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    • 1. 发明授权
    • Method of measuring the time for forming refractive index grating of a
photo-nonlinear medium
    • 测量光非线性介质折射率光栅形成时间的方法
    • US5303032A
    • 1994-04-12
    • US949392
    • 1992-09-22
    • Yoshiaki UesuJun IbaToshiyuki YoshiharaKazuyasu HikitaHiroyuki Iizuka
    • Yoshiaki UesuJun IbaToshiyuki YoshiharaKazuyasu HikitaHiroyuki Iizuka
    • G01N21/63G02F1/35H01S3/10H01S3/108G01B9/02
    • G02F1/3538G01N21/63
    • A laser beam with a wavelength .lambda. emitted from a laser beam source is split into first and second pump beams and a probe beam. The first and second pump beams are incident on light incident surfaces of a photo-nonlinear medium from opposing directions on the same optical path. The probe beam is incident on the light incident surface forming an angle with the first pump beam to generate interference fringes in the normal direction of the light incident surface and to form a refractive index grating. A phase conjugate wave is emitted in the reverse direction to an incident optical path of the probe beam by means of irradiating the second pump beam on the refractive index grating. A direct -current electric field is applied on a pair of external electrodes to be coincident to the wave vector of the interference fringes, where by providing a frequency modulation to the first pump beam using a piezoelectric oscillator, a moving speed "v" of the interference fringes is determined when light intensity of the phase conjugate wave is maximized. A forming time .tau. of the refractive index grating can thus be obtained. An accurate and rapid measurement can generally be obtained for the forming time of the refractive index grating of the photononlinear medium formed of photorefractive crystal including a cubic system such as BSO.
    • 从激光束源发射的具有波长λ的激光束被分成第一和第二泵浦光束和探测光束。 第一和第二泵浦光束在同一光路上从相对方向入射到光非线性介质的光入射表面上。 探测光束入射到与第一泵浦光束形成角度的光入射表面上,以在光入射表面的法线方向上产生干涉条纹并形成折射率光栅。 通过将第二泵浦光束照射在折射率光栅上,相反的共轭波在与探测光束的入射光路相反的方向上发射。 直流电场施加在一对外部电极上以与干涉条纹的波矢一致,其中通过使用压电振荡器向第一泵浦波束提供频率调制,移动速度“v” 当相位共轭波的光强度最大时,确定干涉条纹。 因此可以获得折射率光栅的形成时间τ。 通常可以获得由包括诸如BSO的立方体系的光折射晶体形成的光子线性介质的折射率光栅的形成时间的精确和快速的测量。
    • 2. 发明申请
    • Aberration correcting optical system
    • 畸变校正光学系统
    • US20060056038A1
    • 2006-03-16
    • US11268697
    • 2005-11-08
    • Toshiyuki Yoshihara
    • Toshiyuki Yoshihara
    • G02B3/00
    • G03F7/70483G02B5/3083G02B27/0025G03F7/70308G03F7/706
    • A projection system for projecting a pattern of a mask onto a substrate. The projection system includes a projection optical system disposed between the mask and the substrate, and an optical element for correcting aberration produced in the projection optical system. The optical element has different refracting powers in two orthogonal directions or has a refracting power in one direction of two orthogonal directions and no refracting power in the other of the two orthogonal directions. The optical element is disposed between the mask and the substrate, in which an optical axis of the optical element is inclined with respect to an optical axis of the projection optical system.
    • 一种用于将掩模图案投影到基底上的投影系统。 投影系统包括设置在掩模和基板之间的投影光学系统和用于校正在投影光学系统中产生的像差的光学元件。 光学元件在两个正交方向上具有不同的折射能力,或者在两个正交方向的一个方向上具有折射能,而在两个正交方向上的折射能力不相同。 光学元件设置在掩模和基板之间,光学元件的光轴相对于投影光学系统的光轴倾斜。
    • 3. 发明授权
    • Aberration correction optical system
    • 畸变校正光学系统
    • US06987621B2
    • 2006-01-17
    • US10936797
    • 2004-09-09
    • Toshiyuki Yoshihara
    • Toshiyuki Yoshihara
    • G02B3/00G02B9/00G02B13/08
    • G03F7/70483G02B5/3083G02B27/0025G03F7/70308G03F7/706
    • A projection system for projecting a pattern of a mask onto a substrate. The projection system includes a projection optical system disposed between the mask and the substrate, and an optical element for correcting aberration produced in the projection optical system. The optical element has different refracting powers in two orthogonal directions or has a refracting power in one direction of two orthogonal directions and no refracting power in the other of the two orthogonal directions. The optical element is disposed between the mask and the substrate. An optical axis of the optical element is inclined with respect to an optical axis of the projection optical system.
    • 一种用于将掩模图案投影到基底上的投影系统。 投影系统包括设置在掩模和基板之间的投影光学系统和用于校正在投影光学系统中产生的像差的光学元件。 光学元件在两个正交方向上具有不同的折射能力,或者在两个正交方向的一个方向上具有折射能,而在两个正交方向上的折射能力不相同。 光学元件设置在掩模和基板之间。 光学元件的光轴相对于投影光学系统的光轴倾斜。