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    • 7. 发明授权
    • Nonvolatile memory device and method of operating the same
    • 非易失存储器件及其操作方法
    • US08576635B2
    • 2013-11-05
    • US13176156
    • 2011-07-05
    • Nam Kyeong KimKyoung Chul YangYoung Jin WooTae Hyun Kim
    • Nam Kyeong KimKyoung Chul YangYoung Jin WooTae Hyun Kim
    • G11C16/04
    • G11C16/16G11C16/0483
    • A nonvolatile memory device includes memory cell blocks each configured to comprise memory cells erased by an erase voltage, supplied to a word line, and a bulk voltage supplied to a bulk, a bias voltage generator configured to generate a first erase voltage, having a first pulse width and a first amplitude, in order to perform the erase operation of the memory cells and a second erase voltage, having a second pulse width narrower than the first pulse width and a second amplitude lower than the first amplitude, in order to perform an additional erase operation if an unerased memory cell is detected after the erase operation is performed, and a bulk voltage generator configured to generate the bulk voltage.
    • 非易失性存储器件包括存储单元块,每个存储单元块被配置为包括被提供给字线的擦除电压擦除的存储器单元和提供给块的体电压;偏置电压发生器,被配置为产生第一擦除电压, 脉冲宽度和第一幅度,以便执行具有比第一脉冲宽度窄的第二脉冲宽度和低于第一幅度的第二幅度的存储单元的擦除操作和第二擦除电压,以便执行 在执行擦除操作之后检测到未故障存储器单元的附加擦除操作,以及被配置为产生体电压的体电压发生器。
    • 8. 发明授权
    • Vacuum field transistor
    • 真空场晶体管
    • US06437360B1
    • 2002-08-20
    • US09647076
    • 2000-11-09
    • Gyu Hyeong ChoJi Yeoul RyooMyeoung Wun HwangMin Hyung ChoYoung Jin WooYoung Ki Kim
    • Gyu Hyeong ChoJi Yeoul RyooMyeoung Wun HwangMin Hyung ChoYoung Jin WooYoung Ki Kim
    • H01L2906
    • H01J1/316H01J21/105
    • Disclosed are flat/vertical type vacuum field transistor (VFT) structures, which adopt a MOSFET-like flat or vertical structure so as to increase the degree of integration and can be operated at low operation voltages at high speeds. The flat type comprises a source and a drain, made of conductors, which stand at a predetermined distance apart on a thin channel insulator with a vacuum channel therebetween; a gate, made of a conductor, which is formed with a width below the source and the drain, the channel insulator functioning to insulate the gate from the source and the drain; and an insulating body, which serves as a base for propping up the channel insulator and the gate. The vertical type comprises a conductive, continuous circumferential source with a void center, formed on a channel insulator; a conductive gate formed below the channel insulator, extending across the source; an insulating body for serving as a base to support the gate and the channel insulator; an insulating walls which stand over the source, forming a closed vacuum channel; and a drain formed over the vacuum channel. In both types, proper bias voltages are applied among the gate, the source and the drain to enable electrons to be field emitted from the source through the vacuum channel to the drain.
    • 公开了平面/垂直型真空场效应晶体管(VFT)结构,它们采用类似MOSFET的平面或垂直结构,以增加集成度,并可在高速下在低工作电压下工作。 扁平型包括由导体制成的源极和漏极,它们在薄沟道绝缘体上以预定的距离隔开,其间具有真空通道; 由导体制成的栅极,其形成在源极和漏极下方的宽度,沟道绝缘体用于使栅极与源极和漏极绝缘; 以及用作支撑通道绝缘体和栅极的基座的绝缘体。 垂直型包括形成在通道绝缘体上的具有空心中心的导电连续周向源; 导电栅极,形成在沟道绝缘体下方,延伸穿过源极; 用作支撑栅极和沟道绝缘体的基座的绝缘体; 绝缘壁,其竖立在源上,形成封闭的真空通道; 以及在真空通道上形成的排水口。 在这两种类型中,在栅极,源极和漏极之间施加适当的偏置电压,以使电子能够从源极通过真空通道到漏极发射。