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    • 6. 发明申请
    • Method for Fine Processing of Substrate, Method for Fabrication of Substrate, and Light Emitting Device
    • 基板精加工方法,基板加工方法及发光装置
    • US20090114944A1
    • 2009-05-07
    • US12294963
    • 2007-03-30
    • Yoshinobu OnoKenji KasaharaKazumasa Ueda
    • Yoshinobu OnoKenji KasaharaKazumasa Ueda
    • H01L33/00B44C1/22H01L21/306
    • H01L21/30608H01L21/308H01L33/20H01L33/22H01L33/24H01L2933/0083Y10S977/856
    • The present invention provides a method for fine processing of a substrate, a method for fabrication of a substrate, and a light emitting device. In the method for fine processing of a substrate, after removing a single particle layer from the substrate having the single particle layer, a hole having an inner diameter smaller than a diameter of a particle and centering on a position on the substrate where each particle constructing the single particle layer has been placed is formed by etching. The method for fabrication of a substrateincludesthefollowingsteps (I) to (V) inthisorder: (I) forming the single particle layer by arranging the particles on the substrate; (II) reducing the diameter of each of the particles by etching the obtained substrate; (III) forming a thin film composed of a mask material on the obtained substrate; (IV) removing the particle from the substrate and forming a mask having a hole with an inner diameter equivalent to the diameter of the particle at the position where the individual particle has existed; and (V) forming a hole with a diameter equivalent to the inner diameter of the hole of the mask on the substrate below the hole of the mask by etching the substrate using the mask. The light emitting device is made of a nitride semiconductor and is formed with a fine hole on an entire surface or a partial region of a light extraction surface and/or an opposing surface.
    • 本发明提供了一种基板的精细加工方法,基板的制造方法以及发光装置。 在基板精细加工方法中,在从具有单一颗粒层的基板除去单个颗粒层之后,具有内径小于颗粒直径的孔并且以基体上的每个颗粒构成的位置为中心 已经放置的单个颗粒层通过蚀刻形成。 本发明的制造方法包括以下步骤(I)至(V):(I)通过将颗粒布置在基材上形成单个颗粒层; (II)通过蚀刻所获得的基板来减小每个颗粒的直径; (III)在所得基板上形成由掩模材料构成的薄膜; (IV)从基板上除去粒子,形成具有与粒子的存在直径相当的粒径的孔的掩模, 以及(V)通过使用掩模蚀刻基板,在掩模的孔下面的基板上形成具有与掩模的孔的内径相当的直径的孔。 发光器件由氮化物半导体制成,并且在光提取表面和/或相对表面的整个表面或部分区域上形成有细孔。
    • 10. 发明申请
    • ORGANIC EL DEVICE
    • 有机EL设备
    • US20130328025A1
    • 2013-12-12
    • US13877767
    • 2011-10-04
    • Yoshinobu Ono
    • Yoshinobu Ono
    • H01L51/52
    • H01L51/5253F21Y2105/00F21Y2115/15H01L2251/303
    • An organic EL device including a first film, a second film disposed facing the first film, and an organic EL element interposed between the first film and the second film. The second film has a gas barrier layer containing silicon atoms, oxygen atoms and carbon atoms. The distribution curve of silicon, the distribution curve of oxygen and the distribution curve of carbon of the gas barrier layer meet the following conditions: (i) in 90% or more of the region of the gas barrier layer in the thickness direction, the ratio of the number of the silicon atoms being the second largest value, (ii) the distribution curve of carbon having at least one extremum, and (iii) the difference between the maximum value and the minimum value of the ratio of the number of the carbon atoms in the distribution curve of carbon being 5 atom % or more.
    • 一种有机EL器件,包括第一膜,面对第一膜的第二膜和介于第一膜和第二膜之间的有机EL元件。 第二膜具有含有硅原子,氧原子和碳原子的阻气层。 硅的分布曲线,氧的分布曲线和阻气层的碳分布曲线符合以下条件:(i)在阻气层的厚度方向的90%以上的区域中,比例 的硅原子数为第二大值,(ii)具有至少一个极值的碳的分布曲线,以及(iii)最大值与最小值之间的差值, 碳分布曲线中的原子为5原子%以上。