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    • 3. 发明授权
    • Method for fabricating a shallow trench isolation structure
    • 浅沟槽隔离结构的制造方法
    • US06190999B1
    • 2001-02-20
    • US09152360
    • 1998-09-14
    • Tsung-Yuan HungWilliam Lu
    • Tsung-Yuan HungWilliam Lu
    • H01L2176
    • H01L21/76224
    • A method for fabricating a shallow trench isolation (STI) structure includes a pad oxide layer and a hard masking layer are sequentially formed over a semiconductor substrate. A trench is formed in the substrate by patterning over the substrate. Then, the hard masking layer is removed to expose the pad oxide layer. An insulating layer is formed over the substrate to fill the trench. Using the pad oxide layer as a polishing stop, a CMP process is performed to polish the insulating layer until the pad oxide layer is exposed. The remained pad oxide within the trench is simultaneously planarized to have a planar top surface without dishing and microscratch. After the pad oxide is removed, the STI structure is accomplished.
    • 一种制造浅沟槽隔离(STI)结构的方法包括在半导体衬底上依次形成焊盘氧化物层和硬掩模层。 通过在衬底上图案化在衬底中形成沟槽。 然后,去除硬掩模层以露出焊盘氧化物层。 在衬底上形成绝缘层以填充沟槽。 使用焊盘氧化物层作为抛光停止件,进行CMP工艺以抛光绝缘层,直到焊盘氧化物层露出。 沟槽内剩余的衬垫氧化物同时被平坦化以具有平坦的顶表面,而不会产生凹陷和显微纹理。 在去除衬垫氧化物之后,实现STI结构。
    • 4. 发明授权
    • Method for fabricating a shallow trench isolation
    • 浅沟槽隔离的制造方法
    • US6133114A
    • 2000-10-17
    • US152450
    • 1998-09-14
    • William LuTsung-Yuan Hung
    • William LuTsung-Yuan Hung
    • H01L21/762H01L21/76
    • H01L21/76224
    • A method for fabricating a STI structure includes a pad oxide layer and a hard masking layer are sequentially formed over a semiconductor substrate. A trench is formed in the substrate by patterning over the substrate. A liner oxide layer is formed over a side-wall of the trench in the substrate. An isolating layer by APCVD and an isolating layer by HDPCVD are sequentially formed over the substrate, in which the height of the CVD isolating layer within the trench is lower than the height of the hard masking layer. A CMP process is performed, using the hard masking layer as a polishing stop. The hard masking layer and the pad oxide layer are removed to accomplish the STI structure.
    • 制造STI结构的方法包括在半导体衬底上依次形成衬垫氧化物层和硬掩模层。 通过在衬底上图案化在衬底中形成沟槽。 衬底氧化物层形成在衬底中的沟槽的侧壁上。 通过APCVD的绝缘层和通过HDPCVD的隔离层依次形成在衬底上,其中沟槽内的CVD隔离层的高度低于硬掩模层的高度。 使用硬掩模层作为抛光停止件来执行CMP处理。 去除硬掩模层和焊盘氧化物层以实现STI结构。
    • 8. 发明申请
    • SHAPE MEMORY MATERIAL AND METHOD OF MAKING THE SAME
    • 形状记忆材料及其制备方法
    • US20080053575A1
    • 2008-03-06
    • US11927816
    • 2007-10-30
    • Kenneth Man Chee CheungKelvin YeungWilliam LuChi Chung
    • Kenneth Man Chee CheungKelvin YeungWilliam LuChi Chung
    • C22C30/00
    • A61B17/866A61B17/72A61B17/80A61B17/842A61B2017/00867C22C19/03C22C30/00C22F1/006Y10T428/12
    • The present invention relates generally to a shape memory and/or super-elastic material, such as a nickel titanium alloy. Additionally or alternatively, the present invention relates to a super-elastic or pseudo-elastic material that has an initial transition temperature Af above a body temperature. The shape memory material can have a super-elasticity or pseudo-elasticity property at a temperature below the initial transition temperature Af of the material. For example, the shape memory material can have its workable temperature for producing super-elasticity or pseudo-elasticity of about 0° C. to 15° C. below the initial transition temperature Af. The shape memory material can be malleable at a room temperature, and become super-elastic or pseudo-elastic at a body temperature. In addition, the present invention relates to a method of making a shape memory or a super-elastic material. The treatment protocols can include but not limited to thermo-mechanical, thermo-mechanical, radiation, and ternary alloying treatments.
    • 本发明一般涉及形状记忆和/或超弹性材料,例如镍钛合金。 另外或替代地,本发明涉及超弹性或假弹性材料,其具有高于体温的初始转变温度A 。 形状记忆材料可以在低于材料的初始转变温度A 的温度下具有超弹性或假弹性性质。 例如,形状记忆材料可具有用于产生低于初始转变温度A 的约0℃至15℃的超弹性或假弹性的可工作温度。 形状记忆材料可以在室温下延展,并且在体温下变得超弹性或假弹性。 此外,本发明涉及一种制作形状记忆或超弹性材料的方法。 处理方案可以包括但不限于热机械,热机械,辐射和三元合金化处理。
    • 9. 发明授权
    • Hot swap fan connecting device thereof
    • 热插拔风扇连接装置
    • US07172390B2
    • 2007-02-06
    • US10962458
    • 2004-10-13
    • William LuYing-Chi ChenTe-Tsai ChuangMing-Shi TsaiKuo-Cheng Lin
    • William LuYing-Chi ChenTe-Tsai ChuangMing-Shi TsaiKuo-Cheng Lin
    • F04D29/64
    • H05K7/20172
    • A connecting device of a hot swap fan module comprises at least one terminal and a casing. The at least one terminal is electrically connected to the fan so that, when the fan is mounted in a system, electrical connection is formed between the fan and the system. The connecting device further comprises at least one LED (light emitting diode) which is electrically connected to the fan or the at least one terminal for indicating the operating state of the fan, and at least one cover plate protruded from at least one edge of the casing so as to form the whole casing into an L or U-shaped structure. The casing is closely attached to one side face of the fan housing when the casing is assembled to the fan. The casing also has a recess for receiving those lead wires electrically connecting the terminals, the fan, and the LED.
    • 热交换风扇模块的连接装置包括至少一个端子和壳体。 至少一个端子电连接到风扇,使得当风扇安装在系统中时,在风扇和系统之间形成电连接。 所述连接装置还包括至少一个LED(发光二极管),其电连接到所述风扇或所述至少一个端子,用于指示所述风扇的操作状态,以及至少一个从所述风扇的至少一个边缘突出的盖板 从而将整个壳体形成为L形或U形结构。 当壳体组装到风扇时,壳体紧密地附接到风扇壳体的一个侧面。 壳体还具有用于接收电连接端子,风扇和LED的引线的凹部。
    • 10. 发明申请
    • SHAPE MEMORY LOCKING DEVICE FOR ORTHOPEDIC IMPLANTS
    • 用于正交植入物的形状记忆锁定装置
    • US20080065074A1
    • 2008-03-13
    • US11853686
    • 2007-09-11
    • Kelvin YeungWilliam LuKeith LukKenneth Cheung
    • Kelvin YeungWilliam LuKeith LukKenneth Cheung
    • A61B17/58A61B17/56
    • A61B17/7032A61B17/7034A61B2017/00867
    • A mechanism to connect the supporting portions of orthopaedic implants such as in the head, spine, upper limb and lower limb and thereby prevent loosening and fretting at the implant interface of an orthopaedic implant construct has been developed based on shape memory effect and super-elasticity of shape memory materials such as nickel-titanium (nitinol or NiTi) shape-memory-alloy, without the use of typical threaded fastening technique. Advantages are conferred by making the entire device, not just connecting pieces, out of shape memory alloy and having shape memory effect and super-elasticity. Heating the memory head of the device will compress the connection portion without the use of an auxiliary device (e.g. coupling member) so that the connection portion can be completely clamped down by the memory head. Further advantages are provided through the use of a two-way shape memory effect in which the memory device can be closed or tightened by heating up the ambient temperature, and re-opened by cooling down the temperature.
    • 基于形状记忆效应和超弹性,已经开发了一种机构,用于连接诸如头部,脊柱,上肢和下肢之类的矫形植入物的支撑部分,从而防止在矫形植入物构造的植入物界面松动和微动。 的形状记忆材料如镍钛(镍钛诺或NiTi)形状记忆合金,而不使用典型的螺纹紧固技术。 通过将整个装置,不仅仅是连接件,形状记忆合金,并具有形状记忆效应和超弹性来赋予优点。 加热设备的存储头将不会使用辅助设备(例如,耦合构件)来压缩连接部分,使得连接部分可以被存储头完全夹紧。 通过使用双向形状记忆效应来提供进一步的优点,其中可以通过加热环境温度来关闭或紧固存储器件,并且通过冷却温度来重新打开。