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1. 发明授权

US07742149B2 Stage system and lithographic apparatus comprising such a stage system 有权
标题翻译：舞台系统和包括这种舞台系统的光刻设备
公开(公告)号：US07742149B2
公开(公告)日：2010-06-22
申请号：US12155109
申请日：2008-05-29
申请人： Youssef Karel Maria De Vos , Ronald Casper Kunst , Patricia Vreugdewater , Peter Paul Hempenius
发明人： Youssef Karel Maria De Vos , Ronald Casper Kunst , Patricia Vreugdewater , Peter Paul Hempenius
IPC分类号： G03B27/58
CPC分类号： G03F7/70758 , G03F7/70725 , G03F7/70783
摘要： A stage system for a lithographic apparatus includes a stage, an over-determined number of actuators arranged to act on the stage, and an electric power supply configured to provide a current to the actuators, wherein the current is supplied to a coil associated with a first actuator of the actuators and to a coil associated with a second actuator of the actuators.
摘要翻译：用于光刻设备的舞台系统包括舞台，被布置为作用在舞台上的超过数量的致动器以及被配置为向致动器提供电流的电源，其中电流被提供给与致动器的第一致动器和与致动器的第二致动器相关联的线圈。

2. 发明申请

US20080309911A1 Stage system and lithographic apparatus comprising such a stage system 有权
标题翻译：舞台系统和包括这种舞台系统的光刻设备
公开(公告)号：US20080309911A1
公开(公告)日：2008-12-18
申请号：US12155109
申请日：2008-05-29
申请人： Youssef Karel Maria De Vos , Ronald Casper Kunst , Patricia Vreugdewater , Peter Paul Hempenius
发明人： Youssef Karel Maria De Vos , Ronald Casper Kunst , Patricia Vreugdewater , Peter Paul Hempenius
IPC分类号： G03B27/58 , H02K41/00
CPC分类号： G03F7/70758 , G03F7/70725 , G03F7/70783
摘要： A stage system for a lithographic apparatus includes a stage, an over-determined number of actuators arranged to act on the stage, and an electric power supply configured to provide a current to the actuators, wherein the current is supplied to a coil associated with a first actuator of the actuators and to a coil associated with a second actuator of the actuators.
摘要翻译：用于光刻设备的舞台系统包括舞台，被布置为作用在舞台上的超过数量的致动器以及被配置为向致动器提供电流的电源，其中电流被提供给与致动器的第一致动器和与致动器的第二致动器相关联的线圈。

3. 发明授权

US07079226B2 Lithographic actuator mechanism, lithographic apparatus, and device manufacturing method 有权
标题翻译：光刻致动器机构，光刻设备和器件制造方法
公开(公告)号：US07079226B2
公开(公告)日：2006-07-18
申请号：US10797568
申请日：2004-03-11
申请人： Patricia Vreugdewater , Sven Antoin Johan Hol , Henrikus Herman Marie Cox
发明人： Patricia Vreugdewater , Sven Antoin Johan Hol , Henrikus Herman Marie Cox
IPC分类号： G03B27/58 , G03B27/62
CPC分类号： G03F7/70758 , G03F7/70858
摘要： The present invention relates to a Lorentz actuator in the context of a lithographic projection apparatus. The present invention improves the thermal performance of a Lorentz actuator over the prior art by employing a plurality of coils, separated by separation layers of high thermal conductivity material in good thermal contact with a cooling element. In this way, heat flows more quickly from hotspot regions near the center of the coils into the cooling element. According to an embodiment of the invention, the cooling element is arranged to be in line with the separation layers so as to optimize the thermal connection between these two members. It is found that splitting a parent coil into two coils provides a practical balance between improved thermal performance and undesirable increases in volume and complexity.
摘要翻译：本发明涉及在光刻投影装置的上下文中的洛伦兹致动器。本发明通过采用多个线圈来提高洛伦兹致动器的热性能，该多个线圈由与散热元件良好热接触的高热导率材料的分离层隔开。以这种方式，热量从线圈中心附近的热点区域更快地流入冷却元件。根据本发明的实施例，冷却元件布置成与分离层成一直线，以便优化这两个构件之间的热连接。发现将母线圈分成两个线圈提供了改进的热性能和不期望的体积和复杂性增加之间的实际平衡。

4. 发明授权

US07161267B2 Displacement apparatus, litographic apparatus, device manufacturing method, and device manufactured thereby 失效
标题翻译：位移装置，研磨装置，装置制造方法以及由此制造的装置
公开(公告)号：US07161267B2
公开(公告)日：2007-01-09
申请号：US10855962
申请日：2004-05-28
申请人： Sven Antoin Johan Hol , Johan Cornelis Compter , Erik Roelof Loopstra , Patricia Vreugdewater
发明人： Sven Antoin Johan Hol , Johan Cornelis Compter , Erik Roelof Loopstra , Patricia Vreugdewater
IPC分类号： H02K41/025 , H02N15/02 , G03F7/20
CPC分类号： H02K7/09 , H02K41/025 , H02K2201/18 , H02N15/02 , Y10S414/135
摘要： A displacement apparatus comprising a first part and a second part, which can be displaced relative to each other in first and second different directions. The apparatus being suitable for use in a lithographic apparatus for positioning the mask holder with respect to the projection beam and for positioning the wafer substrate table with respect to the patterned beam. The first part comprises a first and second coil system in which an alternating current is provided by a power supply. The second part comprises a conductive platen which is disposed in a zone in which a magnetic field is induced when power is supplied to the coil systems. The coil system and platen are arranged with respect to each other so that when currents are passed through the coils, a magnetic field induced in the platen causes displacement between the platen and the coils in the first and second different directions.
摘要翻译：一种位移设备，包括可在第一和第二不同方向上相对于彼此移位的第一部分和第二部分。该设备适用于光刻设备中，用于相对于投影光束定位掩模保持器并且相对于图案化的光束定位晶片衬底台。第一部分包括第一和第二线圈系统，其中交流电由电源提供。第二部分包括导电台板，该导电台板设置在向线圈系统供电时引起磁场的区域。线圈系统和压板相对于彼此布置，使得当电流通过线圈时，在压板中感应的磁场引起压板和线圈在第一和第二不同方向上的位移。

5. 发明授权

US07145269B2 Lithographic apparatus, Lorentz actuator, and device manufacturing method 有权
标题翻译：光刻设备，洛伦兹致动器和器件制造方法
公开(公告)号：US07145269B2
公开(公告)日：2006-12-05
申请号：US10796291
申请日：2004-03-10
申请人： Sven Antoin Johan Hol , Henrikus Herman Marie Cox , Hernes Jacobs , Patricia Vreugdewater , Koen Jacobus Johannes Marie Zaal
发明人： Sven Antoin Johan Hol , Henrikus Herman Marie Cox , Hernes Jacobs , Patricia Vreugdewater , Koen Jacobus Johannes Marie Zaal
IPC分类号： H02K41/00
CPC分类号： G03F7/70758 , G03F7/70941
摘要： A lithographic apparatus comprising a highly effective Lorentz actuator, is presented. The Lorentz actuator comprises a main magnet system and a subsidiary magnet system arranged in Halbach configuration, an electrically conductive element for producing a force via the interaction of an electric current carried by the electrically conductive element and a resulting field of the first and second magnetic field generated by the main and subsidiary magnet system, respectively. The actuator further comprises a magnetic element extending substantially between outer sides of the first and second magnet system subassemblies. The magnetic element guides a portion of the second, subsidiary field between the first and second magnet system subassemblies.
摘要翻译：提出了包括高效洛伦兹致动器的光刻设备。洛伦兹致动器包括以Halbach构造布置的主磁体系统和辅助磁体系统，用于通过由导电元件承载的电流和第一和第二磁场的所得场的相互作用产生力的导电元件分别由主磁铁系统产生。致动器还包括基本上在第一和第二磁体系统子组件的外侧之间延伸的磁性元件。磁性元件引导第一和第二磁体系统子组件之间的第二辅助磁场的一部分。

6. 发明申请

US20050061626A1 Displacement apparatus, litographic apparatus, device manufacturing method, and device manufactured thereby 失效
标题翻译：位移装置，研磨装置，装置制造方法以及由此制造的装置
公开(公告)号：US20050061626A1
公开(公告)日：2005-03-24
申请号：US10855962
申请日：2004-05-28
申请人： Sven Hol , Johan Compter , Erik Loopstra , Patricia Vreugdewater
发明人： Sven Hol , Johan Compter , Erik Loopstra , Patricia Vreugdewater
IPC分类号： H01L21/027 , H02K7/09 , H02K41/025 , H02N15/02 , H02P25/06 , G03F7/20
CPC分类号： H02K7/09 , H02K41/025 , H02K2201/18 , H02N15/02 , Y10S414/135
摘要： A displacement apparatus comprising a first part and a second part, which can be displaced relative to each other in first and second different directions. The apparatus being suitable for use in a lithographic apparatus for positioning the mask holder with respect to the projection beam and for positioning the wafer substrate table with respect to the patterned beam. The first part comprises a first and second coil system in which an alternating current is provided by a power supply. The second part comprises a conductive platen which is disposed in a zone in which a magnetic field is induced when power is supplied to the coil systems. The coil system and platen are arranged with respect to each other so that when currents are passed through the coils, a magnetic field induced in the platen causes displacement between the platen and the coils in the first and second different directions.
摘要翻译：一种位移设备，包括可在第一和第二不同方向上相对于彼此移位的第一部分和第二部分。该设备适用于光刻设备中，用于相对于投影光束定位掩模保持器并且相对于图案化的光束定位晶片衬底台。第一部分包括第一和第二线圈系统，其中交流电由电源提供。第二部分包括导电台板，该导电台板设置在向线圈系统供电时引起磁场的区域。线圈系统和压板相对于彼此布置，使得当电流通过线圈时，在压板中感应的磁场引起压板和线圈在第一和第二不同方向上的位移。

7. 发明申请

US20050140326A1 Positioning system and positioning method 有权
标题翻译：定位系统及定位方法
公开(公告)号：US20050140326A1
公开(公告)日：2005-06-30
申请号：US10969235
申请日：2004-10-21
申请人： Martijn Houkes , Henrikus Cox , Ramidin Kamidin , Patricia Vreugdewater
发明人： Martijn Houkes , Henrikus Cox , Ramidin Kamidin , Patricia Vreugdewater
IPC分类号： G03F9/00 , G03F7/20 , G05D3/00 , H01L21/027 , H01L21/68 , G05D23/275
CPC分类号： G03F7/70758 , G05B2219/45031
摘要： A positioning system for moving an object to a target position is presented. In an embodiment, the system includes a first actuator configured to exert a force on the object in a first direction in response to a control current, the actuator having an actuator gain and the generated force being a function of the control current and the actuator gain, the actuator including a magnet configured to induce a magnetic field; and a coil arranged in the magnetic field, the magnet and the coil being movable relative to each other. The system also includes a power supply configured to supply the control current to the actuator in response to a control signal; and a control system configured to control the force generated by the actuator by supplying the control signal to the power supply, the control signal being adapted to the actuator gain, the gain being predetermined as a function of a parameter.
摘要翻译：提出了一种用于将物体移动到目标位置的定位系统。在一个实施例中，系统包括第一致动器，其构造成响应于控制电流在第一方向上对物体施加力，致动器具有致动器增益，并且所产生的力是控制电流和致动器增益的函数所述致动器包括被配置为引起磁场的磁体; 以及布置在所述磁场中的线圈，所述磁体和所述线圈可相对于彼此移动。该系统还包括被配置为响应于控制信号向致动器提供控制电流的电源; 以及控制系统，其被配置为通过将所述控制信号提供给所述电源来控制由所述致动器产生的力，所述控制信号适于所述致动器增益，所述增益作为参数的函数被预先确定。

8. 发明授权

US07224429B2 Lithographic apparatus, device manufacturing method and positioning system 有权
标题翻译：光刻设备，设备制造方法和定位系统
公开(公告)号：US07224429B2
公开(公告)日：2007-05-29
申请号：US10964818
申请日：2004-10-15
申请人： Sven Antoin Johan Hol , Edwin Johan Buis , Patricia Vreugdewater
发明人： Sven Antoin Johan Hol , Edwin Johan Buis , Patricia Vreugdewater
IPC分类号： G03B27/42 , G03B27/58 , G03B27/62 , H02K41/00
CPC分类号： H02N15/00 , G03F7/70758 , G03F7/70941 , H02K11/01 , H02K41/0352
摘要： A lithographic apparatus includes a positioning system including a first and second electromagnetic actuator. Each actuator includes two mutually co-operating electromagnetical elements which are movable with respect to one another due to force acting on the elements of the respective actuator. At least one of the actuators includes a shield configured to shield the actuator from a field generated by the other actuator. In this manner, a disturbance force due to the field is prevented to act on the shielded actuator. The invention also includes a positioning system including such actuators.
摘要翻译：光刻设备包括一个包括第一和第二电磁致动器的定位系统。每个致动器包括两个相互协调的电磁元件，它们由于作用在相应致动器的元件上的力而相对于彼此可移动。致动器中的至少一个包括被配置为将致动器屏蔽到由另一致动器产生的场的屏蔽件。以这种方式，防止由于场引起的干扰力作用在屏蔽的致动器上。本发明还包括一种包括这种致动器的定位系统。

9. 发明授权

US07095485B2 Lithographic linear motor, lithographic apparatus, and device manufacturing method 有权
标题翻译：光刻线性电机，光刻设备和器件制造方法
公开(公告)号：US07095485B2
公开(公告)日：2006-08-22
申请号：US10797662
申请日：2004-03-11
申请人： Sven Antoin Johan Hol , Johan Cornelis Compter , Erik Roelof Loopstra , Patricia Vreugdewater
发明人： Sven Antoin Johan Hol , Johan Cornelis Compter , Erik Roelof Loopstra , Patricia Vreugdewater
IPC分类号： G03B27/58 , G03B27/62 , H02K41/00
CPC分类号： G03F7/70758 , H02K41/031 , H02K2201/18
摘要： A linear motor having a high driving force, high efficiency and low normal force comprises two opposed magnet tracks and an armature comprising three open coil sets. The linear motor may be used to drive a stage, such as, for example, a mask or wafer stage, in a lithographic apparatus.
摘要翻译：具有高驱动力，高效率和低法向力的线性电动机包括两个相对的磁体轨道和包括三个开放线圈组的电枢。线性电动机可以用于在光刻设备中驱动台，例如掩模或晶片台。

10. 发明授权

US07088428B2 Lithographic actuator mechanism, lithographic apparatus, and device manufacturing method 有权
标题翻译：光刻致动器机构，光刻设备和器件制造方法
公开(公告)号：US07088428B2
公开(公告)日：2006-08-08
申请号：US10797618
申请日：2004-03-11
申请人： Sven Antoin Johan Hol , Edwin Johan Buis , Harmen Klaas Van Der Schoot , Patricia Vreugdewater
发明人： Sven Antoin Johan Hol , Edwin Johan Buis , Harmen Klaas Van Der Schoot , Patricia Vreugdewater
IPC分类号： G03B27/42 , G03B27/62 , G03B27/58
CPC分类号： G03F7/70858 , G03F7/70758 , H02K9/22 , H02K41/0356
摘要： Lorentz actuators generate heat due to electrical dissipation in the field coils. As the field through the coils changes, eddy currents are induced in cooling elements leading to undesirable damping forces and heating. The present invention provides an improved design that reduces eddy currents by incorporating slits in the cooling element. Slits are preferably perpendicular to the induced electric field and parallel to each other, and reduce the magnitude of the eddy currents by forcing them to take paths of higher electrical resistance.
摘要翻译：洛仑兹致动器由于场线圈中的电耗而产生热量。当通过线圈的场变化时，在冷却元件中引起涡流，导致不期望的阻尼力和加热。本发明提供了一种改进的设计，其通过在冷却元件中引入狭缝来减少涡流。狭缝优选垂直于感应电场并且彼此平行，并且通过迫使它们采取更高电阻的路径来减小涡流的大小。

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