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1. 发明授权

US06195049B1 Micro-strip patch antenna for transceiver 有权
标题翻译：收发器微带贴片天线
公开(公告)号：US06195049B1
公开(公告)日：2001-02-27
申请号：US09393305
申请日：1999-09-10
申请人： Young-eil Kim , Duck-su Kim , Sung-soo Lee
发明人： Young-eil Kim , Duck-su Kim , Sung-soo Lee
IPC分类号： H01Q138
CPC分类号： H01Q1/243 , H01Q1/38 , H01Q9/0407
摘要： A micro-strip patch antenna for a radiotelephone transceiver includes a dielectric ceramic module for transmission and reception having a first ground plate, just one dielectric ceramic part for synchronizing frequencies, a conductive patch on the dielectric ceramic part for transmitting and receiving electromagnetic waves, transmission and reception power supply terminals projecting from different sides of the conductive patch. The antenna also has printed circuit board having a base, a second ground plate on the base to contact the first, and strip lines formed on the base so as to be adjacent but spaced from to the ground plates. The strip lines take care of impedance matching, and antenna provides for the use of a single channel power supply without modification.
摘要翻译：用于无线电话收发器的微带贴片天线包括用于发射和接收的介电陶瓷模块，其具有第一接地板，仅一个用于同步频率的介电陶瓷部件，用于发射和接收电磁波的电介质陶瓷部件上的导电贴片，传输以及从导电贴片的不同侧突出的接收电源端子。该天线还具有印刷电路板，该印刷电路板具有底座，底座上的第二接地板与第一接触部分以及形成在基座上的带状线相邻，但与接地板间隔开。带状线保护阻抗匹配，天线提供单通道电源的使用而无需修改。

2. 发明申请

US20060134533A1 Method of fabricating one-way transparent optical system 有权
公开(公告)号：US20060134533A1
公开(公告)日：2006-06-22
申请号：US11295636
申请日：2005-12-07
申请人： O-gweon Seo , Kae-dong Back , Chang-seung Lee , Kyu-sik Kim , Duck-su Kim , Byoung-ho Cheong
发明人： O-gweon Seo , Kae-dong Back , Chang-seung Lee , Kyu-sik Kim , Duck-su Kim , Byoung-ho Cheong
IPC分类号： G03F1/00
CPC分类号： G02B5/003 , G02B1/11 , G02B3/0006 , G02B3/0018 , G03C1/00
摘要： A method of fabricating a one-way transparent optical system by which external light is effectively intercepted and internal light passes nearly without loss is provided. The method includes: forming a silver halide on a transparent substrate; aligning a mask in which a predetermined pattern is formed, on the transparent substrate and exposing the silver halide using the mask; developing and fixing the exposed silver halide and forming a plurality of light-absorbing materials on the transparent substrate; and forming protrusion structures having a shape of a convex lens shape for refracting incident light toward a corresponding light-absorbing material of the light-absorbing materials, on the transparent substrate on which the light-absorbing materials are formed.

3. 发明授权

US07625693B2 Method of fabricating one-way transparent optical system 有权
标题翻译：制造单向透明光学系统的方法
公开(公告)号：US07625693B2
公开(公告)日：2009-12-01
申请号：US11295636
申请日：2005-12-07
申请人： O-gweon Seo , Kae-dong Back , Chang-seung Lee , Kyu-sik Kim , Duck-su Kim , Byoung-ho Cheong
发明人： O-gweon Seo , Kae-dong Back , Chang-seung Lee , Kyu-sik Kim , Duck-su Kim , Byoung-ho Cheong
IPC分类号： G03F1/00
CPC分类号： G02B5/003 , G02B1/11 , G02B3/0006 , G02B3/0018 , G03C1/00
摘要： A method of fabricating a one-way transparent optical system by which external light is effectively intercepted and internal light passes nearly without loss is provided. The method includes: forming a silver halide on a transparent substrate; aligning a mask in which a predetermined pattern is formed, on the transparent substrate and exposing the silver halide using the mask; developing and fixing the exposed silver halide and forming a plurality of light-absorbing materials on the transparent substrate; and forming protrusion structures having a shape of a convex lens shape for refracting incident light toward a corresponding light-absorbing material of the light-absorbing materials, on the transparent substrate on which the light-absorbing materials are formed.
摘要翻译：提供了一种制造单向透明光学系统的方法，通过该方法可以有效地遮断外部光线，并且内部光线几乎没有损失。该方法包括：在透明基板上形成卤化银; 将形成有预定图案的掩模对准在透明基板上，并使用掩模曝光卤化银; 显影和固定曝光的卤化银并在透明基板上形成多个光吸收材料; 以及在其上形成有光吸收材料的透明基板上形成具有用于将入射光折射到相应的光吸收材料的光吸收材料的凸透镜形状的突起结构。

4. 发明申请

US20070134928A1 Silicon wet etching method using parylene mask and method of manufacturing nozzle plate of inkjet printhead using the same 审中-公开
标题翻译：使用聚对二苯乙烯掩模的硅湿式蚀刻方法和使用其制造喷墨打印头的喷嘴板的方法
公开(公告)号：US20070134928A1
公开(公告)日：2007-06-14
申请号：US11505416
申请日：2006-08-17
申请人： Jae-chang Lee , Chang-seung Lee , Jae-woo Chung , Duck-su Kim , Kyo-yeol Lee
发明人： Jae-chang Lee , Chang-seung Lee , Jae-woo Chung , Duck-su Kim , Kyo-yeol Lee
IPC分类号： H01L21/302
CPC分类号： B41J2/161 , B41J2/1628 , B41J2/1629 , B41J2002/14411
摘要： A silicon wet etching method to form at least two elements having different shapes in a silicon substrate using at least two wet etching processes includes forming a first etch mask made of parylene on a surface of the silicon substrate, forming a first element in the substrate by wet etching the silicon substrate for a first time using the first etch mask, forming a second etch mask made of a silicon oxide layer on the surface of the silicon substrate, and forming a second element by wet etching the silicon substrate for a second time using the second etch mask.
摘要翻译：使用至少两个湿蚀刻工艺在硅衬底中形成具有不同形状的至少两种元件的硅湿式蚀刻方法包括在硅衬底的表面上形成由聚对二甲苯制成的第一蚀刻掩模，在衬底中形成第一元件，通过使用第一蚀刻掩模第一次湿蚀刻硅衬底，在硅衬底的表面上形成由氧化硅层制成的第二蚀刻掩模，并且通过湿法蚀刻硅衬底第二次来形成第二元件，第二次使用第二蚀刻掩模。

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