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    • 4. 发明申请
    • NONVOLATILE MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME
    • 非易失性存储器件及其制造方法
    • US20080277714A1
    • 2008-11-13
    • US11965599
    • 2007-12-27
    • Jae-Hong KIM
    • Jae-Hong KIM
    • H01L27/088H01L21/762
    • H01L27/115H01L27/11521
    • A nonvolatile memory device includes a control gate formed along a first direction over a substrate, an active region formed over the substrate, the active region being defined along a second direction crossing the control gate and including a fin type protruding portion having rounded top corners at a region where the control gate and the active region overlap, a floating gate formed over a surface of the protruding portion of the active region below the control gate and formed to a substantially uniform thickness along the surface profile of the protruding portion of the active region, a tunneling insulation layer formed between the floating gate and the active region, and a dielectric layer formed between the floating gate and the control gate.
    • 非易失性存储器件包括沿衬底上的第一方向形成的控制栅极,形成在衬底上的有源区域,有源区域沿着与控制栅极交叉的第二方向限定,并且包括翅片型突出部分,其具有圆形顶角, 控制栅极和有源区域重叠的区域,浮动栅极,形成在控制栅极下方的有源区域的突出部分的表面上,并且沿着有源区域的突出部分的表面轮廓形成为基本均匀的厚度 形成在浮栅和有源区之间的隧道绝缘层,以及形成在浮栅和控制栅之间的介电层。