会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明授权
    • Plasma display device
    • 等离子显示装置
    • US06747408B2
    • 2004-06-08
    • US09995386
    • 2001-11-26
    • Wen-Fa SungYao-Ching SuJin-Yuh Lu
    • Wen-Fa SungYao-Ching SuJin-Yuh Lu
    • H01J1749
    • H01J9/242H01J2211/36
    • A plasma display device is disclosed. The plasma display device has a first panel and a second panel parallel to each other. A dielectric layer is formed on the second panel, a plurality of barrier ribs are formed on the dielectric layer, and a plurality of buffer layers are formed opposite to the barrier ribs. The buffer layers have a first softening temperature, the barrier ribs have a second softening temperature, and the first softening temperature is lower than the second softening temperature. The buffer layers can be deformed and compressed at a temperature higher than the first softening temperature during a process for sealing the first and second panels, so as to unify heights of the barrier ribs.
    • 公开了一种等离子体显示装置。 等离子体显示装置具有彼此平行的第一面板和第二面板。 在第二面板上形成有电介质层,在电介质层上形成有多个阻挡肋,与阻挡肋相对地形成有多个缓冲层。 缓冲层具有第一软化温度,隔壁具有第二软化温度,第一软化温度低于第二软化温度。 在密封第一和第二面板的过程中,缓冲层可以在高于第一软化温度的温度下变形和压缩,以便统一隔壁的高度。
    • 2. 发明授权
    • Method of fabricating a front plate for a plasma display panel
    • 制造等离子体显示面板的前板的方法
    • US06113449A
    • 2000-09-05
    • US351969
    • 1999-07-12
    • Wen-Fa SungJin-Yuh LuYao-Ching Su
    • Wen-Fa SungJin-Yuh LuYao-Ching Su
    • H01J9/02
    • H01J9/02H01J2211/38H01J2217/49207
    • A front plate for a plasma display panel (PDP) and its modified fabricating method are provided using a backside exposure process and an appropriate processing sequence rearrangement to reduce the number of photomasks required and improve the accuracy of exposure and developing process. First, a light-shielding layer is patterned by performing a mesh printing process, or by performing an exposure and developing process using a first photomask, so as to form a light-shielding structure including black stripes and transparent electrodes' gaps. Next, using the light-shielding structure as a mask, a backside exposure and developing process as well as an etching process is performed to form a plurality of pairs of transparent electrodes on the substrate. Then, using a second photomask, another set of exposure, developing and etching processes are performed to form a plurality of pairs of metal electrodes on the corresponding transparent electrodes.
    • 使用背面曝光工艺和适当的处理顺序重排来提供用于等离子体显示面板(PDP)的前板及其改进的制造方法,以减少所需的光掩模的数量并提高曝光和显影处理的准确性。 首先,通过进行网状印刷工艺,或者通过使用第一光掩模进行曝光和显影处理来对遮光层进行图案化,以形成包括黑条纹和透明电极间隙的遮光结构。 接下来,使用遮光结构作为掩模,进行背面曝光和显影处理以及蚀刻处理,以在基板上形成多对透明电极。 然后,使用第二光掩模,执行另一组曝光,显影和蚀刻处理,以在相应的透明电极上形成多对金属电极。
    • 3. 发明授权
    • High contrast PDP and a method for making the same
    • 高对比度PDP及其制作方法
    • US06580216B1
    • 2003-06-17
    • US09574699
    • 2000-05-18
    • Jin-Yuh LuWen-Fa SungChun-Chin HuangTa-Yuan Lee
    • Jin-Yuh LuWen-Fa SungChun-Chin HuangTa-Yuan Lee
    • H01J1749
    • H01J11/12H01J9/02H01J11/24H01J11/44H01J2211/444
    • Disclosed is a high contrast PDP, comprising a glass substrate, shielding masks, patterned black matrices, transparent electrodes, display electrodes, a dielectric layer, an MgO layer. A black matrix layer is formed on the discharge region and the non-discharge region of the glass substrate and defined into shielding matrices and patterned black matrices respectively. Transparent electrodes are formed on the shielding mask, and display electrodes are formed on the transparent electrodes. The dielectric layer and MgO layer are sequentially formed over the whole glass substrate. The black matrix layer can consist of Cr/Cr2O3, Fe/Fe2O3 or black low melting-point glass. The transparent electrodes can consist of ITO or stannic oxide. The display electrodes can consist of Cr/Cu/Al, Cr/Al/Cr or Ag. The dielectric layer can consist of lead oxide or silicon oxide.
    • 公开了一种高对比度PDP,包括玻璃基板,屏蔽掩模,图案化黑矩阵,透明电极,显示电极,介电层,MgO层。 在玻璃基板的放电区域和非放电区域上形成黑矩阵层,分别定义为屏蔽矩阵和图案化黑矩阵。 在屏蔽掩模上形成透明电极,在透明电极上形成显示电极。 电介质层和MgO层依次形成在整个玻璃基板上。 黑色矩阵层可以由Cr / Cr2O3,Fe / Fe2O3或黑色低熔点玻璃组成。 透明电极可由ITO或氧化锡组成。 显示电极可由Cr / Cu / Al,Cr / Al / Cr或Ag组成。 电介质层可以由氧化铅或氧化硅组成。
    • 8. 发明授权
    • Self-aligned method for forming a color display screen
    • 用于形成彩色显示屏的自对准方法
    • US5756241A
    • 1998-05-26
    • US629116
    • 1996-04-08
    • Nan-Chou David LiuJin-Yuh Lu
    • Nan-Chou David LiuJin-Yuh Lu
    • G03F1/00G03F7/00G03F7/20H01J9/227H01J29/28H01J29/32G03C5/00
    • H01J29/327G03F1/50G03F7/0007H01J29/28H01J9/2271H01J9/2278G03F7/20
    • For the manufacture of a color screen for a cathode ray tube a process is described which uses a single photolithographic mask for defining multiple patterns, so that said single mask may be used for determining the different areas where several different phosphor layers will be located. Masks used for conventional photolithographic processes normally comprise a pattern of regions that are either fully transparent or fully opaque to the radiation used for exposing the resist. The mask used as part of the present invention includes regions that are neither fully transparent nor fully opaque, having, instead, a grey scale of optical densities. Through careful control of both exposure and development time, selected parts of a layer of a positive photoresist, that were exposed through successively denser regions of the mask, can be successively removed. As each of these parts of the resist is removed, parts of an underlying layer of adhesive are uncovered and then serve as selective sites for the application of phosphor particles. The process may be used with or without the inclusion of a black matrix as part of the structure.
    • 为了制造用于阴极射线管的彩色屏幕,描述了使用单个光刻掩模来定义多个图案的工艺,使得所述单个掩模可用于确定几个不同荧光体层将被定位的不同区域。 用于常规光刻工艺的掩模通常包括对于用于曝光抗蚀剂的辐射完全透明或完全不透明的区域图案。 用作本发明一部分的掩模包括既不完全透明也不完全不透明的区域,而是具有光密度的灰度级。 通过仔细控制曝光和显影时间,可以连续地去除通过连续密集的掩模区域暴露的正性光致抗蚀剂层的选定部分。 由于去除抗蚀剂的这些部分中的每一个,粘合剂的下层部分被覆盖,然后用作施加荧光体颗粒的选择性位置。 该方法可以与或不包括黑矩阵一起用于结构的一部分。