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    • 1. 发明授权
    • Polymerizable dental compositions
    • 可聚合牙科组合物
    • US06852775B1
    • 2005-02-08
    • US10018660
    • 2000-06-21
    • Wolfgang SoglowekKeith O'Connell
    • Wolfgang SoglowekKeith O'Connell
    • A61K6/083C08F2/44A61K6/10C08F4/40
    • A61K6/083A61K6/0023A61K6/005C08L33/00
    • The invention relates to polymerizable dental compositions which contain (a) 10 to 98.999 wt.-% of at least one bi- or higher-functional ethylenically unsaturated monomer, (b) 0 to 88.999 wt.-% of at least one monofunctional ethylenically unsaturated monomer, (c) 0 to 5 wt.-% of an accelerator, (d) 0.001 to 5 wt.-% of a redox initiator system which can trigger the radical polymerisation and (e) 0 to 88.999 wt.-% fillers, thixotropic auxiliaries, retarders and other auxiliaries (f) 1 to 30 wt.-% of a customary plasticizer and are characterized in that the redox initiator system comprises (i) a barbituric acid derivative and/or a malonyl sulfamide and (ii) an organic peroxide, selected from the group of the mono- or multifunctional carboxylic acid peroxyesters, and the constituents (a) to (f) are present in two pastes spatially separated from each other. The dental compositions are suitable as filling material, stump build-up material, fixing cement, temporary crown and bridge material, dental material or for the preparation of inlays, onlays, facing shells, modelling materials.
    • 本发明涉及可聚合牙科组合物,其含有(a)10至98.999重量%的至少一种双官能或更高官能的烯属不饱和单体,(b)0至88.999重量%的至少一个单官能烯属不饱和单体 单体,(c)0至5重量%的促进剂,(d)0.001至5重量%的可引发自由基聚合的氧化还原引发剂体系,和(e)0至88.999重量%的填料, 触变助剂,缓凝剂和其它助剂(f)占常规增塑剂的1至30重量%,其特征在于氧化还原引发剂体系包含(i)巴比妥酸衍生物和/或丙二酰基磺酰胺和(ii)有机过氧化物 选自单官能或多官能羧酸过氧酯的组,和(a)至(f)组分存在于彼此空间分离的两个糊料中。 牙科用组合物适用于填充材料,树桩堆积材料,固定水泥,临时牙冠和桥梁材料,牙科材料或用于制备嵌体,镶嵌,面罩,造型材料。
    • 2. 发明授权
    • Dental materials
    • 牙科材料
    • US06936642B2
    • 2005-08-30
    • US10168092
    • 2000-12-15
    • Thomas LehmannWolfgang SoglowekReinhold Hecht
    • Thomas LehmannWolfgang SoglowekReinhold Hecht
    • A61C13/003A61K6/09A61K6/08C08L75/04
    • A61K6/083A61K6/09C08L75/16C08L33/00
    • The invention relates to compositions containing: (a) 14 to 55 wt.-% fillers, (b) 3 to 35 wt.-% of at least one mono- or polyethylenically unsaturated compound which is not a urethane (meth)acrylate, (c) 0.1 to 5 wt.-% of at least one initiator system which is capable of starting a radical reaction, (d) 1 to 40 wt.-% plasticizers, (e) 0 to 10 wt.-% auxiliaries such as dyes, pigments, stabilizers, solvents, rheological additives such as flow-improvers and/or retarders, and (f) 30 to 81.9 wt.-% of at least two urethane (meth)acrylates with different molecular weights, these being present in a molecular weight ratio of 1.5:1 to 50:1.
    • 本发明涉及包含:(a)14至55重量%的填料,(b)3至35重量%的至少一种不是聚氨酯(甲基)丙烯酸酯的单或多烯属不饱和化合物( c)0.1至5重量%的至少一种能够开始自由基反应的引发剂体系,(d)1至40重量%的增塑剂,(e)0至10重量%的助剂如染料 ,颜料,稳定剂,溶剂,流变添加剂如流动改进剂和/或缓凝剂,和(f)30至81.9重量%的至少两种具有不同分子量的氨基甲酸酯(甲基)丙烯酸酯,它们分子 重量比为1.5:1至50:1。
    • 6. 发明授权
    • Polymerisable materials which are based on hardenable siloxane compounds
    • US06566413B1
    • 2003-05-20
    • US09868525
    • 2001-09-19
    • Wolfgang WeinmannJoachim ZechOswald GasserRainer GuggenbergerGunther EckhardtPeter BissingerWolfgang Soglowek
    • Wolfgang WeinmannJoachim ZechOswald GasserRainer GuggenbergerGunther EckhardtPeter BissingerWolfgang Soglowek
    • C08F246
    • A61K6/083C07F7/21C08L51/085
    • The invention relates to novel cyclic siloxane compounds of the following general formula (I): in which: n=0, 1, 2, 3, 4, 5, 6, 7, 8, 9, 10 preferably 1, 2, 3, 4, 5; A=H or C1-C15 alk(en)yl, C3-C15 cycloalk(en)yl, C6-C12 aryl, C8-C18 alkaryl, where, in the said radicals, in each case one or more C atoms can be replaced by O, C═O, O(C═O), SiR2 and/or NR, R being an aliphatic radical with 1 to 7 C atoms, in which one or more C atoms can be replaced by O, C═O, and/or O(C═O); B=E or a linear, branched or polycyclic aliphatic- or aromatic-groups-containing hydrocarbon radical which links 2 to 10 of the cyclosiloxane radicals defined above, less B, to one another and contains 2 to 50 C atoms and additionally 0 to 30 other atoms from the group O, N, S, P, Si, Cl, F, Br, I and from which correspondingly 1 to 9, preferably 1 to 4 of the above defined cyclosiloxane radicals, less B, are pending; E=A or a polymerizable group G—Q—L, where on average up to 50% or less of the groups E correspond to representatives of A; G=C1-10 alk(en)ylene; Q=O, N—A or a di- or polyvalent linear, branched or cyclic alcohol, amine or aminoalcohol radical with 2 to 10 C atoms; L=an organic radical, containing a C═C double bond, with 2 to 10 C atoms; and with the proviso that no annelated siloxane ring systems can occur in (I), and also dental compositions which contain the compounds of formula (I) and/or compounds of formula (II): in which: T=independently of each other H or C1-C10 alk(en)yl, C3-C10 cycloalk(en)yl, C6-C12 aryl or C8-C8 alkaryl; N=a polymerizable group R1—R2—R3; b=0 to 500, where the proportion b may be at most 50% of the repeat units (b+c); c=1 to 1000; R1=C1-C10 alk(en)ylene; R2=O, N—T or a di- or polyvalent linear, branched or cyclic alcohol, amine or aminoalcohol radical with 2 to 10 C atoms; R3=an organic radical, containing a C═C double bond, with 3 to 10 C atoms; V=SiMe2T, SiEt2T, SiMePhT, SiPh2T.