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    • 5. 发明申请
    • Platen and head rotation rates for monitoring chemical mechanical polishing
    • 用于监测化学机械抛光的压板和头部旋转速率
    • US20060183407A1
    • 2006-08-17
    • US11402522
    • 2006-04-11
    • Jeffrey David
    • Jeffrey David
    • B24B51/00
    • B24B37/013B24B49/006B24B49/105B24B49/12
    • Methods system and apparatus, including computer program products, for monitoring polishing a substrate. A polishing pad mounted on a platen is rotated at a first rotation rate, and a carrier head is rotated at a second rotation rate that is different from the first rotation rate. The carrier head carries a substrate and presses the substrate against the polishing pad. A sequence of data traces is acquired using a sensor mounted in the platen, wherein each data trace results from a separate scan with the sensor along a path across the substrate, and wherein the first and second rotation rates are such that a plurality of paths corresponding to a predetermined number of consecutive scans are substantially evenly radially distributed across the substrate.
    • 方法系统和装置,包括计算机程序产品,用于监控抛光衬底。 安装在台板上的抛光垫以第一旋转速度旋转,并且以与第一旋转速度不同的第二旋转速度旋转载具头。 载体头承载衬底并将衬底压靠在抛光垫上。 使用安装在压板中的传感器获取数据迹线序列,其中每个数据轨迹来自沿着穿过衬底的路径的传感器的单独扫描,并且其中第一和第二旋转速率使得多个路径对应 到预定数量的连续扫描基本均匀地径向地分布在衬底上。
    • 6. 发明申请
    • PLATEN AND HEAD ROTATION RATES FOR MONITORING CHEMICAL MECHANICAL POLISHING
    • 用于监测化学机械抛光的板和转动速率
    • US20050042975A1
    • 2005-02-24
    • US10643583
    • 2003-08-18
    • Jeffrey David
    • Jeffrey David
    • B24B37/04B24B49/10B24B49/12B24B49/00
    • B24B37/013B24B49/006B24B49/105B24B49/12
    • Methods system and apparatus, including computer program products,.for monitoring polishing a substrate: A polishing pad mounted on a platen, is rotated at a first rotation rate, and a carrier head is rotated at a second rotation rate that is different from the first rotation rate. The carrier head carries a substrate and presses the substrate against the polishing pad. A sequence of data traces is acquired using a sensor mounted in the platen, wherein each data trace results from a separate scan with the sensor along a path across the substrate, and wherein the first and second rotation rates are such that a plurality of paths corresponding to a predetermined number of consecutive scans are substantially evenly radially distributed across the substrate.
    • 方法包括计算机程序产品的计算机程序产品,用于监测抛光衬底的方法:安装在压板上的抛光垫以第一旋转速度旋转,并且以与第一旋转速度不同的第二旋转速率旋转载具头 转速。 载体头承载衬底并将衬底压靠在抛光垫上。 使用安装在压板中的传感器获取数据迹线序列,其中每个数据轨迹来自沿着穿过衬底的路径的传感器的单独扫描,并且其中第一和第二旋转速率使得多个路径对应 到预定数量的连续扫描基本均匀地径向地分布在衬底上。
    • 7. 发明申请
    • MEDIA ECHOING AND SOCIAL NETWORKING DEVICE AND METHOD
    • 媒体启动和社交网络设备及方法
    • US20170070872A1
    • 2017-03-09
    • US15355265
    • 2016-11-18
    • Michael StanleyJeffrey David
    • Michael StanleyJeffrey David
    • H04W4/20H04W4/02
    • H04W4/21G06Q10/10G06Q50/01H04W4/023
    • A method and apparatus for echoing media via a mobile device are disclosed herein. According to an embodiment, the method can include displaying automatically to a user, on the mobile device, a list of one or more respective identifiers of one or more other users experiencing respective media within a selectable geographic area. The user is then allowed to select whether to play one or more of the respective media on the mobile device, and can connect with the one or more other users via a social networking site. As a result, the user can network with previously unknown people, based on a common taste in music or other media, for example, as well as a geographic location.
    • 本文公开了一种用于经由移动设备回送介质的方法和装置。 根据实施例,该方法可以包括在移动设备上自动向用户显示经历可选地理区域内的相应媒体的一个或多个其他用户的一个或多个相应标识符的列表。 然后允许用户选择是否在移动设备上播放相应媒体中的一个或多个,并且可以经由社交网站与一个或多个其他用户进行连接。 因此,用户可以基于音乐或其他媒体中的常见品味,例如以及地理位置来与先前未知的人进行网络连接。
    • 8. 发明申请
    • Spectra based endpointing for chemical mechanical polishing
    • 基于光谱的化学机械抛光终点
    • US20070039925A1
    • 2007-02-22
    • US11261742
    • 2005-10-28
    • Boguslaw SwedekDominic BenvegnuJeffrey David
    • Boguslaw SwedekDominic BenvegnuJeffrey David
    • C03C15/00H01L21/461B44C1/22
    • B24B49/12B24B37/013B24B37/205B24B49/08B24D7/14G05B15/02H01L21/31053H01L21/3212H01L22/26
    • Methods and apparatus for spectrum-based endpointing. An endpointing method includes selecting two or more reference spectra. Each reference spectrum is a spectrum of white light reflected from a film of interest on a first substrate and has a thickness greater than a target thickness. The reference spectra is selected for particular spectra-based endpoint determination logic so that the target thickness is achieved when endpoint is called by applying the particular spectra-based endpoint logic. The method includes obtaining two or more current spectra. Each current spectrum is a spectrum of white light reflected from a film of interest on a second substrate when the film of interest is being subjected to a polishing step and has a current thickness that is greater than the target thickness. The method includes determining, for the second substrate, when an endpoint of the polishing step has been achieved.
    • 用于基于频谱的终点的方法和装置。 一种终点方法包括选择两个或更多个参考光谱。 每个参考光谱是在第一衬底上从感兴趣的膜反射的白光的光谱,并且具有大于目标厚度的厚度。 为特定的基于光谱的端点确定逻辑选择参考光谱,以便通过应用特定的基于光谱的端点逻辑来调用端点时实现目标厚度。 该方法包括获得两个或更多个当前光谱。 每个电流光谱是当感兴趣的膜经受抛光步骤并且具有大于目标厚度的电流厚度时,在第二衬底上从感兴趣的膜反射的白光的光谱。 该方法包括为第二基底确定何时已经实现了抛光步骤的终点。