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    • 2. 发明申请
    • Method for Producing a Micro-Optical Display Arrangement
    • 微光显示装置的制造方法
    • US20110027538A1
    • 2011-02-03
    • US12935320
    • 2009-04-01
    • Lars HoffmannManfred DotzlerManfred HeimMarius DichtlMichael RahmRalf Liebler
    • Lars HoffmannManfred DotzlerManfred HeimMarius DichtlMichael RahmRalf Liebler
    • B32B3/00B32B38/06
    • B42D25/47B41M3/14B41M3/148B42D25/342B42D25/373B42D25/425B42D2035/20B42D2035/44G02B3/0031G02B3/0056Y10T156/1039Y10T428/2462
    • The present invention relates to a method for producing, for the depiction of a specified motif, a micro-optical depiction arrangement (30) that exhibits a colored motif grid, composed of a plurality of micromotif elements (50, 52), and a focusing element grid, composed of a plurality of microfocusing elements (40), that reconstructs the specified motif when the micromotif elements (50, 52) are viewed, and in the method, T1) a first substrate foil (32) having opposing main surfaces (34, 36) is provided, and an embossing lacquer (38) is applied on a first main surface (34) of the first substrate foil (32) and is embossed in the form of the focusing element grid composed of an at least locally periodic arrangement of a plurality of microfocusing elements (40), T2) a second substrate foil (42) having opposing main surfaces (44, 46) is provided, and an arrangement of colored micromotif elements (50, 52) is produced in the form of the motif grid on a first main surface (44) of the second substrate foil (42), and K) the second substrate foil (42) is laminated, with at least one laminating adhesive (56), onto the second main surface (36), opposite the focusing element grid (40), of the first substrate foil (32).
    • 本发明涉及一种用于制作用于描绘指定图案的方法,该显微图像显示装置(30)显示由多个微型元件(50,52)组成的着色图案栅格,以及聚焦 元件网格,由多个微焦点元件(40)组成,当观察到微型元件(50,52)时重构指定的图案,并且在该方法中,T1)具有相对的主表面的第一衬底箔(32) 34,36),并且将压花漆(38)施加在第一基底箔(32)的第一主表面(34)上并且以由至少局部周期性的聚焦元件网格的形式压印 设置多个微聚焦元件(40),T2)具有相对的主表面(44,46)的第二基底箔(42),并且彩色微型元件(50,52)的布置以 在第二主体的第一主表面(44)上的主题网格 底片(42)和K)将第二衬底箔(42)与至少一个层压粘合剂(56)层叠在与聚焦元件栅格(40)相对的第二主表面(36)上的第一衬底箔 衬底箔(32)。