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1. 发明授权

US5096768A Substrate used for fabrication of thick film circuit 失效
标题翻译：用于制造厚膜电路的基板
公开(公告)号：US5096768A
公开(公告)日：1992-03-17
申请号：US474904
申请日：1990-02-05
申请人： Yoshirou Kuromitsu , Hideaki Yoshida , Toshiyuki Nagase , Hiroto Uchida , Tadaharu Tanaka , Yoshio Kanda , Kenji Morinaga
发明人： Yoshirou Kuromitsu , Hideaki Yoshida , Toshiyuki Nagase , Hiroto Uchida , Tadaharu Tanaka , Yoshio Kanda , Kenji Morinaga
IPC分类号： H01L23/15 , H01L23/31
CPC分类号： H01L23/3135 , H01L23/15 , H01L2224/45147 , H01L2224/48091 , H01L2224/48227 , H01L24/45 , H01L24/48 , H01L2924/01014 , H01L2924/0102 , H01L2924/01039 , H01L2924/01046 , H01L2924/01047 , H01L2924/01322 , H01L2924/12042 , H01L2924/14 , H01L2924/181 , H01L2924/19105 , Y10S428/901 , Y10T428/24917
摘要： An insulating substrate is used for fabrication of a thick film circuit and comprises a foundation of aluminum nitride and a surface film structure provided on the foundation, in which the foundation contains at least one oxidizing agent selected from the group consisting of an yttrium oxide and a calcium oxide ranging from 0.1% to 10% by weight for enhancing a stiffness of the foundation, and in which the surface film structure is of the multi-level surface film structure having a lower surface film of an aluminum oxide rapidly grown on the foundation in the presence of the oxidizing agent and an upper surface film containing a silicon oxide and a substance selected from the group consisting of a zirconium oxide, a titanium oxide and a boron oxide for enhancing the resistivity against a firing operation.

2. 发明授权

US5134029A Substrate used for fabrication of thick film circuit 失效
标题翻译：用于制造厚膜电路的基板
公开(公告)号：US5134029A
公开(公告)日：1992-07-28
申请号：US734130
申请日：1991-07-25
申请人： Yoshiro Kuromitsu , Hideaki Yoshida , Chuji Tanaka , Hiroto Uchida , Kenji Morinaga
发明人： Yoshiro Kuromitsu , Hideaki Yoshida , Chuji Tanaka , Hiroto Uchida , Kenji Morinaga
IPC分类号： H01L23/15 , H05K1/03 , H05K1/09 , H05K3/38
CPC分类号： H01L23/15 , H01L2924/0002 , H05K1/0306 , H05K1/092 , H05K3/38 , Y10T428/265
摘要： For improvement in heat radiation capability without sacrifice of affinity for a paste, a substrate used for fabrication of a thick film circuit has a multi-level structure having a foundation of an aluminum nitride and a surface film provided on the foundation, and the surface film is formed of an oxygen compound containing silicon atoms.
摘要翻译：为了提高散热能力而不牺牲对浆料的亲和力，用于制造厚膜电路的基板具有多层结构，其具有氮化铝基底和设置在基础上的表面膜，并且表面膜由含硅原子的氧化合物形成。

3. 发明授权

US5804520A Crystallized glass for substrate of information-recording disk 失效
标题翻译：用于信息记录盘底物的结晶玻璃
公开(公告)号：US5804520A
公开(公告)日：1998-09-08
申请号：US941472
申请日：1997-09-30
申请人： Kenji Morinaga , Yuji Akimoto , Fumiyuki Shimizu , Mineto Iwasaki , Naoto Shindo
发明人： Kenji Morinaga , Yuji Akimoto , Fumiyuki Shimizu , Mineto Iwasaki , Naoto Shindo
IPC分类号： C03C3/112 , C03C3/118 , C03C10/04 , C03C10/14 , C03C10/16 , G11B5/62 , G11B5/73 , G11B5/84 , G11B7/253 , G11B7/26 , G11B11/10 , G11B11/105
CPC分类号： C03C10/16 , C03C10/00 , C03C10/0009
摘要： A crystallized glass for a substrate of an information-recording disk, which has been obtained by melting a glass forming material consisting essentially of, in wt. % as oxide, 55 to 85% of SiO.sub.2, 5 to 20% of Li.sub.2 O, 0 to 10% of K.sub.2 O+Na.sub.2 O, 0 to 10% of MgO, 0 to 20% of CaO, 0 to 10% of SrO, 0 to 10% of BaO, 0 to 10% of ZnO, 0 to 10% of Al.sub.2 O.sub.3, 0 to 15% of B.sub.2 O.sub.3, 0 to 6% of P.sub.2 O.sub.5, 0 to 3% of TiO.sub.2, 0 to 3% of ZrO.sub.2, 0 to 3% of SnO.sub.2 and 0 to 1% of As.sub.2 O.sub.3 +Sb.sub.2 O.sub.3, 0.1 to 10 wt. % of F and 0.1 to 20 wt. % of Cl, molding, vitrifying and crystallizing the material, and which contains at least 0.05% by weight of chlorine after crystallization. The glass forming material may further contain 0 to 10% of Fe.sub.2 O.sub.3, 0 to 10% of Cr.sub.2 O.sub.3, 0 to 10% of NiO, 0 to 10% of V.sub.2 O.sub.5, 0 to 10% of CuO, 0 to 10% of MnO.sub.2, 0 to 10% of MoO.sub.3, the total of Fe.sub.2 O.sub.3 +Cr.sub.2 O.sub.3 +NiO+V.sub.2 O.sub.5 +CuO+MnO.sub.2 +MoO.sub.3 being 0.5 to 10%, and 0 to 3% of CeO.sub.2. The crystallized glass has a microcrystalline structure and surface properties desirable as a substrate material for an information-recording disk as well as excellent meltability and moldability.
摘要翻译：一种用于信息记录盘的基底的结晶玻璃，其通过熔化基本上以重量计的玻璃形成材料而获得。％的氧化物，55〜85％的SiO2，5〜20％的Li2O，0〜10％的K2O + Na2O，0〜10％的MgO，0〜20％的CaO，0〜10％的SrO，0〜 10％的BaO，0〜10％的ZnO，0〜10％的Al 2 O 3，0〜15％的B 2 O 3，0〜6％的P 2 O 5，0〜3％的TiO 2，0〜3％的ZrO 2，0〜3 ％的SnO 2和0〜1％的As 2 O 3 + Sb 2 O 3，0.1〜10重量％ F％和0.1〜20wt。 Cl的％，成型，玻璃化和结晶，并且在结晶后含有至少0.05重量％的氯。玻璃形成材料还可以含有0〜10％的Fe 2 O 3，0〜10％的Cr 2 O 3，0〜10％的NiO，0〜10％的V 2 O 5，0〜10％的CuO，0〜10％的MnO 2，0 至10％的MoO 3，Fe 2 O 3 + Cr 2 O 3 + NiO + V 2 O 5 + CuO + MnO 2 + MoO 3的总和为0.5〜10％，CeO 2为0〜3％。结晶化玻璃具有作为信息记录盘的基材的微晶结构和表面性能，以及优异的熔融性和成型性。

4. 发明授权

US4843021A Immunological assay method 失效
标题翻译：免疫测定法
公开(公告)号：US4843021A
公开(公告)日：1989-06-27
申请号：US79318
申请日：1987-07-30
申请人： Yasuhiko Noguchi , Masahiro Naito , Kenji Morinaga , Yohji Takahashi , Katsuo Mitani
发明人： Yasuhiko Noguchi , Masahiro Naito , Kenji Morinaga , Yohji Takahashi , Katsuo Mitani
IPC分类号： G01N33/536 , G01N21/27 , G01N33/53 , G01N33/543 , G01N33/557
CPC分类号： G01N33/53 , G01N33/54313 , Y10S436/805
摘要： An immunological assay method, wherein the concentration of a substance to be assayed is calculated from a calibration curve, which is formed in the preparation of a reagent or in the assay of a sample based on parameter(s) determined in the preparation of the reagent, without the need of forming any additional calibration curve each time, is disclosed. By the immunological assay method of the present invention, the concentration of the substance to be assayed can be efficiently and discontinuously determined, when compared with conventional ones. The method of the present invention is particularly suitable for quantitatively determining an antigen or an antibody.
摘要翻译：一种免疫学测定方法，其中待测试物质的浓度是根据在制备试剂中形成的校准曲线或根据在试剂的制备中测定的参数在样品测定中计算的，而不需要每次形成任何额外的校准曲线。通过本发明的免疫学测定方法，与常规物质相比，可以有效和不连续地测定待测物质的浓度。本发明的方法特别适用于定量测定抗原或抗体。

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