提供了一种用于在半导体晶片上涂覆液体材料的旋涂机的可拆卸海绵装置。 可拆卸的海绵装置用于防止喷射在晶片边缘上的溶剂在晶片上的其他地方被过度喷涂。 可拆卸海绵装置由安装在安装件的弯曲内侧上的弯曲安装件和波纹状海绵构成。 安装件可拆卸地安装在旋涂机上。 波纹状海绵片可以从晶片吸收飞溅的溶剂颗粒,从而可以防止其从反弹回到晶片上。 因此,晶片上的SOG涂层的平面化不会受到溶剂的飞溅颗粒的影响。 因此可以实现SOG或光致抗蚀剂层的平坦化的优异结果。
    • 3. 发明授权
    • In-situ pre-PECVD oxide deposition process for treating SOG
    • 用于处理SOG的原位预-PECVD氧化物沉积工艺
    • US5861345A
    • 1999-01-19
    • US924904
    • 1997-09-08
    • Chin-hao ChouYu-Chen YangShing-Hsiang Hung
    • Chin-hao ChouYu-Chen YangShing-Hsiang Hung
    • H01L21/3105H01L21/768H01L23/532H01L21/31
    • H01L21/76829H01L21/31051H01L21/76819H01L21/76826H01L21/76828H01L23/5329H01L2924/0002
    • An in situ inter-dielectric process is disclosed for forming multilevel metal structures. The process includes the steps of:(1) forming an SOG layer on an uneven semiconductor surface,(2) treating a surface of the SOG layer with a plasma in a PECVD chamber, and(3) forming a PECVD oxide layer on the treated surface in the same PECVD chamber.The operating parameters for performing the in situ treatment are as follows:______________________________________Gas: N.sub.2 O or C.sub.2 F.sub.6Pressure: 4-6 TorrTemperature: 300-400.degree. C.Power: 200-400 WattsGap: 300-800 milFlow: 500-1500 sccmTime: 5-15 sec______________________________________Thus, the treatment can be performed in the same PECVD chamber used to form a PECVD oxide layer on the treated SOG layer.Furthermore, the SOG layer surface may be oxidized to produce an organic deficient SiO.sub.x layer at the surface of the SOG layer prior to performing the treatment step (2).
    • 公开了用于形成多层金属结构的原位介电过程。 该方法包括以下步骤:(1)在不均匀的半导体表面上形成SOG层,(2)在PECVD室中用等离子体处理SOG层的表面,以及(3)在被处理的层上形成PECVD氧化物层 在同一PECVD室中的表面。 用于进行原位处理的操作参数如下: - 气体:N2O或C2F6 - 压力:4-6乇 - 温度:300-400℃ - 功率:200-400瓦 - 间隙:300-800密耳 - 流量:500-1500sccm - 时间:5-15秒 - 因此,处理可以在用于在经处理的SOG层上形成PECVD氧化物层的相同PECVD室中进行。 此外,在进行处理步骤(2)之前,SOG层表面可以被氧化以在SOG层的表面处产生有机缺陷SiO x层。
    • 5. 发明授权
    • Light-emitting device having a trench in a semiconductor layer
    • 在半导体层中具有沟槽的发光器件
    • US08872204B2
    • 2014-10-28
    • US13152026
    • 2011-06-02
    • Yu-Chen YangLi-Ping JouJui-Hung YehChien-Fu Shen
    • Yu-Chen YangLi-Ping JouJui-Hung YehChien-Fu Shen
    • H01L33/60H01L33/38H01L33/20H01L33/64H01L33/00
    • H01L33/38H01L33/0079H01L33/20H01L33/641H01L2224/48463H01L2933/0083
    • A light-emitting device comprises a substrate, an epitaxial structure formed on the substrate including a first semiconductor layer, a second semiconductor layer, and a light-emitting layer formed between the first semiconductor layer and the second semiconductor layer. A trench is formed in the epitaxial structure to expose a part of side surface of the epitaxial structure and a part of surface of the first semiconductor layer, so that a first conductive structure is formed on the part of surface of the first semiconductor layer in the trench, and a second conductive structure is formed on the second semiconductor layer. The first conductive structure includes a first electrode and a first pad electrically contacted with each other. The second conductive structure includes a second electrode and a second pad electrically contacted with each other. Furthermore, the area of at least one of the first pad and the second pad is between 1.5×104 μm2 and 6.2×104 μm2.
    • 发光器件包括衬底,形成在衬底上的外延结构,包括第一半导体层,第二半导体层和形成在第一半导体层和第二半导体层之间的发光层。 在外延结构中形成沟槽以暴露外延结构的侧面的一部分和第一半导体层的表面的一部分,使得第一导电结构形成在第一半导体层的表面的一部分中 沟槽,并且在第二半导体层上形成第二导电结构。 第一导电结构包括彼此电接触的第一电极和第一焊盘。 第二导电结构包括彼此电接触的第二电极和第二焊盘。 此外,第一焊盘和第二焊盘中的至少一个的面积在1.5×10 4μm2和​​6.2×10 4μm2之间。