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1. 发明申请

US20070288138A1 Anticipatory Mobile System Service Brokering and Resource Planning from Multiple Providers 审中-公开
标题翻译：多个供应商的预期移动系统服务代理和资源规划
公开(公告)号：US20070288138A1
公开(公告)日：2007-12-13
申请号：US11843945
申请日：2007-08-23
申请人： William Bodin , Bryan Clark , Albert Kwok , John Del Pizzo , Wojciech Stryjewski , David Huff , Derral Thorson , Michael Karasick
发明人： William Bodin , Bryan Clark , Albert Kwok , John Del Pizzo , Wojciech Stryjewski , David Huff , Derral Thorson , Michael Karasick
IPC分类号： G01M17/00
CPC分类号： G06Q30/06 , G06Q30/0266 , G06Q40/00
摘要： Diagnostic codes from a vehicle or other system in transit are transmitted to an opportunity server. The opportunity server searches for potential providers according to user preferences, specifications of the system in transit, and location of the provider in relationship to the travel itinerary of the mobile system. Requests for bids are issued to potential providers, and offers are received and coalesced from the providers. The operator of the vehicle is presented with one or more coalesced offers. Upon selection of an offer by the operator, the service is scheduled, including arranging for parts, personnel and facilities.
摘要翻译：来自车辆或运输中的其他系统的诊断代码被传送到机会服务器。机会服务器根据用户偏好，运输系统的规格以及提供者与移动系统的旅行行程相关的位置搜索潜在的提供商。向潜在供应商发出招标要求，并从提供商处收到并合并报价。车辆的操作员被呈现一个或多个合并报价。在选择运营商的报价后，将安排服务，包括安排零件，人员和设施。

2. 发明申请

US20130002862A1 MEASURING DEVICE USER EXPERIENCE THROUGH DISPLAY OUTPUTS 有权
标题翻译：通过显示输出测量设备用户体验
公开(公告)号：US20130002862A1
公开(公告)日：2013-01-03
申请号：US13174052
申请日：2011-06-30
申请人： Damon R. Waring , Keith L. Kao , Albert Kwok
发明人： Damon R. Waring , Keith L. Kao , Albert Kwok
IPC分类号： H04N7/18
CPC分类号： H04N7/18 , G02F1/1309 , G11B31/00
摘要： Methods and systems may include high speed camera to capture a video of a display output, a robotic arm to interact with a device, a processor, and a computer readable storage medium having a set of instructions. If executed by the processor, the instructions cause the system to identify one or more user experience characteristics based on the captured video, and generate a report based on the one or more user experience characteristics. The report may include a perceptional model score that is generated based on the user experience characteristics as well as other parameters. The user experience characteristics could include response time, frame rate and run time characteristics.
摘要翻译：方法和系统可以包括用于捕获显示器输出的视频的高速摄像机，与设备交互的机器人臂，处理器和具有一组指令的计算机可读存储介质。如果由处理器执行，指令使得系统基于所捕获的视频来识别一个或多个用户体验特征，并且基于一个或多个用户体验特征生成报告。报告可以包括基于用户体验特征以及其他参数生成的感知模型得分。用户体验特征可以包括响应时间，帧速率和运行时间特征。

3. 发明授权

US08823794B2 Measuring device user experience through display outputs 有权
标题翻译：通过显示输出测量设备用户体验
公开(公告)号：US08823794B2
公开(公告)日：2014-09-02
申请号：US13174052
申请日：2011-06-30
申请人： Damon R. Waring , Keith L. Kao , Albert Kwok
发明人： Damon R. Waring , Keith L. Kao , Albert Kwok
IPC分类号： H04N7/18 , G11B31/00
CPC分类号： H04N7/18 , G02F1/1309 , G11B31/00
摘要： Methods and systems may include high speed camera to capture a video of a display output, a robotic arm to interact with a device, a processor, and a computer readable storage medium having a set of instructions. If executed by the processor, the instructions cause the system to identify one or more user experience characteristics based on the captured video, and generate a report based on the one or more user experience characteristics. The report may include a perceptional model score that is generated based on the user experience characteristics as well as other parameters. The user experience characteristics could include response time, frame rate and run time characteristics.
摘要翻译：方法和系统可以包括用于捕获显示器输出的视频的高速摄像机，与设备交互的机器人臂，处理器和具有一组指令的计算机可读存储介质。如果由处理器执行，指令使得系统基于所捕获的视频来识别一个或多个用户体验特征，并且基于一个或多个用户体验特征生成报告。报告可以包括基于用户体验特征以及其他参数生成的感知模型得分。用户体验特征可以包括响应时间，帧速率和运行时间特征。

4. 发明授权

US06737358B2 Plasma etching uniformity control 有权
标题翻译：等离子体蚀刻均匀性控制
公开(公告)号：US06737358B2
公开(公告)日：2004-05-18
申请号：US10076129
申请日：2002-02-13
申请人： Y. Long He , Albert Kwok , Tsukasa Abe , Han-Ming Wu
发明人： Y. Long He , Albert Kwok , Tsukasa Abe , Han-Ming Wu
IPC分类号： H01L21302
CPC分类号： H01J37/32009 , H01J2237/334 , H01L21/3065
摘要： Plasma etching is controlled utilizing two etchant gases to form a plasma so as to obtain controlled (e.g., uniform) etch rate across a wafer. One etchant gas forms a positive plasma, which is the dominant plasma. The other etchant gas forms a negative plasma, which is the secondary plasma. The ratio of dominant plasma to the secondary plasma can be adjusted such that ion densities are uniform across the wafer, resulting in uniform etch rate over the wafer.
摘要翻译：使用两种蚀刻剂气体来控制等离子体蚀刻以形成等离子体，以便获得跨晶片的受控（例如，均匀的）蚀刻速率。一个蚀刻剂气体形成一个正等离子体，这是主要的等离子体。其他蚀刻剂气体形成负等离子体，其为次级等离子体。可以调整主要等离子体与次级等离子体的比例，使得离子密度在晶片上是均匀的，从而在晶片上产生均匀的蚀刻速率。

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