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1. 发明申请

US20110121096A1 PIEZOELECTRIC DEVICE, PIEZOELECTRIC DEVICE MANUFACTURING METHOD, AND LIQUID DISCHARGE APPARATUS 有权
标题翻译：压电器件，压电器件制造方法和液体放电设备
公开(公告)号：US20110121096A1
公开(公告)日：2011-05-26
申请号：US13000408
申请日：2009-07-27
申请人： Yasukazu Nihei , Takamichi Fujii , Yuuichi Okamoto , Takami Arakawa , Takayuki Naono
发明人： Yasukazu Nihei , Takamichi Fujii , Yuuichi Okamoto , Takami Arakawa , Takayuki Naono
IPC分类号： B05B1/08 , H01L41/22 , H01L41/18 , H01L41/04
CPC分类号： B41J2/161 , B41J2/1646 , C04B35/49 , H01L41/0805 , H01L41/0973 , H01L41/1875 , H01L41/316 , Y10T29/42
摘要： A piezoelectric device, including the following on a substrate in the order listed below: a lower electrode, a piezoelectric film which contains a Pb containing perovskite oxide represented by a general expression (P) below, and an upper electrode, in which the piezoelectric film has a layer of pyrochlore oxide on the surface facing the lower electrode, and the average layer thickness of the pyrochlore oxide layer is not greater than 20 nm. AaBbO3 (P) where, A: at least one type of A-site element containing Pb as a major component, B: at least one type of B-site element selected from the group consisting of Ti, Zr, V, Nb, Ta, Cr, Mo, W, Mn, Sc, Co, Cu, In, Sn, Ga, Zn, Cd, Fe, and Ni, and O: an oxygen element.
摘要翻译：一种压电装置，其以下列顺序包括在基板上：下电极，包含由下面的一般表达式（P）表示的含Pb的钙钛矿氧化物的压电膜和上电极，其中压电膜在面向下电极的表面上具有一层烧绿石氧化物，烧绿石氧化物层的平均层厚不大于20nm。 AaBbO3（P）其中A：至少一种含有Pb作为主要成分的A位元素，B：选自Ti，Zr，V，Nb，Ta中的至少一种B位元素，Cr，Mo，W，Mn，Sc，Co，Cu，In，Sn，Ga，Zn，Cd，Fe和Ni，O：氧元素。

2. 发明授权

US08801150B2 Piezoelectric device, piezoelectric device manufacturing method, and liquid discharge apparatus 有权
标题翻译：压电元件，压电元件的制造方法以及液体排出装置
公开(公告)号：US08801150B2
公开(公告)日：2014-08-12
申请号：US13000408
申请日：2009-07-27
申请人： Yoshikazu Hishinuma , Takehiro Kasahara , Yasukazu Nihei , Takamichi Fujii , Yuuichi Okamoto , Takami Arakawa , Takayuki Naono
发明人： Yoshikazu Hishinuma , Takehiro Kasahara , Yasukazu Nihei , Takamichi Fujii , Yuuichi Okamoto , Takami Arakawa , Takayuki Naono
IPC分类号： H01L41/18 , H01L41/083 , H01L41/04 , H01L41/02 , H01L41/00 , B41J2/045
CPC分类号： B41J2/161 , B41J2/1646 , C04B35/49 , H01L41/0805 , H01L41/0973 , H01L41/1875 , H01L41/316 , Y10T29/42
摘要： A piezoelectric device, including the following on a substrate in the order listed below: a lower electrode, a piezoelectric film which contains a Pb containing perovskite oxide represented by a general expression (P) below, and an upper electrode, in which the piezoelectric film has a layer of pyrochlore oxide on the surface facing the lower electrode, and the average layer thickness of the pyrochlore oxide layer is not greater than 20 nm. AaBbO3 (P) where, A: at least one type of A-site element containing Pb as a major component, B: at least one type of B-site element selected from the group consisting of Ti, Zr, V, Nb, Ta, Cr, Mo, W, Mn, Sc, Co, Cu, In, Sn, Ga, Zn, Cd, Fe, and Ni, and O: an oxygen element.
摘要翻译：一种压电装置，其以下列顺序包括在基板上：下电极，包含由下面的一般表达式（P）表示的含Pb的钙钛矿氧化物的压电膜和上电极，其中压电膜在面向下电极的表面上具有一层烧绿石氧化物，烧绿石氧化物层的平均层厚不大于20nm。 AaBbO3（P）其中A：至少一种含有Pb作为主要成分的A位元素，B：选自Ti，Zr，V，Nb，Ta中的至少一种B位元素，Cr，Mo，W，Mn，Sc，Co，Cu，In，Sn，Ga，Zn，Cd，Fe和Ni，O：氧元素。

3. 发明申请

US20110014394A1 FILM DEPOSITING APPARATUS AND METHOD 审中-公开
标题翻译：薄膜沉积装置和方法
公开(公告)号：US20110014394A1
公开(公告)日：2011-01-20
申请号：US12667429
申请日：2009-07-29
申请人： Takamichi Fujii , Takami Arakawa , Yasukazu Nihei
发明人： Takamichi Fujii , Takami Arakawa , Yasukazu Nihei
IPC分类号： C23C16/50 , C23C16/00
CPC分类号： C23C14/3414 , C23C14/088 , H01J37/3426 , H01J37/3435 , H01L21/67103
摘要： A film depositing apparatus comprises: a vacuum vessel; an evacuating unit for evacuating the interior of the vacuum vessel; a gas supply source for supplying the vacuum vessel with gases necessary for film deposition; a backing plate that is placed within the vacuum vessel for holding a target formed by sintering; a substrate holder for holding a deposition substrate within the vacuum vessel in a face-to-face relation with the backing plate; and a power supply unit for supplying electric power between the backing plate and the substrate holder to generate a plasma within the vacuum vessel, wherein the backing plate has a smaller thermal expansion coefficient than that of the target which has a sinter density of at least 95%, the sinter density representing the ratio of the actual weight of a sintered form of the target to its theoretical weight.
摘要翻译：一种成膜设备包括：真空容器; 用于排空真空容器内部的排气单元; 用于向真空容器供应用于膜沉积所需的气体的气体供应源; 放置在真空容器内用于保持通过烧结形成的靶的背板; 衬底保持器，用于以与衬板的面对面关系将沉积衬底保持在真空容器内; 以及电源单元，用于在所述背板和所述衬底保持器之间提供电力以在所述真空容器内产生等离子体，其中所述背板的热膨胀系数小于所述靶的烧结密度为至少95的热膨胀系数％，烧结密度代表目标烧结形式的实际重量与其理论重量之比。

4. 发明授权

US08366259B2 Film formation method, film formation device, piezoelectric film, piezoelectric device, liquid discharge device and piezoelectric ultrasonic transducer 有权
标题翻译：成膜方法，成膜装置，压电膜，压电装置，液体排出装置和压电超声换能器
公开(公告)号：US08366259B2
公开(公告)日：2013-02-05
申请号：US13443042
申请日：2012-04-10
申请人： Takamichi Fujii , Takayuki Naono , Takami Arakawa
发明人： Takamichi Fujii , Takayuki Naono , Takami Arakawa
IPC分类号： B41J2/17
CPC分类号： B41J2/155 , B41J2/14233 , C23C14/0036 , C23C14/088 , C23C14/3407 , C23C14/3471 , H01J37/32935 , H01J37/3299 , H01J37/34 , H01J37/3444 , H01L41/0477 , H01L41/0478 , H01L41/0973 , H01L41/316 , Y10T29/42 , Y10T428/31504
摘要： When a film containing constituent elements of a target is formed on a substrate through a vapor deposition process using plasma with placing the substrate and the target to face each other, a potential in a spatial range of at least 10 mm extending laterally from the outer circumference of the substrate is controlled to be equal to a potential on the substrate, and/or the substrate is surrounded with a wall surface having a potential controlled to be equal to the potential on the substrate.
摘要翻译：当通过使用等离子体的等离子体通过使基板和目标物彼此面对而在基板上形成含有靶的构成元素的膜时，从外周侧横向延伸的至少10mm的空间范围的电位被控制为等于衬底上的电位，并且/或者衬底被具有被控制为等于衬底上的电位的电位的壁表面包围。

5. 发明授权

US08172372B2 Film formation method, film formation device, piezoelectric film, piezoelectric device, liquid discharge device and piezoelectric ultrasonic transducer 有权
标题翻译：成膜方法，成膜装置，压电膜，压电装置，液体排出装置和压电超声换能器
公开(公告)号：US08172372B2
公开(公告)日：2012-05-08
申请号：US12618324
申请日：2009-11-13
申请人： Takamichi Fujii , Takayuki Naono , Takami Arakawa
发明人： Takamichi Fujii , Takayuki Naono , Takami Arakawa
IPC分类号： B41J2/045 , C23C14/34
CPC分类号： B41J2/155 , B41J2/14233 , C23C14/0036 , C23C14/088 , C23C14/3407 , C23C14/3471 , H01J37/32935 , H01J37/3299 , H01J37/34 , H01J37/3444 , H01L41/0477 , H01L41/0478 , H01L41/0973 , H01L41/316 , Y10T29/42 , Y10T428/31504
摘要： When a film containing constituent elements of a target is formed on a substrate through a vapor deposition process using plasma with placing the substrate and the target to face each other, a potential in a spatial range of at least 10 mm extending laterally from the outer circumference of the substrate is controlled to be equal to a potential on the substrate, and/or the substrate is surrounded with a wall surface having a potential controlled to be equal to the potential on the substrate.
摘要翻译：当通过使用等离子体的等离子体通过使基板和目标物彼此面对而在基板上形成含有靶的构成元素的膜时，从外周侧横向延伸的至少10mm的空间范围的电位被控制为等于衬底上的电位，并且/或者衬底被具有被控制为等于衬底上的电位的电位的壁表面包围。

6. 发明授权

US08672456B2 Piezoelectric film, piezoelectric device and liquid ejection apparatus 有权
标题翻译：压电薄膜，压电装置和液体喷射装置
公开(公告)号：US08672456B2
公开(公告)日：2014-03-18
申请号：US13168302
申请日：2011-06-24
申请人： Takami Arakawa , Takayuki Naono , Takamichi Fujii
发明人： Takami Arakawa , Takayuki Naono , Takamichi Fujii
IPC分类号： B41J2/045
CPC分类号： H01L41/1876 , B41J2/14233 , B41J2202/03 , C04B35/493 , C04B2235/3255 , C04B2235/3298 , C04B2235/768 , C04B2235/79 , H01L41/0805 , H01L41/0973 , H01L41/316
摘要： A piezoelectric film has a columnar crystal structure constituted of a plurality of columnar crystals, and contains a perovskite oxide represented by the following formula (P) as a main component: PbaAb[(ZrcTi1-c)1-dBd]Oe, (P) where Pb and A are A-site elements, and A is at least one element selected from a group consisting of Bi, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Ca, Sr and Ba; Zr, Ti and B are B-site elements, and B is at least one element selected from a group consisting of Nb, Ta and Sb; a is an amount of lead, b is an amount of the element A, c is a Zr/Ti ratio, d is an amount of the element B, e is an amount of oxygen; values of a, b and d satisfy a
摘要翻译：压电膜具有由多个柱状晶体构成的柱状晶体结构，并含有下述式（P）表示的钙钛矿氧化物作为主要成分：PbaAb [（ZrcTi1-c）1-dBd] Oe，（P）其中Pb和A是A位元素，A是选自Bi，La，Ce，Pr，Nd，Sm，Eu，Gd，Tb，Dy，Ho，Er，Tm，Yb中的至少一种元素，Lu，Ca，Sr和Ba; Zr，Ti和B是B位元素，B是选自Nb，Ta和Sb中的至少一种元素; a是铅的量，b是元素A的量，c是Zr / Ti比，d是元素B的量，e是氧的量; a，b和d的值满足<1，a + b> = 1和0

7. 发明申请

US20110074888A1 Piezoelectric Actuator, Method of Driving Same, Liquid Ejection Apparatus and Piezoelectric Ultrasonic Osicllator 有权
标题翻译：压电致动器，驱动方法，液体喷射装置和压电超声波振荡器
公开(公告)号：US20110074888A1
公开(公告)日：2011-03-31
申请号：US12892904
申请日：2010-09-28
申请人： Takamichi Fujii , Yoshikazu Hishinuma , Yoshinori Katoh , Takami Arakawa , Takayuki Naono
发明人： Takamichi Fujii , Yoshikazu Hishinuma , Yoshinori Katoh , Takami Arakawa , Takayuki Naono
IPC分类号： B41J2/045 , H01L41/09 , H01L41/18
CPC分类号： H01L41/042 , B41J2/04581 , B41J2/04588 , H01L41/0973 , H01L41/1876
摘要： A method of driving a piezoelectric actuator including: a piezoelectric element containing a piezoelectric body having coercive field points on a negative field side and a positive field side respectively and having asymmetrical bipolar polarization—electric field hysteresis characteristics in which an absolute value of a coercive electric field on the negative field side and a coercive electric field value on the positive field side are mutually different, and a pair of electrodes for applying voltage to the piezoelectric body; and a diaphragm which externally transmits, as displacement, distortion produced in the piezoelectric body when the voltage is applied to the piezoelectric body, includes the step of driving the piezoelectric actuator between a positive drive voltage and a negative drive voltage in a range not exceeding the coercive electric field, from among the positive and negative coercive electric fields, which has the larger absolute value.
摘要翻译：一种驱动压电致动器的方法，包括：压电元件，其包含分别具有负场侧和正场侧的矫顽场的压电体，并具有不对称双极偏振电场滞后特性，其中矫顽电绝对值并且在正场侧的矫顽电场值相互不同，以及一对用于向压电体施加电压的电极; 以及当施加电压施加到压电体时，在外部透射作为位移的压电体产生的变形的振动膜包括在不超过压电体的范围内驱动压电致动器的正驱动电压和负驱动电压之间的步骤矫顽电场中，绝对值较大的正，负矫顽电场。

8. 发明授权

US08449083B2 Multilayer body, piezoelectric element, and liquid ejecting device 有权
标题翻译：多层体，压电元件和液体喷射装置
公开(公告)号：US08449083B2
公开(公告)日：2013-05-28
申请号：US12538977
申请日：2009-08-11
申请人： Takamichi Fujii , Takami Arakawa , Takayuki Naono , Yoshikazu Hishinuma
发明人： Takamichi Fujii , Takami Arakawa , Takayuki Naono , Yoshikazu Hishinuma
IPC分类号： B41J2/045
CPC分类号： H01L41/0815 , B41J2/1612 , B41J2/1642 , B41J2/1646 , H01L41/0477 , Y10T29/42
摘要： A multilayer body which includes a low-resistance metal layer having a low electrical resistance, excellent thermal resistance and low surface irregularity is provided. The multilayer body includes a substrate, and a low-resistance metal layer which is formed on the substrate and has a single-layer structure or a multilayer structure of two or more sublayers. The low-resistance metal layer includes a gold-containing layer or sublayer composed of gold and another metal.
摘要翻译：提供一种包括具有低电阻，优异的耐热性和低表面不规则性的低电阻金属层的多层体。多层体包括基板和形成在基板上的具有单层结构或两层以上的亚层的多层结构的低电阻金属层。低电阻金属层包括由金和另一种金属构成的含金层或子层。

9. 发明申请

US20110316937A1 PIEZOELECTRIC FILM, PIEZOELECTRIC DEVICE AND LIQUID EJECTION APPARATUS 有权
标题翻译：压电薄膜，压电装置和液体喷射装置
公开(公告)号：US20110316937A1
公开(公告)日：2011-12-29
申请号：US13168302
申请日：2011-06-24
申请人： Takami ARAKAWA , Takayuki Naono , Takamichi Fujii
发明人： Takami ARAKAWA , Takayuki Naono , Takamichi Fujii
IPC分类号： B41J2/045 , C04B35/491
CPC分类号： H01L41/1876 , B41J2/14233 , B41J2202/03 , C04B35/493 , C04B2235/3255 , C04B2235/3298 , C04B2235/768 , C04B2235/79 , H01L41/0805 , H01L41/0973 , H01L41/316
摘要： A piezoelectric film has a columnar crystal structure constituted of a plurality of columnar crystals, and contains a perovskite oxide represented by the following formula (P) as a main component: PbaAb[(ZrcTil-c)l-dBd]Oe, (P) where Pb and A are A-site elements, and A is at least one element selected from a group consisting of Bi, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Ca, Sr and Ba; Zr, Ti and B are B-site elements, and B is at least one element selected from a group consisting of Nb, Ta and Sb; a is an amount of lead, b is an amount of the element A, c is a Zr/Ti ratio, d is an amount of the element B, e is an amount of oxygen; values of a, b and d satisfy a
摘要翻译：压电膜具有由多个柱状晶体构成的柱状晶体结构，并含有下述式（P）表示的钙钛矿氧化物作为主要成分：PbaAb [（ZrcTil-c）l-dBd] Oe，（P）其中Pb和A是A位元素，A是选自Bi，La，Ce，Pr，Nd，Sm，Eu，Gd，Tb，Dy，Ho，Er，Tm，Yb中的至少一种元素，Lu，Ca，Sr和Ba; Zr，Ti和B是B位元素，B是选自Nb，Ta和Sb中的至少一种元素; a是铅的量，b是元素A的量，c是Zr / Ti比，d是元素B的量，e是氧的量; a，b和d的值满足<1，a +b≥1，0

10. 发明授权

US08562112B2 Piezoelectric actuator, method of driving same, liquid ejection apparatus and piezoelectric ultrasonic osicllator 有权
标题翻译：压电致动器，驱动方法，液体喷射装置和压电超声波振荡器
公开(公告)号：US08562112B2
公开(公告)日：2013-10-22
申请号：US12892904
申请日：2010-09-28
申请人： Takamichi Fujii , Yoshikazu Hishinuma , Yoshinori Katoh , Takami Arakawa , Takayuki Naono
发明人： Takamichi Fujii , Yoshikazu Hishinuma , Yoshinori Katoh , Takami Arakawa , Takayuki Naono
IPC分类号： B41J2/045
CPC分类号： H01L41/042 , B41J2/04581 , B41J2/04588 , H01L41/0973 , H01L41/1876
摘要： A method of driving a piezoelectric actuator including: a piezoelectric element containing a piezoelectric body having coercive field points on a negative field side and a positive field side respectively and having asymmetrical bipolar polarization—electric field hysteresis characteristics in which an absolute value of a coercive electric field on the negative field side and a coercive electric field value on the positive field side are mutually different, and a pair of electrodes for applying voltage to the piezoelectric body; and a diaphragm which externally transmits, as displacement, distortion produced in the piezoelectric body when the voltage is applied to the piezoelectric body, includes the step of driving the piezoelectric actuator between a positive drive voltage and a negative drive voltage in a range not exceeding the coercive electric field, from among the positive and negative coercive electric fields, which has the larger absolute value.
摘要翻译：一种驱动压电致动器的方法，包括：压电元件，其包含分别具有负场侧和正场侧的矫顽场的压电体，并具有不对称双极偏振电场滞后特性，其中矫顽电绝对值并且在正场侧的矫顽电场值相互不同，以及一对用于向压电体施加电压的电极; 以及当施加电压施加到压电体时，在外部透射作为位移的压电体产生的变形的振动膜包括在不超过压电体的范围内驱动压电致动器的正驱动电压和负驱动电压之间的步骤矫顽电场中，绝对值较大的正，负矫顽电场。

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