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1. 发明授权

US4372938A Producing sulfur tetrafluoride using amine/hydrogen fluoride complex 失效
标题翻译：使用胺/氟化氢络合物生产四氟化硫
公开(公告)号：US4372938A
公开(公告)日：1983-02-08
申请号：US370670
申请日：1982-04-22
申请人： Yoshio Oda , Hiroshi Otouma , Keiichi Uchida , Shinsuke Morikawa , Masaaki Ikemura
发明人： Yoshio Oda , Hiroshi Otouma , Keiichi Uchida , Shinsuke Morikawa , Masaaki Ikemura
IPC分类号： C01B17/45 , C10B17/00
CPC分类号： C01B17/4523
摘要： A process for producing sulfur tetrafluoride comprises reacting in the absence or presence of a solvent an amine/hydrogen fluoride complex having the formula:Am . (HF).sub.nwherein Am represents an amine selected from the group consisting of nitrogen-containing heterocyclic aromatic amines and derivatives thereof, and n represents 2-4, with sulfur dichloride, sulfur monochloride or a combination of chlorine and sulfur at a temperature of 0.degree. to 60.degree. C., the molar ratio of said amine/hydrogen fluoride complex to said sulfur dichloride, sulfur monochloride or sulfur being represented by the formula: ##EQU1## wherein n is as defined above, A represents moles of sulfur in said sulfur dichloride, sulfur monochloride or sulfur, and B represents moles of said amine/hydrogen complex.
摘要翻译：制备四氟化硫的方法包括在不存在或存在溶剂的情况下使具有下式的Am胺/氟化氢络合物反应。（HF）n其中Am表示选自含氮杂环芳族胺及其衍生物的胺，n表示2-4，二氯化硫，一氯化硫或氯和硫的组合，温度为0 所述胺/氟化氢络合物与所述二氯化硫，一氯化硫或硫的摩尔比由下式表示：其中n如上所定义，A表示所述硫中的硫的摩尔数二氯化物，一氯化硫或硫，B表示所述胺/氢络合物的摩尔数。

2. 发明授权

US4134796A Method of purifying hexafluoropropylene oxide 失效
标题翻译：六氟环氧丙烷的纯化方法
公开(公告)号：US4134796A
公开(公告)日：1979-01-16
申请号：US852497
申请日：1977-11-17
申请人： Yoshio Oda , Keiichi Uchida , Shinsuke Morikawa
发明人： Yoshio Oda , Keiichi Uchida , Shinsuke Morikawa
IPC分类号： C07D303/48 , B01D3/40 , C07D301/32
CPC分类号： C07D303/48
摘要： A process for a separation of hexafluoropropylene oxide from hexafluoropropylene by an extractive distillation in the presence of a normally liquid inert compound such as 1,2-dichloroethane, monochlorobenzene, di-isopropyl ether and 1,1,2-trichloroethane.
摘要翻译：在通常液体惰性化合物如1,2-二氯乙烷，一氯苯，二异丙基醚和1,1,2-三氯乙烷的存在下，通过萃取蒸馏从六氟丙烯中分离六氟环氧丙烷的方法。

3. 发明授权

US4390511A Process for producing SF.sub.6 through SF.sub.5 Cl 失效
标题翻译：通过SF5Cl生产SF6的方法
公开(公告)号：US4390511A
公开(公告)日：1983-06-28
申请号：US286887
申请日：1981-07-27
申请人： Yoshio Oda , Shinsuke Morikawa , Masaaki Ikemura , Tomio Yarita , Makoto Noshiro , Isao Gotoh , Yukio Jitsugiri , Shigeaki Yonemori , Kimihiko Sato , Keiichi Uchida
发明人： Yoshio Oda , Shinsuke Morikawa , Masaaki Ikemura , Tomio Yarita , Makoto Noshiro , Isao Gotoh , Yukio Jitsugiri , Shigeaki Yonemori , Kimihiko Sato , Keiichi Uchida
IPC分类号： C01B17/45 , C01B7/24 , C01B17/46
CPC分类号： C01B17/453
摘要： SF.sub.6 is produced by a pyrolysis of SF.sub.5 Cl obtained by a reaction of sulfur or sulfur chloride with chlorine and an amine/hydrogen fluoride complex or a reaction of sulfur tetrafluoride with chlorine and an amine/hydrogen fluoride complex.
摘要翻译： SF6是通过硫或氯化氯与氯和胺/氟化氢络合物的反应或四氟化硫与氯和胺/氟化氢络合物的反应而获得的SF5Cl的热解产生的。

4. 发明授权

US4186266A Process for producing 5-fluorouracil 失效
标题翻译：生产5-氟尿嘧啶的方法
公开(公告)号：US4186266A
公开(公告)日：1980-01-29
申请号：US913333
申请日：1978-06-07
申请人： Akihiro Yamazaki , Hirokazu Morisawa , Yoshio Oda , Keiichi Uchida
发明人： Akihiro Yamazaki , Hirokazu Morisawa , Yoshio Oda , Keiichi Uchida
IPC分类号： C07D239/54 , C07D239/553 , C07D239/557
CPC分类号： C07D239/553 , C07D239/557
摘要： 5-Fluorouraacil is produced by reacting orotic acid with a fluorinating agent and then, decarboxylating the resulting 5-fluoro-orotic acid.
摘要翻译： 5-氟尿嘧啶是通过将乳清酸与氟化剂反应，然后使所得5-氟乳清酸脱羧来制备的。

5. 发明授权

US3936505A Process for preparing unsaturated aldehyde having three to four carbon atoms 失效
标题翻译：制备具有3〜4个碳原子的不饱和醛的方法
公开(公告)号：US3936505A
公开(公告)日：1976-02-03
申请号：US334727
申请日：1973-02-22
申请人： Yoshio Oda , Keiichi Uchida , Manabu Suhara , Takeshi Morimoto
发明人： Yoshio Oda , Keiichi Uchida , Manabu Suhara , Takeshi Morimoto
IPC分类号： B01J23/28 , B01J23/30 , B01J23/887 , B01J23/89 , B01J27/057 , C07C45/34 , C07C45/35 , C07C45/02
CPC分类号： C07C45/34 , B01J23/28 , B01J23/30 , B01J23/8877 , B01J23/8993 , B01J27/0576 , C07C45/35 , B01J2523/00
摘要： An unsaturated aldehyde having three to four carbon atoms is prepared by reacting the corresponding olefin with molecular oxygen in the vapor phase at a temperature of from 350.degree. to 520.degree. C in the presence of a metal oxide catalyst comprising the metallic components: (a) molybdenum; (b) at least one metal selected from the group consisting of niobium and tantalum; and (c) at least one metal selected from the group consisting of tellurium, bismuth, cobalt, tungsten, indium, and titanium.
摘要翻译：通过在包含金属组分的金属氧化物催化剂存在下，使相应的烯烃与气相中的分子氧在350至520℃的温度下反应来制备具有3至4个碳原子的不饱和醛：（a）钼; （b）选自铌和钽中的至少一种金属; 和（c）选自碲，铋，钴，钨，铟和钛中的至少一种金属。

6. 发明授权

US3998877A Process for preparing methacrylic acid 失效
标题翻译：制备甲基丙烯酸的方法
公开(公告)号：US3998877A
公开(公告)日：1976-12-21
申请号：US563472
申请日：1975-03-31
申请人： Yoshio Oda , Keiichi Uchida , Takeshi Morimoto , Seisaku Kumai
发明人： Yoshio Oda , Keiichi Uchida , Takeshi Morimoto , Seisaku Kumai
IPC分类号： B01J23/28 , B01J23/88 , B01J27/186 , C07C51/25 , C07C57/055 , C07C51/32
CPC分类号： B01J23/8872 , B01J23/28 , B01J23/8874 , B01J23/8875 , B01J23/8877 , B01J27/186 , C07C51/252 , B01J2523/00
摘要： Methacrylic acid is prepared by reacting methacrolein with molecular oxygen in the presence of a catalyst comprising (a) molybdenum, (b) phosphorus, (c) at least one element selected from the group consisting of thallium and cesium, (d) at least one element selected from the group consisting of vanadium, zirconium, tin, niobium, nickel, tantalum and iron, and (e) oxygen.
摘要翻译：甲基丙烯酸通过使甲基丙烯醛与分子氧在气相中在230℃至450℃的温度下反应来制备，在具有式Mo 12 Pα'Xβ'Yγ'Oδ'的催化剂存在下，其中 X是由Cs和T1组成的组中的至少一个成员：Y是由Cs和T1组成的组中的至少一个成员; Y是由V，Zr，Nb，Ni，Ta和Fe组成的组中的至少一个; α'= 0.1-3; β'= 0.2-9; γ'= 0.1-7; delta'= 36-100。

7. 发明授权

US4440948A Process for preparing methacrylic acid 失效
标题翻译：制备甲基丙烯酸的方法
公开(公告)号：US4440948A
公开(公告)日：1984-04-03
申请号：US725671
申请日：1976-09-22
申请人： Yoshio Oda , Keiichi Uchida , Takeshi Morimoto , Seisaku Kumai
发明人： Yoshio Oda , Keiichi Uchida , Takeshi Morimoto , Seisaku Kumai
IPC分类号： B01J23/28 , B01J23/88 , B01J27/186 , C07C51/25 , C07C57/055
CPC分类号： B01J23/8872 , B01J23/28 , B01J23/8874 , B01J23/8875 , B01J23/8877 , B01J27/186 , C07C51/252 , B01J2523/00
摘要： Methacrylic acid is prepared by reacting methacrolein with molecular oxygen in the vapor phase at a temperature of from 230.degree. C. to 450.degree. C. in the presence of a catalyst having the formula Mo.sub.12 P.sub..alpha.' X.sub..beta.' Y.sub..gamma.' O.sub..delta.' wherein X is at least one member of the group consisting of Cs and Tl:Y is at least one member of the group consisting of Cs and Tl; Y is at least one member of the group consisting of V, Zr, Nb, Ni, Ta and Fe; .alpha.'=0.1-3; .beta.'=0.2-9; .gamma.'=0.1-7; .delta.'=36-100.

8. 发明授权

US4025565A Process for preparing unsaturated aldehyde having three to four carbon atoms 失效
标题翻译：制备具有3〜4个碳原子的不饱和醛的方法
公开(公告)号：US4025565A
公开(公告)日：1977-05-24
申请号：US590152
申请日：1975-06-25
申请人： Yoshio Oda , Keiichi Uchida , Manabu Suhara , Takeshi Morimoto
发明人： Yoshio Oda , Keiichi Uchida , Manabu Suhara , Takeshi Morimoto
IPC分类号： B01J23/28 , B01J23/30 , B01J23/89 , B01J27/057 , C07C45/34 , C07C45/35 , C07C45/02 , C07C47/20
CPC分类号： C07C45/34 , B01J23/28 , B01J23/30 , B01J23/8993 , B01J27/0576 , C07C45/35
摘要： An unsaturated aldehyde having three to four carbon atoms is prepared by reacting the corresponding olefin with molecular oxygen in the vapor phase at a temperature of from 350.degree. to 520.degree. C in the presence of a metal oxide catalyst comprising the metallic components: (a) molybdenum; (b) at least one metal selected from the group consisting of niobium and tantalum; (c) tellurium; and (d) at least one metal selected from the group consisting of alkali metals, copper, arsenic, antimony, iron and nickel.
摘要翻译：通过在包含金属组分的金属氧化物催化剂存在下，使相应的烯烃与气相中的分子氧在350至520℃的温度下反应来制备具有3至4个碳原子的不饱和醛：（a）钼; （b）选自铌和钽中的至少一种金属; （c）碲; 和（d）选自碱金属，铜，砷，锑，铁和镍中的至少一种金属。

9. 发明授权

US3965163A Process for preparing unsaturated carboxylic acids from the corresponding unsaturated aldehydes 失效
标题翻译：从相应的不饱和醛制备不饱和羧酸的方法
公开(公告)号：US3965163A
公开(公告)日：1976-06-22
申请号：US451443
申请日：1974-03-15
申请人： Yoshio Oda , Keiichi Uchida , Takeshi Morimoto
发明人： Yoshio Oda , Keiichi Uchida , Takeshi Morimoto
IPC分类号： C07C51/25 , C07C57/055 , C07C51/26
CPC分类号： C07C51/252
摘要： Unsaturated carboxylic acids are prepared by reacting the corresponding unsaturated aldehyde with molecular oxygen in the presence of a catalyst of (a) molybdenum, (b) phosphorus, (c) antimony, (d) at least one element selected from the group consisting of tungsten, barium, chromium, lead, niobium, tantalum, tin, nickel, iron and zirconium, and (e) oxygen, and optionally (f) at least one element selected from the group consisting of strontium, titanium, germanium, cerium, and silver.
摘要翻译：在（a）钼，（b）磷，（c）锑，（d）至少一种选自钨的元素的存在下，使相应的不饱和醛与分子氧反应制备不饱和羧酸，钡，铬，铅，铌，钽，锡，镍，铁和锆，和（e）氧，和（f）至少一种选自锶，钛，锗，铈和银的元素。

10. 发明申请

US20120237873A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM FORMED FROM THE SAME, AND DEVICE HAVING CURED FILM 审中-公开
标题翻译：阳性感光树脂组合物，由其形成的固化膜和具有固化膜的装置
公开(公告)号：US20120237873A1
公开(公告)日：2012-09-20
申请号：US13513270
申请日：2010-12-20
申请人： Takenori Fujiwara , Keiichi Uchida , Yugo Tanigaki , Mitsuhito Suwa
发明人： Takenori Fujiwara , Keiichi Uchida , Yugo Tanigaki , Mitsuhito Suwa
IPC分类号： G03F7/075
CPC分类号： C08G77/14 , C08G77/70 , C09D183/06 , G03F7/0757
摘要： Disclosed is a positive photosensitive resin composition which contains a polisiloxane, a naphthoquinone diazide compound, and a solvent. The positive photosensitive resin composition is characterized in that the polysiloxane has: an organosilane-derived structure represented by the general formula (1): at a content ration of 20-80% inclusive of Si relative to the overall number of moles of Si atoms in the polysiloxane; and an organosilane-derived structure represented by general formula (2): The positive photosensitive resin composition exhibits high heat resistance, high transparency, and enables high sensitivity, high resolution patterning. The positive photosensitive resin composition can be used to form cured films such as planarization films used in TFT substrates, interlayer insulating films, core materials and cladding materials, and can be used in elements having cured films such as display elements, semiconductor elements, solid-state imaging elements, and optical waveguide elements.
摘要翻译：公开了含有聚硅氧烷，萘醌二叠氮化合物和溶剂的正型感光性树脂组合物。正型感光性树脂组合物的特征在于，聚硅氧烷具有：由通式（1）表示的有机硅烷衍生结构：相对于Si原子的总摩尔数，含量为20〜80％，包括Si的含量聚硅氧烷; 和由通式（2）表示的有机硅烷衍生物结构：正型感光性树脂组合物的耐热性高，透明性高，能够实现高灵敏度，高分辨率图案化。正型感光性树脂组合物可以用于形成用于TFT基板，层间绝缘膜，芯材料和包层材料的平坦化膜等固化膜，并且可以用于具有固化膜的元件，例如显示元件，半导体元件，状态成像元件和光波导元件。

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