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    • 3. 发明申请
    • INFORMATION REPRODUCING APPARATUS, SERVO ADJUSTING METHOD, AND THE LIKE
    • 信息再现装置,伺服调整方法等
    • US20100172222A1
    • 2010-07-08
    • US12160730
    • 2007-01-10
    • Yoshihiro HashizukaYoshimichi NishioHiroyuki KobayashiHiroki GotoHideaki TsurumiTakaaki UjiieHiroshi SomeyaManabu ShimodairaHidetaka Urabe
    • Yoshihiro HashizukaYoshimichi NishioHiroyuki KobayashiHiroki GotoHideaki TsurumiTakaaki UjiieHiroshi SomeyaManabu ShimodairaHidetaka Urabe
    • G11B7/00
    • G11B7/0945G11B7/094G11B7/0941G11B2007/0013
    • The present invention provides an information processing apparatus, a servo adjustment method, and the like realizing reduced time required for servo adjustment.An information reproducing apparatus according to the present invention is for reproducing information recorded on a recording medium having a plurality of recording layers.The apparatus includes: signal level measuring means for measuring a signal level of each of recording layers; and servo adjusting means for performing servo adjustment on at least one of the recording layers, storing a servo adjustment value in the servo adjustment, and in the case where the recorded information is reproduced from the recording layers, performing servo adjustment on the recording layers so as to become to the servo adjustment value.When a level ratio of signal levels of at least two recording layers in the measured signal levels of the recording layers lies in a threshold range, the servo adjusting means performs the servo adjustment on one of the recording layers, stores the servo adjustment value in the servo adjustment, and in the case where the recorded information is reproduced from the other recording layer, performs the servo adjustment on the other recording layer so as to become to the servo adjustment value for one recording layer.
    • 本发明提供一种实现伺服调整所需时间缩短的信息处理装置,伺服调整方法等。 根据本发明的信息再现装置用于再现记录在具有多个记录层的记录介质上的信息。 该装置包括:用于测量每个记录层的信号电平的信号电平测量装置; 以及用于在至少一个记录层上执行伺服调整的伺服调整装置,在伺服调整中存储伺服调整值,并且在记录层再现记录信息的情况下,对记录层进行伺服调整, 成为伺服调整值。 当记录层的测量信号电平中的至少两个记录层的信号电平的电平比在阈值范围内时,伺服调整装置在其中一个记录层上执行伺服调节,将伺服调整值存储在 伺服调整,并且在从另一个记录层再现记录信息的情况下,在另一个记录层上进行伺服调整,使其成为一个记录层的伺服调整值。
    • 5. 发明授权
    • Method and apparatus for cleaning collector mirror in EUV light generator
    • 在EUV光发生器中清洁集光镜的方法和装置
    • US08536550B2
    • 2013-09-17
    • US12478083
    • 2009-06-04
    • Takeshi AsayamaHiroshi SomeyaMasato MoriyaHideo HoshinoTamotsu Abe
    • Takeshi AsayamaHiroshi SomeyaMasato MoriyaHideo HoshinoTamotsu Abe
    • B08B7/00
    • B08B7/00B08B7/0035B08B13/00
    • A method for cleaning collector mirrors in an EUV light generator in which a target is made into a plasma state and EUV light generated is collected by a collector mirror, the method being adopted to the EUV light generator for cleaning contaminants adhering thereto, the method comprising: preparing at least two collector mirrors; locating one of the mirrors at an EUV light condensing position while locating the other mirror at a cleaning position; determining whether the mirror at the cleaning position is cleaned while determining whether the mirror at the light condensing position requires cleaning; and once determined that the mirror at the cleaning position is cleaned and the mirror at the light condensing position requires cleaning, conveying the mirror at the light condensing position and requiring cleaning to the cleaning position while conveying the mirror at the cleaning position and having been cleaned to the light condensing position.
    • 一种在EUV光发生器中清洁收集反射镜的方法,其中靶产生等离子体状态,并且通过集光镜收集产生的EUV光,该方法被用于EUV发光器,用于清除附着在其上的污染物,该方法包括 :准备至少两个收集镜; 将其中一个反射镜定位在EUV聚光位置,同时将另一个反射镜定位在清洁位置; 确定在清洁位置处的反射镜是否被清洁,同时确定在聚光位置的反射镜是否需要清洁; 并且一旦确定在清洁位置处的反射镜被清洁并且聚光位置处的反射镜需要清洁,则在反射镜处于聚光位置并且在将反射镜输送到清洁位置并且被清洁时需要清洁到清洁位置 到聚光位置。
    • 7. 发明授权
    • Differential evacuation system
    • 差分疏散系统
    • US08258492B2
    • 2012-09-04
    • US12631258
    • 2009-12-04
    • Hiroshi SomeyaYukio Watanabe
    • Hiroshi SomeyaYukio Watanabe
    • G21G5/00
    • G03F7/70841G03F7/70033G03F7/70808H05G2/003H05G2/008
    • [Technical Problem] To provide a differential evacuation system capable of easily maintaining, at a low cost, a large differential pressure between a light generation chamber and an illumination optical chamber in which optical processing, e.g. exposure, is performed by using extreme ultraviolet (EUV) light generated in the light generation chamber, and yet capable of sufficiently ensuring a desired optical path.[Solution to Problem] The differential evacuation system has a light generation chamber 10 that generates EUV light, an illumination optical chamber 100 in which optical processing is performed by using the EUV light generated in the light generation chamber 10, and a chamber connecting passage 150 that connects together the light generation chamber 10 and the illumination optical chamber 100 to guide the EUV light generated in the light generation chamber 10 into the illumination optical chamber 100. The chamber connecting passage 150 has a flow path constricting portion 151 and is increased in inner diameter in a conical tube shape at portions thereof that are at opposite sides, respectively, of the flow path constricting portion 151. An enlarged-diameter part 160 is provided at a position of the chamber connecting passage 150 that is closer to the light generation chamber 10, which is the higher in pressure of the two chambers 10 and 100, than the flow path constricting portion 151, and vacuum pumps 170 are attached to the enlarged-diameter part 160.
    • 技术问题提供一种能够以低成本容易地维持光生成室和照明光学室之间的大的压差的差分抽空系统,其中光学处理,例如, 曝光是通过使用在光产生室中产生的极紫外(EUV)光进行的,并且能够充分确保期望的光路。 [问题的解决方案]差分抽空系统具有产生EUV光的光生成室10,通过使用在光生成室10中产生的EUV光进行光学处理的照明光学室100和室连接通路150 将光生成室10和照明光学室100连接在一起,将发光室10内产生的EUV光引导到照明光学室100中。室连通路150具有流路收缩部151,内部增大 直径在分别位于流路收缩部151的相对侧的部分处的锥形管形状。扩径部160设置在室连接通道150的靠近光生成室的位置 如图10所示,两个腔室10和100的压力比流路收缩部分151高, 并且真空泵170附接到扩径部160。
    • 8. 发明申请
    • Differential evacuation system
    • 差分疏散系统
    • US20100181498A1
    • 2010-07-22
    • US12631258
    • 2009-12-04
    • Hiroshi SomeyaYukio Watanabe
    • Hiroshi SomeyaYukio Watanabe
    • G21K5/02
    • G03F7/70841G03F7/70033G03F7/70808H05G2/003H05G2/008
    • [Technical Problem] To provide a differential evacuation system capable of easily maintaining, at a low cost, a large differential pressure between a light generation chamber and an illumination optical chamber in which optical processing, e.g. exposure, is performed by using extreme ultraviolet (EUV) light generated in the light generation chamber, and yet capable of sufficiently ensuring a desired optical path.[Solution to Problem] The differential evacuation system has a light generation chamber 10 that generates EUV light, an illumination optical chamber 100 in which optical processing is performed by using the EUV light generated in the light generation chamber 10, and a chamber connecting passage 150 that connects together the light generation chamber 10 and the illumination optical chamber 100 to guide the EUV light generated in the light generation chamber 10 into the illumination optical chamber 100. The chamber connecting passage 150 has a flow path constricting portion 151 and is increased in inner diameter in a conical tube shape at portions thereof that are at opposite sides, respectively, of the flow path constricting portion 151. An enlarged-diameter part 160 is provided at a position of the chamber connecting passage 150 that is closer to the light generation chamber 10, which is the higher in pressure of the two chambers 10 and 100, than the flow path constricting portion 151, and vacuum pumps 170 are attached to the enlarged-diameter part 160.
    • 技术问题提供一种能够以低成本容易地维持光生成室和照明光学室之间的大的压差的差分抽空系统,其中光学处理,例如, 曝光是通过使用在光产生室中产生的极紫外(EUV)光进行的,并且能够充分确保期望的光路。 [问题的解决方案]差分抽空系统具有产生EUV光的光生成室10,通过使用在光生成室10中产生的EUV光进行光学处理的照明光学室100和室连接通路150 将光生成室10和照明光学室100连接在一起,将发光室10内产生的EUV光引导到照明光学室100中。室连通路150具有流路收缩部151,内部增大 直径在分别位于流路收缩部151的相对侧的部分处的锥形管形状。扩径部160设置在室连接通道150的靠近光生成室的位置 如图10所示,两个腔室10和100的压力比流路收缩部分151高, 并且真空泵170附接到扩径部160。
    • 9. 发明授权
    • Extreme ultraviolet light source apparatus and target supply device
    • 极紫外光源设备和目标供应装置
    • US08445877B2
    • 2013-05-21
    • US13081148
    • 2011-04-06
    • Hiroshi SomeyaTamotsu AbeHideo Hoshino
    • Hiroshi SomeyaTamotsu AbeHideo Hoshino
    • A61N5/06G01J3/10H05G2/00
    • H05G2/003H05G2/006
    • A nozzle protection device capable of protecting a target nozzle from heat of plasma without disturbing formation of a stable flow of a target material in an LPP type EUV light source apparatus. This nozzle protection device includes a cooling unit which is formed with an opening for passing the target material therethrough, and which is formed with a flow path for circulating a cooling medium inside, and an actuator which changes a position or a shape of the cooling unit between a first state of evacuating the cooling unit from a trajectory of the target material and a second state of blocking heat radiation from the plasma to the nozzle by the cooling unit while securing a path of the target material in the cooling unit.
    • 一种喷嘴保护装置,其能够保护目标喷嘴免受等离子体的热量的干扰,而不会在LPP型EUV光源装置中形成稳定的目标材料流。 该喷嘴保护装置包括冷却单元,该冷却单元形成有用于使目标材料通过的开口,并且其形成有用于使冷却介质在内部循环的流路;以及致动器,其改变冷却单元的位置或形状 在从所述目标材料的轨迹排出所述冷却单元的第一状态和通过所述冷却单元阻止从所述等离子体到所述喷嘴的热辐射的第二状态之间,同时确保所述目标材料在所述冷却单元中的路径。