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    • 10. 发明授权
    • Electrically erasable and programmable non-volatile memory device and a
method of operating the same
    • 电可擦除和可编程的非易失性存储器件及其操作方法
    • US5428568A
    • 1995-06-27
    • US933436
    • 1992-08-20
    • Shinichi KobayashiYasushi TeradaTakeshi NakayamaYoshikazu MiyawakiTomoshi Futatsuya
    • Shinichi KobayashiYasushi TeradaTakeshi NakayamaYoshikazu MiyawakiTomoshi Futatsuya
    • G11C16/10G11C16/12G11C16/16G11C16/34G11C11/34
    • G11C16/3409G11C16/10G11C16/12G11C16/16G11C16/3404G11C16/3445G11C16/3459
    • In a programming mode of operation of a flash type non-volatile semiconductor memory device, an erase voltage pulse is applied a memory cell to bring the memory cell into an erased state. Then, an after-erase writing operation is executed for a memory cell having a threshold voltage lower than a predetermined threshold voltage under the condition of small change in threshold voltage. Alternatively, an erase voltage pulse is applied only to a memory cell having a threshold voltage greater than a predetermined threshold voltage to carry out erasing. Also, after a memory cell is brought to a depletion state by application of an erase voltage pulse, data writing of "0" and "1" is carried out by injection of electrons into the floating gate. The electron injection rate to the floating gate for writing data "0" is set to be greater than that for writing data "1". The state of storing data "1" corresponds to an erase state. According to this scheme, an excessively erased memory cell does not exist and the distribution range of threshold voltage can be reduced. Furthermore, the reprogramming time period for a memory cell data can be carried out in a short time.
    • 在闪存型非易失性半导体存储器件的编程操作模式中,擦除电压脉冲被施加到存储器单元以使存储单元进入擦除状态。 然后,在阈值电压变化小的条件下,对具有低于预定阈值电压的阈值电压的存储单元执行擦除后写入操作。 或者,擦除电压脉冲仅施加到具有大于预定阈值电压的阈值电压的存储器单元以执行擦除。 此外,在通过施加擦除电压脉冲将存储单元置于耗尽状态之后,通过向浮置栅极注入电子来执行“0”和“1”的数据写入。 写入数据“0”的浮动栅极的电子注入速率被设定为大于写入数据“1”的电子注入速率。 存储数据“1”的状态对应于擦除状态。 根据该方案,不存在过度擦除的存储单元,并且可以减小阈值电压的分布范围。 此外,存储单元数据的重新编程时间段可以在短时间内进行。