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    • 6. 发明申请
    • Method for fabricating an LCD device
    • LCD装置的制造方法
    • US20080121612A1
    • 2008-05-29
    • US11980817
    • 2007-10-31
    • Yeon Heui NamJin Wuk Kim
    • Yeon Heui NamJin Wuk Kim
    • C30B33/08
    • G02F1/1333B82Y10/00B82Y40/00G03F7/0002G03F7/0007
    • A method for fabricating an LCD device is disclosed, in which a reliable thin film pattern is formed as process deviation is minimized. The method includes forming a thin film on a substrate; forming an etch resist solution on the thin film; applying a soft mold having a concave portion and a convex portion to the etch resist solution, wherein the convex portion includes a first width and a second width different than the first width; forming an etch resist pattern having a predetermined linewidth controlled by the pressure applied by the soft mold; hardening the etch resist pattern; separating the soft mold from the substrate; and patterning the thin film using the etch resist pattern as a mask.
    • 公开了一种用于制造LCD装置的方法,其中当处理偏差最小化时形成可靠的薄膜图案。 该方法包括在基板上形成薄膜; 在薄膜上形成抗蚀剂溶液; 将具有凹部和凸部的软模具施加到所述抗蚀剂溶液,其中所述凸部包括不同于所述第一宽度的第一宽度和第二宽度; 形成具有由所述软模施加的压力控制的预定线宽的蚀刻抗蚀剂图案; 硬化蚀刻抗蚀剂图案; 将软模从衬底分离; 并使用抗蚀剂图案作为掩模来对薄膜进行构图。
    • 7. 发明授权
    • Method of fabricating a mold
    • 制造模具的方法
    • US08480936B2
    • 2013-07-09
    • US11645034
    • 2006-12-26
    • Jin Wuk KimYeon Heui Nam
    • Jin Wuk KimYeon Heui Nam
    • B29C35/08
    • G03F7/0017B29C33/3857B29C33/40B82Y10/00B82Y40/00G03F7/0002
    • A method for fabricating a mold includes the steps of forming a photo-polymerizable resin layer between a master substrate and a transparent mold substrate, wherein a first pattern is formed on the master substrate; solidifying the resin layer by exposing the resin layer to a UV light through the transparent mold substrate; and forming a mold having a second pattern by separating the resin layer from the master substrate, wherein the second pattern is in a form of a recess on the resin layer at a portion corresponding to the first pattern and the resin layer being engaged with the mold substrate.
    • 一种制造模具的方法包括以下步骤:在母基板和透明模具基板之间形成可光聚合树脂层,其中在母板上形成第一图案; 通过将树脂层暴露于通过透明模板的UV光而使树脂层固化; 以及通过从所述母基板分离所述树脂层而形成具有第二图案的模具,其中所述第二图案在与所述第一图案相对应的部分处在所述树脂层上的凹部的形式,并且所述树脂层与所述模具接合 基质。
    • 8. 发明授权
    • Method for fabricating an LCD device
    • LCD装置的制造方法
    • US07989271B2
    • 2011-08-02
    • US11980817
    • 2007-10-31
    • Yeon Heui NamJin Wuk Kim
    • Yeon Heui NamJin Wuk Kim
    • H01L21/00H01L21/84
    • G02F1/1333B82Y10/00B82Y40/00G03F7/0002G03F7/0007
    • A method for fabricating an LCD device is disclosed, in which a reliable thin film pattern is formed as process deviation is minimized. The method includes forming a thin film on a substrate; forming an etch resist solution on the thin film; applying a soft mold having a concave portion and a convex portion to the etch resist solution, wherein the convex portion includes a first width and a second width different than the first width; forming an etch resist pattern having a predetermined linewidth controlled by the pressure applied by the soft mold; hardening the etch resist pattern; separating the soft mold from the substrate; and patterning the thin film using the etch resist pattern as a mask.
    • 公开了一种用于制造LCD装置的方法,其中当处理偏差最小化时形成可靠的薄膜图案。 该方法包括在基板上形成薄膜; 在薄膜上形成抗蚀剂溶液; 将具有凹部和凸部的软模具施加到所述抗蚀剂溶液,其中所述凸部包括不同于所述第一宽度的第一宽度和第二宽度; 形成具有由所述软模施加的压力控制的预定线宽的蚀刻抗蚀剂图案; 硬化蚀刻抗蚀剂图案; 将软模从衬底分离; 并使用抗蚀剂图案作为掩模来对薄膜进行构图。