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    • 5. 发明授权
    • Pressure sensitivity relief for photographic products
    • 摄影产品的压力敏感度
    • US5393650A
    • 1995-02-28
    • US265997
    • 1994-06-27
    • Pranab BagchiMelvin M. Kestner
    • Pranab BagchiMelvin M. Kestner
    • G03C1/04G03C1/043G03C1/38G03C1/76G03C1/95
    • G03C1/95G03C1/38
    • This invention describes the use of surfactants of the following types:Type A--Surfactant comprising 6 to 22 carbon atom hydrophobic tail with one or more attached hydrophilic chains comprising at least 8 oxyethylene and/or glycidyl ether groups that may or may not be terminated with a negative charge such as a sulfate group.Type B--Block oligomeric surfactants comprising hydrophobic polyoxypropylene blocks (A) and hydrophilic polyoxyethylene blocks (B) joined in the manner of A--B--A, B--A--B, A--B, (A--B.sub.n .tbd.G.tbd.(B--A).sub.n, or (B--A).sub.n .tbd.G(A--B).sub.n, where G is a connective organic moiety and n is between 1 and 3.Type C--Sugar surfactants, comprising between one to three 6 to 22 carbon atom hydrophobic tail with one or more attached hydrophilic mono or oligosaccharidic chains that may or may not be terminated by a negatively charged group such as a sulfate group.in combination with gelatin-grafted-polymer particles to obtain aggregation and defect free photographic multilayer coatings that are considerably low in pressure sensitivity.
    • 本发明描述了以下类型的表面活性剂的用途:A型表面活性剂,其包含6至22个碳原子的疏水尾部,其具有一个或多个附着的亲水链,其包含至少8个氧化乙烯和/或缩水甘油醚基团,其可以或可以不以 负电荷如硫酸根组。 包含以ABA,BAB,AB,(A-Bn 3BOND G 3BOND(BA)n或(BA)n 3BOND G)的方式连接的疏水性聚氧丙烯嵌段(A)和亲水性聚氧乙烯嵌段(B)的B型低聚表面活性剂 (AB)n,其中G是连接性有机部分,n在1和3之间。C型糖表面活性剂,包含1至3个6至22个碳原子的疏水尾部与一个或多个连接的亲水单糖或寡糖链, 或者可能不被带负电荷的基团如硫酸根基团终止,与明胶接枝聚合物颗粒组合以获得相当低的压敏度的聚集和无缺陷的照相多层涂层。
    • 10. 发明授权
    • Pressure sensitivity relief for photographic products
    • 摄影产品的压力敏感度
    • US5426020A
    • 1995-06-20
    • US114535
    • 1993-08-31
    • Pranab BagchiMelvin M. Kestner
    • Pranab BagchiMelvin M. Kestner
    • G03C1/04G03C1/043G03C1/38G03C1/76G03C1/95G03C1/77
    • G03C1/95G03C1/38
    • This invention describes the use of surfactants of the following types:Type A--Surfactant comprising 6 to 22 carbon atom hydrophobic tail with one or more attached hydrophilic chains comprising at least 8 oxyethylene and/or glycidyl ether groups that may or may not be terminated with a negative charge such as a sulfate group,Type B--Block oligomeric surfactants comprising hydrophobic polyoxypropylene blocks (A) and hydrophilic polyoxyethylene blocks (B) joined in the manner of A--B--A, B--A--B, A--B, (A--B.sub.n .tbd.G.tbd.(B--A).sub.n, or (B--A).sub.n .tbd.G(A--B).sub.n, where G is a connective organic moiety and n is between 1 and 3,Type C--Sugar surfactants, comprising between one to three 6 to 22 carbon atom hydrophobic tail with one or more attached hydrophilic mono or oligosaccharidic chains that may or may not be terminated by a negatively charged group such as a sulfate group.in combination with gelatin-grafted-polymer particles to obtain aggregation and defect free photographic multilayer coatings that are considerably low in pressure sensitivity.
    • 本发明描述了以下类型的表面活性剂的用途:A型表面活性剂,其包含6至22个碳原子的疏水尾部,其具有一个或多个附着的亲水链,其包含至少8个氧化乙烯和/或缩水甘油醚基团,其可以或可以不以 包含疏水性聚氧丙烯嵌段(A)和亲水性聚氧乙烯嵌段(B)的B型嵌段低聚表面活性剂如ABA,BAB,AB,(A-Bn 3BOND G 3BOND(BA) n或(BA)n 3BOND G(AB)n,其中G是连接性有机部分,n在1和3之间,C型糖表面活性剂包含1至3个6至22个碳原子的疏水尾部与1个或 更多附着的亲水单糖或寡糖链,其可以或可以不被带负电荷的基团如硫酸根基团终止,与明胶接枝聚合物颗粒组合以获得聚集和无缺陷的照相多层涂层 at压力敏感度相当低。