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1. 发明申请

US20190389028A1 COMPENSATION FOR SUBSTRATE DOPING FOR IN-SITU ELECTROMAGNETIC INDUCTIVE MONITORING 审中-公开
公开(公告)号：US20190389028A1
公开(公告)日：2019-12-26
申请号：US16440785
申请日：2019-06-13
申请人： Wei Lu , David Maxwell Gage , Harry Q. Lee , Kun Xu , Jimin Zhang
发明人： Wei Lu , David Maxwell Gage , Harry Q. Lee , Kun Xu , Jimin Zhang
IPC分类号： B24B37/005 , B24B37/27 , B24B49/10 , G01B7/06
摘要： A method of chemical mechanical polishing includes bringing a substrate having a conductive layer disposed over a semiconductor wafer into contact with a polishing pad, generating relative motion between the substrate and the polishing pad, monitoring the substrate with an in-situ electromagnetic induction monitoring system as the conductive layer is polished to generate a sequence of signal values that depend on a thickness of the conductive layer, determining a sequence of thickness values for the conductive layer based on the sequence of signal values, and at least partially compensating for a contribution of conductivity of the semiconductor wafer to the signal values.

2. 发明申请

US20190084119A1 Chattering Correction for Accurate Sensor Position Determination on Wafer 审中-公开
公开(公告)号：US20190084119A1
公开(公告)日：2019-03-21
申请号：US16122682
申请日：2018-09-05
申请人： Harry Q. Lee , Kun Xu , Jimin Zhang
发明人： Harry Q. Lee , Kun Xu , Jimin Zhang
IPC分类号： B24B37/013 , B24B37/20 , B24B49/10 , B24B49/12
摘要： A method of controlling polishing includes sweeping a sensor of an in-situ monitoring system across a substrate as a layer of the substrate undergoes polishing, generating from the in-situ monitoring system a sequence of signal values that depend on a thickness of the layer, detecting from the sequence of signal values, a time that the sensor traverses a leading edge of the substrate or a retaining ring and a time that the sensor traverses a trailing edge of the substrate or retaining ring; and for each signal value of at least some of the sequence of signal values, determining a position on the substrate for the signal value based on the time that the sensor traverses the leading edge and the time that the sensor traverses a trailing edge.

3. 发明申请

US20120276814A1 AUTOMATIC SELECTION OF REFERENCE SPECTRA LIBRARY 有权
标题翻译：自动选择参考光谱库
公开(公告)号：US20120276814A1
公开(公告)日：2012-11-01
申请号：US13095802
申请日：2011-04-27
申请人： Jimin Zhang , Harry Q. Lee , Zhihong Wang , Jeffrey Drue David , Boguslaw A. Swedek , Dominic J. Benvegnu
发明人： Jimin Zhang , Harry Q. Lee , Zhihong Wang , Jeffrey Drue David , Boguslaw A. Swedek , Dominic J. Benvegnu
IPC分类号： B24B51/00
CPC分类号： B24B37/013 , B24B37/042 , B24B49/05 , B24B49/12 , G01J3/28
摘要： A computer-implemented method of generating reference spectra includes polishing a plurality of set-up substrates, the plurality of set-up substrates comprising at least three set-up substrates, measuring a sequence of spectra from each of the plurality of set-up substrates during polishing with an in-situ optical monitoring system to provide a plurality of sequences of spectra, generating a plurality of sequences of potential reference spectra from the plurality of sequences of spectra, determining which sequence of potential reference spectra of the plurality of sequences provides a best match to remaining sequences of the plurality of sequences, and storing the sequence of potential reference spectra determined to provide the best match as reference spectra, and selecting and storing the sequence of potential reference spectra.
摘要翻译：产生参考光谱的计算机实现的方法包括抛光多个设置基板，所述多个设置基板包括至少三个设置基板，测量来自多个设置基板中的每一个的光谱序列在用原位光学监测系统进行抛光时提供多个光谱序列，从多个光谱序列产生多个潜在参考光谱序列，确定多个序列中的哪个潜在参考光谱序列提供一个最佳匹配多个序列的剩余序列，并存储确定为提供最佳匹配的参考光谱序列作为参考光谱，以及选择和存储潜在参考光谱序列。

4. 发明授权

US09296084B2 Polishing control using weighting with default sequence 有权
标题翻译：使用默认序列加权抛光控制
公开(公告)号：US09296084B2
公开(公告)日：2016-03-29
申请号：US13553038
申请日：2012-07-19
申请人： Jimin Zhang , Zhihong Wang , Harry Q. Lee , Wen-Chiang Tu
发明人： Jimin Zhang , Zhihong Wang , Harry Q. Lee , Wen-Chiang Tu
IPC分类号： B24B37/013 , B24B37/10 , B24B49/12
CPC分类号： B24B37/013 , B24B37/105 , B24B49/12
摘要： A method of controlling polishing includes storing a sequence of default values, polishing a substrate, monitoring the substrate during polishing with an in-situ monitoring system, generating a sequence of measured values from measurements from the in-situ monitoring system, combining the sequence of measured values with the sequence of default values to generate a sequence of modified values, fitting a function to the sequence of modified values, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the function.
摘要翻译：控制抛光的方法包括存储默认值序列，抛光衬底，用原位监测系统在抛光期间监测衬底，从原位监测系统的测量产生测量值序列，将序列测量值与默认值序列以生成修改值序列，将功能拟合到修改值序列，以及基于该函数确定抛光终点或抛光速率调整中的至少一个。

5. 发明授权

US09248544B2 Endpoint detection during polishing using integrated differential intensity 有权
标题翻译：使用积分差分强度的抛光期间的端点检测
公开(公告)号：US09248544B2
公开(公告)日：2016-02-02
申请号：US13552317
申请日：2012-07-18
申请人： Jimin Zhang , Harry Q. Lee , Zhihong Wang , Wen-Chiang Tu
发明人： Jimin Zhang , Harry Q. Lee , Zhihong Wang , Wen-Chiang Tu
IPC分类号： B24B37/013 , B24B37/04 , H01L21/66 , B24B49/12 , B24B37/10
CPC分类号： B24B37/013 , B24B37/042 , B24B37/105 , B24B49/12 , H01L22/12 , H01L22/26
摘要： A method of controlling a polishing operation includes polishing a substrate, during polishing obtaining a sequence over time of measured spectra from the substrate with an in-situ optical monitoring system, for each measured spectrum from the sequence of measured spectra determining a difference between the measured spectrum and an immediate previous spectrum from the sequence, accumulating the difference for each measured spectrum to generate a total difference, comparing the total difference to a threshold, and detecting a polishing endpoint based on the comparison of the total difference to the threshold.
摘要翻译：一种控制抛光操作的方法包括：在抛光过程中，利用原位光学监测系统从基板测量的光谱中获得随时间变化的序列，从测量光谱序列测得的每个测量光谱，从而确定基板的测量值频谱和来自序列的立即上一个频谱，累积每个测量频谱的差以产生总差，将总差与阈值进行比较，以及基于总差与阈值的比较来检测抛光端点。

6. 发明申请

US20140024292A1 Polishing Control Using Weighting With Default Sequence 有权
标题翻译：抛光控制使用加权默认序列
公开(公告)号：US20140024292A1
公开(公告)日：2014-01-23
申请号：US13553038
申请日：2012-07-19
申请人： Jimin Zhang , Zhihong Wang , Harry Q. Lee , Wen-Chiang Tu
发明人： Jimin Zhang , Zhihong Wang , Harry Q. Lee , Wen-Chiang Tu
IPC分类号： B24B37/005
CPC分类号： B24B37/013 , B24B37/105 , B24B49/12
摘要： A method of controlling polishing includes storing a sequence of default values, polishing a substrate, monitoring the substrate during polishing with an in-situ monitoring system, generating a sequence of measured values from measurements from the in-situ monitoring system, combining the sequence of measured values with the sequence of default values to generate a sequence of modified values, fitting a function to the sequence of modified values, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the function.
摘要翻译：控制抛光的方法包括存储默认值序列，抛光衬底，用原位监测系统在抛光期间监测衬底，从原位监测系统的测量产生测量值序列，将序列测量值与默认值序列以生成修改值序列，将功能拟合到修改值序列，以及基于该函数确定抛光终点或抛光速率调整中的至少一个。

7. 发明申请

US20120100781A1 MULTIPLE MATCHING REFERENCE SPECTRA FOR IN-SITU OPTICAL MONITORING 审中-公开
标题翻译：用于现场光学监测的多重匹配参考光谱
公开(公告)号：US20120100781A1
公开(公告)日：2012-04-26
申请号：US13271023
申请日：2011-10-11
申请人： Jimin Zhang , Zhihong Wang , Harry Q. Lee , Wen-Chiang Tu
发明人： Jimin Zhang , Zhihong Wang , Harry Q. Lee , Wen-Chiang Tu
IPC分类号： B24B49/12
CPC分类号： B24B37/013 , B24B49/12
摘要： A method of controlling polishing includes storing a plurality libraries, each library including a plurality of reference spectra, polishing a substrate, measuring a sequence of spectra of light from the substrate during polishing, and for each measured spectrum of the sequence of spectra, finding a best matching first reference spectrum from a first library from the plurality of libraries and finding a best matching second reference spectrum from a different second library from the plurality of libraries, determining a first value associated with the best matching first reference spectrum and determining a second value from the best matching second reference spectrum, and calculating a third value from the first value and the second value to generate a sequence of calculated third values. At least one of a polishing endpoint or an adjustment for a polishing rate can be determined based on the sequence of calculated third values.
摘要翻译：控制抛光的方法包括存储多个库，每个库包括多个参考光谱，抛光衬底，在抛光期间测量来自衬底的光的光谱序列，以及对于光谱序列的每个测量光谱，找到从来自多个库的第一库中最佳匹配第一参考频谱，并从多个库中找到来自不同第二库的最佳匹配的第二参考频谱，确定与最佳匹配的第一参考频谱相关联的第一值并确定第二值并且从第一值和第二值计算第三值以生成计算出的第三值的序列。可以基于计算的第三值的顺序来确定抛光终点或抛光速率的调整中的至少一个。

8. 发明授权

US08755928B2 Automatic selection of reference spectra library 有权
标题翻译：自动选择参考光谱库
公开(公告)号：US08755928B2
公开(公告)日：2014-06-17
申请号：US13095802
申请日：2011-04-27
申请人： Jimin Zhang , Harry Q. Lee , Zhihong Wang , Jeffrey Drue David , Boguslaw A. Swedek , Dominic J. Benvegnu
发明人： Jimin Zhang , Harry Q. Lee , Zhihong Wang , Jeffrey Drue David , Boguslaw A. Swedek , Dominic J. Benvegnu
IPC分类号： G06F19/24
CPC分类号： B24B37/013 , B24B37/042 , B24B49/05 , B24B49/12 , G01J3/28
摘要： A computer-implemented method of generating reference spectra includes polishing a plurality of set-up substrates, the plurality of set-up substrates comprising at least three set-up substrates, measuring a sequence of spectra from each of the plurality of set-up substrates during polishing with an in-situ optical monitoring system to provide a plurality of sequences of spectra, generating a plurality of sequences of potential reference spectra from the plurality of sequences of spectra, determining which sequence of potential reference spectra of the plurality of sequences provides a best match to remaining sequences of the plurality of sequences, and storing the sequence of potential reference spectra determined to provide the best match as reference spectra, and selecting and storing the sequence of potential reference spectra.
摘要翻译：计算机实现的产生参考光谱的方法包括抛光多个设置基板，所述多个设置基板包括至少三个设置基板，测量来自多个设置基板中的每一个的光谱序列在用原位光学监测系统进行抛光时提供多个光谱序列，从多个光谱序列产生多个潜在参考光谱序列，确定多个序列中的哪个潜在参考光谱序列提供一个最佳匹配多个序列的剩余序列，并存储确定为提供最佳匹配的参考光谱序列作为参考光谱，以及选择和存储潜在参考光谱序列。

9. 发明授权

US08666665B2 Automatic initiation of reference spectra library generation for optical monitoring 有权
标题翻译：用于光学监测的自动启动参考光谱库生成
公开(公告)号：US08666665B2
公开(公告)日：2014-03-04
申请号：US13088144
申请日：2011-04-15
申请人： Jeffrey Drue David , Harry Q. Lee , Jun Qian , Jimin Zhang
发明人： Jeffrey Drue David , Harry Q. Lee , Jun Qian , Jimin Zhang
IPC分类号： G06F19/00 , H01L21/00
CPC分类号： G01J3/46 , B24B37/013 , B24B37/042 , B24B49/12
摘要： A method of generating reference spectra includes polishing a first substrate in a polishing apparatus, measuring a sequence of spectra from the first substrate during polishing with an in-situ optical monitoring system, for each spectrum in the sequence of spectra, determining a best matching reference spectrum from a first plurality of first reference spectra to generate a sequence of reference spectra, calculating a value of a metric of fit of the sequence of spectra to the sequence of reference spectra, comparing the value of the metric of fit to a threshold value and determining whether to generate a second library based on the comparison, and if the second library is determined to be generated, storing the sequence of spectra as a second plurality of reference spectra.
摘要翻译：产生参考光谱的方法包括抛光抛光装置中的第一衬底，在光谱序列中的每个光谱下，用原位光学监测系统在抛光期间测量来自第一衬底的光谱序列，确定最佳匹配参考频谱从第一多个第一参考光谱生成参考光谱序列，计算光谱序列的拟合度量与参考光谱序列的值，将拟合度量的值与阈值进行比较，以及基于所述比较确定是否生成第二库，以及如果确定要生成所述第二库，则将所述光谱序列存储为第二多个参考光谱。

10. 发明申请

US20110301847A1 Automatic Initiation Of Reference Spectra Library Generation For Optical Monitoring 有权
标题翻译：自动启动参考光谱库生成用于光学监测
公开(公告)号：US20110301847A1
公开(公告)日：2011-12-08
申请号：US13088144
申请日：2011-04-15
申请人： Jeffrey Drue David , Harry Q. Lee , Jun Qian , Jimin Zhang
发明人： Jeffrey Drue David , Harry Q. Lee , Jun Qian , Jimin Zhang
IPC分类号： G06F19/00
CPC分类号： G01J3/46 , B24B37/013 , B24B37/042 , B24B49/12
摘要： A method of generating reference spectra includes polishing a first substrate in a polishing apparatus, measuring a sequence of spectra from the first substrate during polishing with an in-situ optical monitoring system, for each spectrum in the sequence of spectra, determining a best matching reference spectrum from a first plurality of first reference spectra to generate a sequence of reference spectra, calculating a value of a metric of fit of the sequence of spectra to the sequence of reference spectra, comparing the value of the metric of fit to a threshold value and determining whether to generate a second library based on the comparison, and if the second library is determined to be generated, storing the sequence of spectra as a second plurality of reference spectra.
摘要翻译：产生参考光谱的方法包括抛光抛光装置中的第一衬底，在光谱序列中的每个光谱下，用原位光学监测系统在抛光期间测量来自第一衬底的光谱序列，确定最佳匹配参考频谱从第一多个第一参考光谱生成参考光谱序列，计算光谱序列的拟合度量与参考光谱序列的值，将拟合度量的值与阈值进行比较，以及基于所述比较确定是否生成第二库，以及如果确定要生成所述第二库，则将所述光谱序列存储为第二多个参考光谱。

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