会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明授权
    • Multicolor infrared focal plane arrays
    • 多色红外焦平面阵列
    • US5157258A
    • 1992-10-20
    • US396154
    • 1989-08-21
    • William J. Gunning, IIINatalie S. Gluck
    • William J. Gunning, IIINatalie S. Gluck
    • G01J3/36G01J3/51G01J5/60
    • G01J3/02G01J3/0259G01J3/36G01J5/602G01J2003/1213G01J2003/516
    • The multicolor focal plane array of this invention detects and distinguishes between incoming electromagnetic radiation within a first band of wavelengths and incoming electromagnetic radiation within a second band of wavelengths which includes the first wavelength band. The array includes a substrate and a two dimensional array of detectors disposed on the substrate and responsive to electromagnetic radiation within a predetermined range of wavelengths including the first and second wavelength bands. A first thin film filter is disposed on the substrate and interposed between the incoming radiation and a subset of the detectors in the array to prevent radiation outside of the first wavlength band from reaching the detectors. A second thin film filter is disposed on the substrate and interposed between the incoming radiation and all of the detectors in the array to prevent radiation outside of the second wavelength band from reaching the detectors in the subset. The filter design uses a double optimized approach that effectively reduces the thickness of the multilayer stack requiring lithographic patterning. A thickness of less than five microns is achieved which enables the use of a multilayer resist lift-off method. The detectors in the subset are thus made sensitive to wavelengths within the first wavelength band, while the remaining detectors are sensitive to wavelengths within both the first and second wavelength bands.
    • 本发明的多色焦平面阵列检测并区分第一波长带内的入射电磁辐射和包括第一波长带的第二波长波段内的入射电磁辐射。 该阵列包括衬底和设置在衬底上并响应包括第一和第二波长带的预定波长范围内的电磁辐射的检测器的二维阵列。 第一薄膜滤光器设置在基板上并且插入到入射辐射和阵列中的检测器的子集之间,以防止第一波长带外的辐射到达检测器。 第二薄膜过滤器设置在衬底上并且插入入射辐射与阵列中的所有检测器之间,以防止第二波长带外的辐射到达子集中的检测器。 滤波器设计采用双重优化方法,可有效降低需要光刻图案化的多层叠层的厚度。 实现了小于5微米的厚度,这使得能够使用多层抗蚀剂剥离方法。 因此,子集中的检测器对第一波长带内的波长敏感,而其余检测器对第一和第二波长带内的波长敏感。