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1. 发明授权

US06864971B2 System and method for performing optical inspection utilizing diffracted light 失效
$System and method for performing optical inspection utilizing diffracted light$
标题翻译：利用衍射光进行光学检查的系统和方法
公开(公告)号：US06864971B2
公开(公告)日：2005-03-08
申请号：US10094119
申请日：2002-03-08
申请人： YouLing Lin , A. Kathleen Hennessey , Yongqiang Liu , Yonghang Fu , Masami Yamashita , Ichiro Shimomura
发明人： YouLing Lin , A. Kathleen Hennessey , Yongqiang Liu , Yonghang Fu , Masami Yamashita , Ichiro Shimomura
IPC分类号： G01N21/95 , G01N21/88
CPC分类号： G01N21/9501
摘要： A system and method for performing optical inspection of structures on the surface of a semiconductor wafer. The wafer surface is illuminated with a polychromatic light source. A multiple-charged couple-device (CCD) camera is positioned to capture light diffracted by the structures on the wafer surface at the first order of diffraction. The captured light is then separated into a plurality of component wavelengths which are directed onto the CCDs. A digital filter creates a plurality of digitized diffractive images of the wafer surface at different component wavelengths. The diffractive images may be integrated and analyzed to detect defects in the structures, or may be, analyzed individually. An image at a particular wavelength may be selected and analyzed by using the known grating pitch of the structures to calculate the wavelength.
摘要翻译：一种用于对半导体晶片的表面上的结构执行光学检查的系统和方法。用多色光源照射晶片表面。定位多电荷耦合器件（CCD）照相机以捕获在第一衍射级上由晶片表面上的结构衍射的光。然后将捕获的光分离成指向CCD的多个分量波长。数字滤波器在不同的分量波长处产生晶片表面的多个数字化的衍射图像。衍射图像可以被整合和分析以检测结构中的缺陷，或者可以单独地分析。可以通过使用结构的已知光栅间距来选择和分析特定波长的图像以计算波长。

2. 发明授权

US07573054B2 Edge exposure apparatus, coating and developing apparatus, and edge exposure method 有权
标题翻译：边缘曝光装置，涂层显影装置和边缘曝光方法
公开(公告)号：US07573054B2
公开(公告)日：2009-08-11
申请号：US11417163
申请日：2006-05-04
申请人： Yasuharu Iwashita , Ichiro Shimomura
发明人： Yasuharu Iwashita , Ichiro Shimomura
IPC分类号： G01V8/00
CPC分类号： G03F7/2022 , G03F7/2026 , G03F7/2028 , H01L21/67005
摘要： The present invention includes a first and a second optical path forming member arranged within a path of light beams from a light source; a first mounting table provided such that the edge portion of the substrate is located within an application region of the light beams from an outlet side of the first optical path forming member, and a second mounting table provided such that the edge portion of the substrate is located within an application region of the light beams from an outlet side of the second optical path forming member, each of the mounting tables being configured to be rotatable about a vertical axis while mounting the substrate thereon; and a light blocking means for blocking application of light from each of the first and second optical path forming members. A common light source can be used to perform edge exposure for the substrates on the first and second mounting tables, for example, at the same time, so that a high processing ability can be offered and an increase in size of the apparatus can be prevented.
摘要翻译：本发明包括设置在来自光源的光束的路径内的第一和第二光路形成部件; 第一安装台，其设置成使得基板的边缘部分位于来自第一光路形成构件的出口侧的光束的施加区域内;以及第二安装台，其被设置为使得基板的边缘部分位于来自所述第二光路形成构件的出口侧的光束的施加区域内，每个所述安装台构造成能够围绕垂直轴线旋转，同时将所述基板安装在其上; 以及阻挡来自第一和第二光路形成构件中的每一个的光的遮光装置。通常的光源可以用于对第一和第二安装台上的基板进行边缘曝光，例如同时，从而可以提供高的处理能力并且可以防止装置的尺寸的增加。

3. 发明申请

US20060250594A1 Edge exposure apparatus, coating and developing apparatus, and edge exposure method 有权
公开(公告)号：US20060250594A1
公开(公告)日：2006-11-09
申请号：US11417163
申请日：2006-05-04
申请人： Yasuharu Iwashita , Ichiro Shimomura
发明人： Yasuharu Iwashita , Ichiro Shimomura
IPC分类号： G03B27/42
CPC分类号： G03F7/2022 , G03F7/2026 , G03F7/2028 , H01L21/67005
摘要： The present invention includes a first and a second optical path forming member arranged within a path of light beams from a light source; a first mounting table provided such that the edge portion of the substrate is located within an application region of the light beams from an outlet side of the first optical path forming member, and a second mounting table provided such that the edge portion of the substrate is located within an application region of the light beams from an outlet side of the second optical path forming member, each of the mounting tables being configured to be rotatable about a vertical axis while mounting the substrate thereon; and a light blocking means for blocking application of light from each of the first and second optical path forming members. A common light source can be used to perform edge exposure for the substrates on the first and second mounting tables, for example, at the same time, so that a high processing ability can be offered and an increase in size of the apparatus can be prevented.

4. 发明授权

US07865130B2 Material processing apparatus, material processing method, and material processing program product 有权
标题翻译：材料加工设备，材料加工方法和材料加工程序产品
公开(公告)号：US07865130B2
公开(公告)日：2011-01-04
申请号：US11225131
申请日：2005-09-14
申请人： Toshiya Koyama , Nobuhiro Nozaki , Ichiro Shimomura
发明人： Toshiya Koyama , Nobuhiro Nozaki , Ichiro Shimomura
IPC分类号： G09B3/00
CPC分类号： G09B7/02
摘要： A material processing method has a process of reading image data of a material. The material has answer fields and information items on points distributed to the answer fields. The method also has extracting the distributed point information items based on the image data, associating the distributed point information items with answer fields to recognize the points distributed to each answer field, storing a result recognized the points distributed to each answer field as answer/distributed point correspondence information, recognizing correct/incorrect answer determining contents from the image data, and performing point totaling on the correct/incorrect answer determining contents based on the answer/distributed point correspondence information.
摘要翻译：材料处理方法具有读取材料的图像数据的处理。材料在分发到答案字段的点上有答案字段和信息项。该方法还基于图像数据提取分布点信息项，将分布式点信息项与应答字段相关联，以识别分配给每个应答字段的点，将分配给每个应答字段的点的结果存储为应答/分布点对应信息，从图像数据识别正确/不正确的答案确定内容，以及基于答案/分布点对应信息对正确/不正确的答案确定内容执行点总计。

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