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    • 5. 发明申请
    • Process for Preparing Organically Modified Layered Double Hydroxide
    • 制备有机改性层状双氢氧化物的方法
    • US20080293957A1
    • 2008-11-27
    • US12096433
    • 2006-12-01
    • Robin WintersElwin SchomakerSiebe Cornelis De VosMarianne Frederika ReedijkJohanna Henriette Zijtveld-Van Der Wiel
    • Robin WintersElwin SchomakerSiebe Cornelis De VosMarianne Frederika ReedijkJohanna Henriette Zijtveld-Van Der Wiel
    • C07F5/06
    • C01F7/005C01B13/363C01F7/002C01P2002/22C01P2002/78
    • The invention relates to a process for preparing an organically modified layered double hydroxide having a distance between the individual layers of the layered double hydroxide of above 1.5 nm and comprising an organic anion as charge-balancing anion, the process comprising the steps of: (a) preparing a precursor suspension comprising a divalent metal ion source and a trivalent metal ion source; (b) solvothermally treating the precursor suspension to obtain the layered double hydroxide, wherein an organic anion is added before or during the formation of the layered double hydroxide of step (b), or following the formation of the layered double hydroxide, so as to obtain the organically modified layered double hydroxide, with the proviso that deoxycholic acid is not the sole organic anion. The invention further pertains to a process for preparing an organically modified layered double hydroxide having a distance between the individual layers of the layered double hydroxide of above 1.5 nm and comprising an organic anion as charge-balancing anion, the process comprising the steps of: (a) preparing a precursor suspension comprising a divalent metal ion source and a trivalent metal ion source; (b) thermally treating the precursor suspension to obtain the layered double hydroxide, wherein an organic anion is added before or during the formation of the layered double hydroxide of step (b), or following the formation of the layered double hydroxide, so as to obtain the organically modified layered double hydroxide, with the proviso that in step a) the trivalent metal ion source is not reacted with the organic anion at a temperature of between 60 and 85° C. for 4 to 8 hours prior to the addition of the divalent metal ion source and step b) is subsequently carried out at a temperature of 90 to 95° C. for 4 to 8 hours.
    • 本发明涉及一种制备有机改性层状双氢氧化物的方法,其具有1.5nm以上层状双氢氧化物的各层之间的距离,并且包含作为电荷平衡阴离子的有机阴离子,该方法包括以下步骤:(a )制备包含二价金属离子源和三价金属离子源的前体悬浮液; (b)溶剂化处理前体悬浮液以获得层状双氢氧化物,其中在形成步骤(b)的层状双氢氧化物之前或阶段期间加入有机阴离子,或在形成层状双氢氧化物之后加入有机阴离子,以便 获得有机改性的层状双氢氧化物,条件是脱氧胆酸不是唯一的有机阴离子。 本发明还涉及一种制备有机改性的层状双氢氧化物的方法,其具有1.5nm以上层状双氢氧化物的各层之间的距离,并且包含有机阴离子作为电荷平衡阴离子,该方法包括以下步骤:( a)制备包含二价金属离子源和三价金属离子源的前体悬浮液; (b)热处理前体悬浮液以获得层状双氢氧化物,其中在步骤(b)的层状双氢氧化物形成之前或期间,或在形成层状双氢氧化物之后加入有机阴离子,以便 获得有机改性的层状双氢氧化物,条件是在步骤a)中,三价金属离子源在有机阴离子之间在60至85℃的温度下不与有机阴离子反应4至8小时,然后加入 二价金属离子源和步骤b)随后在90至95℃的温度下进行4至8小时。