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1. 发明授权

US08778481B2 Security element and method for the production thereof 有权
标题翻译：安全要素及其生产方法
公开(公告)号：US08778481B2
公开(公告)日：2014-07-15
申请号：US11816514
申请日：2006-02-10
申请人： Wittich Kaule , Manfred Heim , Marius Dichtl , Winfried Hoffmuller
发明人： Wittich Kaule , Manfred Heim , Marius Dichtl , Winfried Hoffmuller
IPC分类号： B32B3/00 , B32B7/00 , B32B15/00 , B42D15/10 , B42D15/00
CPC分类号： B42D15/00 , B42D25/29 , B42D25/324 , B42D25/355 , B42D2033/10 , B42D2033/24 , B42D2035/24 , B42D2035/44 , D21H21/44 , G02B3/0056 , G02B3/0062 , Y10T428/24355 , Y10T428/24802 , Y10T428/24917
摘要： The present invention relates to a security element for protecting valuable articles, having a first and a second authenticating feature. The first authenticating feature comprises a first arrangement having a plurality of focusing elements present in a first grid, and a second arrangement having a plurality of microscopic structures present in a second grid. Here, the first and second arrangement are disposed in such a way that the microscopic structures of the second arrangement are seen magnified when viewed through the focusing elements of the first arrangement. The second authenticating feature is machine and/or visually verifiable and is not influenced by the first arrangement of the first authenticating feature.
摘要翻译：本发明涉及一种用于保护有价物品的安全元件，具有第一和第二认证特征。第一认证特征包括具有存在于第一格栅中的多个聚焦元件的第一布置，以及具有存在于第二格栅中的多个微观结构的第二布置。这里，第一和第二布置以这样的方式设置，使得当通过第一布置的聚焦元件观察时，第二布置的微观结构被看到放大。第二认证特征是机器和/或视觉上可验证的，并且不受第一认证特征的第一布置的影响。

2. 发明申请

US20080160226A1 Security Element and Method for the Production Thereof 有权
标题翻译：安全要素及其制作方法
公开(公告)号：US20080160226A1
公开(公告)日：2008-07-03
申请号：US11816514
申请日：2006-02-10
申请人： Wittich Kaule , Manfred Heim , Marius Dichtl , Winfried Hoffmuller
发明人： Wittich Kaule , Manfred Heim , Marius Dichtl , Winfried Hoffmuller
IPC分类号： B44F1/12 , B05D1/36 , D06N7/04
CPC分类号： B42D15/00 , B42D25/29 , B42D25/324 , B42D25/355 , B42D2033/10 , B42D2033/24 , B42D2035/24 , B42D2035/44 , D21H21/44 , G02B3/0056 , G02B3/0062 , Y10T428/24355 , Y10T428/24802 , Y10T428/24917
摘要： The present invention relates to a security element for protecting valuable articles, having a first and a second authenticating feature. The first authenticating feature comprises a first arrangement having a plurality of focusing elements present in a first grid, and a second arrangement having a plurality of microscopic structures present in a second grid. Here, the first and second arrangement are disposed in such a way that the microscopic structures of the second arrangement are seen magnified when viewed through the focusing elements of the first arrangement. The second authenticating feature is machine and/or visually verifiable and is not influenced by the first arrangement of the first authenticating feature.
摘要翻译：本发明涉及一种用于保护有价物品的安全元件，具有第一和第二认证特征。第一认证特征包括具有存在于第一格栅中的多个聚焦元件的第一布置，以及具有存在于第二格栅中的多个微观结构的第二布置。这里，第一和第二布置以这样的方式设置，使得当通过第一布置的聚焦元件观察时，第二布置的微观结构被看到放大。第二认证特征是机器和/或视觉上可验证的，并且不受第一认证特征的第一布置的影响。

3. 发明申请

US20050150740A1 Devices and method for the production of sheet material 失效
标题翻译：用于生产片材的装置和方法
公开(公告)号：US20050150740A1
公开(公告)日：2005-07-14
申请号：US10499018
申请日：2002-12-19
申请人： Klaus Finkenzeller , Thomas Giering , Manfred Heim , Thomas Hildebrandt , Ralf Hobmeier , Lars Hoffmann , Norbert Holl , Wittich Kaule , Friedrich Kretschmar , Markus Krombholz , Ralf Liebler , Thorsten Pillo , Harald Reiner , Walter Schneider , Eckart Schroeder-Bergen , Martin Seysen , Dieter Stein , Alexander Steinkogler , Christian Voellmer , Bernd Wunderer , Fabiola Bellersheim , Marius Dichtl , Juergen Schuetzmann
发明人： Klaus Finkenzeller , Thomas Giering , Manfred Heim , Thomas Hildebrandt , Ralf Hobmeier , Lars Hoffmann , Norbert Holl , Wittich Kaule , Friedrich Kretschmar , Markus Krombholz , Ralf Liebler , Thorsten Pillo , Harald Reiner , Walter Schneider , Eckart Schroeder-Bergen , Martin Seysen , Dieter Stein , Alexander Steinkogler , Christian Voellmer , Bernd Wunderer , Fabiola Bellersheim , Marius Dichtl , Juergen Schuetzmann
IPC分类号： B42D15/00 , G07D7/00 , G07D7/02 , G07D7/04 , G07D7/08 , G07D7/12 , G07F1/06 , G06K7/00 , G06K9/00 , G07F7/04
CPC分类号： B42D25/485 , B42D25/29 , B42D2033/46 , G07D7/01 , G07F1/06
摘要： The invention relates to sheet material having an electrical circuit and to apparatuses and methods for processing said sheet material. The present invention describes sheet material having an electrical circuit as well as apparatuses and methods for processing same, which reduce the effort required for processing the sheet material and/or facilitate processing and/or improve it and/or make it more reliable. For this purpose, the sheet material has at least one electrical circuit, with energy and/or data being transmitted from the apparatus to the electrical circuit and/or from the electrical circuit to the apparatus and at least part of the transmitted data being used for processing.
摘要翻译：本发明涉及具有电路的片材和用于加工所述片材的装置和方法。本发明描述了具有电路的片材以及用于加工片材的装置和方法，其减少了加工片材和/或促进加工和/或改进片材和/或使其更可靠的加工所需的努力。为此，片材材料具有至少一个电路，其中能量和/或数据从设备传输到电路和/或从电路传输到设备，并且至少部分传输的数据被用于处理。

4. 发明授权

US07849993B2 Devices and method for the production of sheet material 失效
标题翻译：用于生产片材的设备和方法
公开(公告)号：US07849993B2
公开(公告)日：2010-12-14
申请号：US10499018
申请日：2002-12-19
申请人： Klaus Finkenzeller , Thomas Giering , Manfred Heim , Thomas Hildebrandt , Ralf Hobmeier , Lars Hoffmann , Norbert Holl , Wittich Kaule , Friedrich Kretschmar , Markus Krombholz , Ralf Liebler , Thorsten Pillo , Harald Reiner , Walter Schneider , Eckart Schroeder-Bergen , Martin Seysen , Dieter Stein , Alexander Steinkogler , Christian Voellmer , Bernd Wunderer , Fabiola Bellersheim , Marius Dichtl , Juergen Schuetzmann
发明人： Klaus Finkenzeller , Thomas Giering , Manfred Heim , Thomas Hildebrandt , Ralf Hobmeier , Lars Hoffmann , Norbert Holl , Wittich Kaule , Friedrich Kretschmar , Markus Krombholz , Ralf Liebler , Thorsten Pillo , Harald Reiner , Walter Schneider , Eckart Schroeder-Bergen , Martin Seysen , Dieter Stein , Alexander Steinkogler , Christian Voellmer , Bernd Wunderer , Fabiola Bellersheim , Marius Dichtl , Juergen Schuetzmann
IPC分类号： G07F7/04
CPC分类号： B42D25/485 , B42D25/29 , B42D2033/46 , G07D7/01 , G07F1/06
摘要： The invention relates to sheet material having an electrical circuit and to apparatuses and methods for processing said sheet material.The present invention describes sheet material having an electrical circuit as well as apparatuses and methods for processing same, which reduce the effort required for processing the sheet material and/or facilitate processing and/or improve it and/or make it more reliable. For this purpose, the sheet material has at least one electrical circuit, with energy and/or data being transmitted from the apparatus to the electrical circuit and/or from the electrical circuit to the apparatus and at least part of the transmitted data being used for processing.
摘要翻译：本发明涉及具有电路的片材和用于加工所述片材的装置和方法。本发明描述了具有电路的片材以及用于加工片材的装置和方法，其减少了加工片材和/或促进加工和/或改进片材和/或使其更可靠的加工所需的努力。为此，片材材料具有至少一个电路，其中能量和/或数据从设备传输到电路和/或从电路传输到设备，并且至少部分传输的数据被用于处理。

5. 发明申请

US20080198468A1 Grid Image and Method For the Production Thereof 失效
标题翻译：网格图像及其制作方法
公开(公告)号：US20080198468A1
公开(公告)日：2008-08-21
申请号：US11995228
申请日：2006-07-04
申请人： Wittich Kaule , Marius Dichtl
发明人： Wittich Kaule , Marius Dichtl
IPC分类号： G02B5/18 , G03H1/26 , G02B5/32
CPC分类号： B44F1/10 , G02B5/32
摘要： The present invention relates to a grating image (12) for depicting at least one unscreened halftone image having multiple brightness levels, the grating image exhibiting multiple grating fields (22-1, 22-2, 22-3) that include in each case an electromagnetic-radiation-influencing grating pattern composed of a plurality of grating lines and that, when illuminated, produce in each case an areal region of the halftone image having the same brightness level.
摘要翻译：本发明涉及用于描绘具有多个亮度级别的至少一个未屏蔽半色调图像的光栅图像（12），该光栅图像呈现出多个光栅场（22-1,22-2,23-3），其包括在每种情况下为由多个光栅线组成的电磁辐射影响光栅图案，并且当被照亮时，产生具有相同亮度级别的半色调图像的各个区域。

6. 发明授权

US07986459B2 Grid image and method for the production thereof 失效
标题翻译：网格图像及其制作方法
公开(公告)号：US07986459B2
公开(公告)日：2011-07-26
申请号：US11995228
申请日：2006-07-04
申请人： Wittich Kaule , Marius Dichtl
发明人： Wittich Kaule , Marius Dichtl
IPC分类号： G02B5/18
CPC分类号： B44F1/10 , G02B5/32
摘要： The present invention relates to a grating image (12) for depicting at least one unscreened halftone image having multiple brightness levels, the grating image exhibiting multiple grating fields (22-1, 22-2, 22-3) that include in each case an electromagnetic-radiation-influencing grating pattern composed of a plurality of grating lines and that, when illuminated, produce in each case an areal region of the halftone image having the same brightness level.
摘要翻译：本发明涉及用于描绘具有多个亮度级别的至少一个未屏蔽半色调图像的光栅图像（12），该光栅图像呈现出多个光栅场（22-1,22-2,22-3），其包括在每种情况下由多个光栅线组成的电磁辐射影响光栅图案，并且当被照亮时，产生具有相同亮度级别的半色调图像的各个区域。

7. 发明申请

US20100187806A1 Endless Material for Security Elements 有权
标题翻译：安全元素的无尽材料
公开(公告)号：US20100187806A1
公开(公告)日：2010-07-29
申请号：US12601590
申请日：2008-05-27
申请人： Wittich Kaule , Wolfgang Rauscher , Marius Dichtl
发明人： Wittich Kaule , Wolfgang Rauscher , Marius Dichtl
IPC分类号： B42D15/00 , B26D3/00 , B32B3/10 , B29C35/08 , B32B3/00 , B29C45/76
CPC分类号： D05B93/00 , B41F19/062 , B41M3/14 , B42D25/324 , B42D25/342 , B42D25/355 , B42D2035/44 , Y10T83/0538 , Y10T428/24479 , Y10T428/24802
摘要： The present invention relates to a method for manufacturing endless material for security elements having micro-optical moiré magnification arrangements that exhibit a motif grid composed of a plurality of micromotif elements and a focusing element grid composed of a plurality of microfocusing elements for moiré-magnified viewing of the micromotif elements, in which a) a motif grid composed of an at least locally periodic arrangement of micromotif elements in the form of a first one- or two-dimensional lattice is provided, b) a focusing element grid composed of an at least locally periodic arrangement of a plurality of microfocusing elements in the form of a second one- or two-dimensional lattice is provided, c) a pattern repeat of the motif grid and/or of the focusing element grid on the endless material is specified, d) it is checked whether the lattice of the motif grid and/or the lattice of the focusing element grid repeats periodically in the specified pattern repeat, and if this is not the case, a linear transformation is determined that distorts the first and/or the second lattice such that it repeats periodically in the specified pattern repeat, and e) for the further manufacture of the endless material, the motif grid or the focusing element grid is replaced by the motif grid that is distorted by the determined linear transformation, or by the focusing element grid that is distorted by the determined linear transformation.
摘要翻译：本发明涉及一种用于制造具有微光莫尔放大布置的安全元件的环形材料的方法，其具有由多个微突起元件组成的基体网格和由多个用于莫尔放大观察的多个微聚焦元件组成的聚焦元件网格的微突起元件，其中a）由至少局部周期性布置的具有第一一维或二维晶格形式的微突起元件组成的图案网格，b）聚焦元件网格由至少包括提供了以第二单维或二维格子形式的多个微聚焦元件的局部周期性布置，c）指定了在环形材料上的图案网格和/或聚焦元件网格的图案重复，d ）检查图案网格的晶格和/或聚焦元素网格的格子是否以指定图案周期性重复，并且如果thi 不是这样，确定线性变换，其扭曲第一和/或第二晶格，使得其以指定的图案重复周期性地重复，以及e）为了进一步制造环形材料，图案网格或聚焦元素网格由被确定的线性变换失真的图案网格或被确定的线性变换失真的聚焦元素网格所取代。

8. 发明申请

US20080197295A1 Device And Method For Producing Resist Profiled Elements 失效
标题翻译：用于生产抗蚀剂成型元件的装置和方法
公开(公告)号：US20080197295A1
公开(公告)日：2008-08-21
申请号：US10599659
申请日：2005-03-30
申请人： Wittich Kaule , Rainer Plontke , Ines Stollberg , Andreas Schubert , Marius Dichtl
发明人： Wittich Kaule , Rainer Plontke , Ines Stollberg , Andreas Schubert , Marius Dichtl
IPC分类号： G21K5/04 , G03F7/00
CPC分类号： G11B7/261 , B82Y10/00 , B82Y40/00 , G03F7/0005 , G03F7/0017 , G11B7/007 , H01J37/3174
摘要： The invention relates to a device and a method for producing resist profiled elements. According to the invention, an electron beam lithography system is used to produce an electron beam, the axis of the beam being essentially perpendicular to a resist layer in which the resist profiled element is to be produced. The electron beam can be adjusted in terms of the electron surface dose in such a way that a non-orthogonal resist profiled element can be produced as a result of the irradiation by the electron beam.
摘要翻译：本发明涉及一种用于制造抗蚀剂成型元件的装置和方法。根据本发明，使用电子束光刻系统来产生电子束，所述光束的轴线基本上垂直于要在其中产生抗蚀剂成型元件的抗蚀剂层。可以以电子表面剂量的方式调整电子束，使得由于电子束的照射可以产生非正交抗蚀剂成型元件。

9. 发明授权

US08783728B2 Endless material for security elements 有权
标题翻译：无尽的材料为安全元素
公开(公告)号：US08783728B2
公开(公告)日：2014-07-22
申请号：US12601590
申请日：2008-05-27
申请人： Wittich Kaule , Wolfgang Rauscher , Marius Dichtl
发明人： Wittich Kaule , Wolfgang Rauscher , Marius Dichtl
IPC分类号： B42D15/00 , B42D15/10 , B41F19/06 , B41M3/14
CPC分类号： D05B93/00 , B41F19/062 , B41M3/14 , B42D25/324 , B42D25/342 , B42D25/355 , B42D2035/44 , Y10T83/0538 , Y10T428/24479 , Y10T428/24802
摘要： An anti-counterfeit printed matter forming an invisible image that can be visualized clearly and prevents a visible image from impeding visibility of a visualized invisible image. In the anti-counterfeit printed matter according to this invention, a plurality of object elements are arranged at a predetermined pitch in a matrix, each object element including a first and second object arranged along a first direction on both sides of a boundary at a center, opposing each other, and third and fourth objects arranged along a second direction perpendicular to the first direction on both sides of a boundary at the center, opposing each other. The first object and the second object, and the third object and the fourth object of each object element have a negative/positive relationship. The first object and/or the second object forms a first invisible image. The third object and/or the fourth object forms a second invisible image.
摘要翻译：一种形成不可见图像的防伪印刷品，其可以被清楚地可视化并且防止可视图像阻碍可视化的不可见图像的可见性。在根据本发明的防伪印刷品中，多个物体元素以矩阵形式以预定间距排列，每个物体元件包括沿中心的边界两侧的第一方向布置的第一和第二物体彼此相对，并且第三和第四物体沿着与第一方向垂直的第二方向在中心的边界的两侧布置，彼此相对。第一个对象和第二个对象以及每个对象元素的第三个对象和第四个对象都具有负/正的关系。第一对象和/或第二对象形成第一不可见图像。第三物体和/或第四物体形成第二不可见图像。

10. 发明授权

US07880152B2 Device and method for producing resist profiled elements 失效
标题翻译：用于制造抗蚀剂型材的装置和方法
公开(公告)号：US07880152B2
公开(公告)日：2011-02-01
申请号：US10599659
申请日：2005-03-30
申请人： Wittich Kaule , Rainer Plontke , Ines Stolberg , Andreas Schubert , Marius Dichtl
发明人： Wittich Kaule , Rainer Plontke , Ines Stolberg , Andreas Schubert , Marius Dichtl
IPC分类号： A61N5/00 , G21G5/00
CPC分类号： G11B7/261 , B82Y10/00 , B82Y40/00 , G03F7/0005 , G03F7/0017 , G11B7/007 , H01J37/3174
摘要： The invention relates to a device and a method for producing resist profiled elements. According to the invention, an electron beam lithography system is used to produce an electron beam, the axis of the beam being essentially perpendicular to a resist layer in which the resist profiled element is to be produced. The electron beam can be adjusted in terms of the electron surface dose in such a way that a non-orthogonal resist profiled element can be produced as a result of the irradiation by the electron beam.
摘要翻译：本发明涉及一种用于制造抗蚀剂成型元件的装置和方法。根据本发明，使用电子束光刻系统来产生电子束，所述光束的轴线基本上垂直于要在其中产生抗蚀剂成型元件的抗蚀剂层。可以以电子表面剂量的方式调整电子束，使得由于电子束的照射可以产生非正交抗蚀剂成型元件。

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