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    • 4. 发明授权
    • Nonvolatile semiconductor memory element and method for fabricating the
same
    • 非易失性半导体存储元件及其制造方法
    • US5729496A
    • 1998-03-17
    • US698247
    • 1996-08-15
    • Won Young Jung
    • Won Young Jung
    • H01L27/10H01L21/8247H01L27/115G11C13/00
    • H01L27/11517H01L27/115
    • This invention relates to a nonvolatile semiconductor memory element having elevated source and drain regions, a well-shaped floating gate surrounding a control gate, and leveled surface, and a method for fabricating the same. The nonvolatile semiconductor memory element includes a first conduction type substrate having a channel region, an elevated source and drain regions of second conduction type formed to have a step on the substrate separated by the channel region, a floating gate insulation film formed on exposed surfaces of the substrate corresponding to the channel region and the source and drain regions, as well-shaped floating gate formed on the floating gate insulation film on the channel region having a fixed depth and a fixed thickness, a control gate having a fixed thickness formed fully buried in the well of the floating gate so that the floating gate can surround the control gate, and an interlayer insulation film formed between the floating gate and the control gate so as to insulate the floating gate and the control gate.
    • 本发明涉及一种具有升高的源极和漏极区域的非易失性半导体存储元件,围绕控制栅极的平坦的浮动栅极和平整的表面及其制造方法。 非易失性半导体存储元件包括具有通道区域的第一导电型衬底,形成为具有由沟道区域分离的衬底上的台阶的第二导电类型的升高的源极和漏极区域,形成在沟道区域的暴露表面上的浮置栅极绝缘膜 对应于通道区域和源极和漏极区域的衬底,以及形成在具有固定深度和固定厚度的沟道区域上的浮栅绝缘膜上形成的形状浮动栅极,具有固定厚度的控制栅极完全埋入 在浮栅的阱中,使得浮栅可以围绕控制栅极,以及形成在浮栅和控制栅之间的层间绝缘膜,以使浮栅和控制栅绝缘。