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1. 发明授权

US09034661B2 Method for producing molecule immobilizing substrate, and molecule immobilizing substrate 有权
标题翻译：制备分子固定底物的方法和分子固定底物
公开(公告)号：US09034661B2
公开(公告)日：2015-05-19
申请号：US12709020
申请日：2010-02-19
申请人： Wataru Kusaki , Toshinobu Ishihara , Takeshi Kinsho , Takeru Watanabe
发明人： Wataru Kusaki , Toshinobu Ishihara , Takeshi Kinsho , Takeru Watanabe
IPC分类号： G01N33/544 , G01N33/543 , G01N33/53 , C08L83/04 , C08L83/06
CPC分类号： G01N33/54393 , C08L83/04 , C08L83/06 , G01N33/543 , G01N33/54353
摘要： There is disclosed a method for producing a molecule immobilizing substrate, comprising at least the steps of: forming, on a substrate, a monomolecular film including hydroxyl groups, cyano groups, or oxiranyl groups, which are oriented toward an outmost surface of the monomolecular film; and chemically modifying the hydroxyl groups, cyano groups, or oxiranyl groups of the monomolecular film to transform them into carboxyl groups, to thereby form, on the substrate, the monomolecular film including the carboxyl groups, which are oriented toward an outmost surface of the monomolecular film. There can be provided: a method for producing a molecule immobilizing substrate which is free of occurrence of an immobilized-molecule peeling problem in the case of conducting an assay by immobilizing molecules on the substrate.
摘要翻译：公开了一种分子固定基板的制造方法，至少包括以下步骤：在基板上形成包含羟基，氰基或环氧乙烷基的单分子膜，该单分子膜朝向单分子膜的最外表面 ; 并对单分子膜的羟基，氰基或环氧乙烷基进行化学改性，将其转化为羧基，从而在基材上形成包含羧基的单分子膜，该单分子膜朝向单分子膜的最外表面电影。可以提供：在通过将分子固定在基材上进行测定的情况下，制备不存在固定化分子剥离问题的分子固定化基质的方法。

2. 发明授权

US09410951B2 Method for producing substrate for making microarray 有权
标题翻译：制备微阵列的基质的制备方法
公开(公告)号：US09410951B2
公开(公告)日：2016-08-09
申请号：US12458637
申请日：2009-07-17
申请人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
发明人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
IPC分类号： G01N33/543 , C40B40/04 , C40B50/18
CPC分类号： G01N33/54353 , B01J2219/00527 , B01J2219/00596 , B01J2219/00612 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , C40B40/04 , C40B50/18
摘要： There is disclosed a method for producing a substrate for making a microarray, the method comprising: at least, a step of forming a monomolecular film having orientated oxysilanyl groups toward an outmost surface on the substrate; and a step of forming a monomolecular film having orientated amino groups toward an outmost surface on the substrate by applying a solution containing a diamine compound to the oxysilanyl groups. There can be provided a method for producing a substrate for making a microarray in which density and orientation of amino groups orientated toward an outmost surface are controllable, and in addition, there is no delamination of a monomolecular film formed on the substrate.
摘要翻译：公开了一种制造微阵列的基板的制造方法，该方法至少包括：向基板的最外表面形成具有取向的氧联苯乙烯基的单分子膜的工序; 以及通过将含有二胺化合物的溶液施加到氧联苯乙酰基上而形成具有取向氨基的单分子膜朝向基板上的最外表面的步骤。可以提供一种制造用于制造微阵列的基板的方法，其中朝向最外表面取向的氨基的密度和取向是可控的，此外，在基板上形成的单分子膜不会发生分层。

3. 发明授权

US08148053B2 Method for manufacturing substrate for making microarray 有权
标题翻译：制造微阵列基板的方法
公开(公告)号：US08148053B2
公开(公告)日：2012-04-03
申请号：US12073953
申请日：2008-03-12
申请人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
发明人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
IPC分类号： G03F7/26
CPC分类号： G01N33/54353 , B01J2219/00317 , B01J2219/00608 , B01J2219/00617 , B01J2219/00621 , B01J2219/00626 , B01J2219/00635 , B01J2219/00637 , B01J2219/00659 , B01J2219/00722
摘要： To provide a method for manufacturing a substrate for making a microarray which will ensure the secure immobilization of a material in a site-selective manner at a low cost. The method comprises the steps of: forming a monomolecular film on the surface of a substrate using a silane compound represented by the following general formula (1), Y3Si—(CH2)m—X (1), wherein m represents an integer from 3 to 20; X represents a hydroxyl group precursor functional group which will be converted to a hydroxyl group when exposed to acid; and Y independently represents a halogen atom or alkoxy group having 1-4 carbon atoms; and converting the hydroxyl group precursor functional group represented by X to a hydroxyl group; wherein the step of converting a hydroxyl group precursor functional group represented by X to a hydroxyl group comprises forming, on the monomolecular film, a polymer layer containing a compound represented by the following general formula (2) or (3),
摘要翻译：提供一种用于制造微阵列的基板的方法，该方法将以低成本确保以选址方式安全地固定材料。该方法包括以下步骤：使用由以下通式（1）表示的硅烷化合物Y3Si-（CH2）m-X（1）在基材表面上形成单分子膜，其中m表示3的整数到20 X表示当暴露于酸时将转化为羟基的羟基前体官能团; Y独立地表示具有1-4个碳原子的卤原子或烷氧基; 并将由X表示的羟基前体官能团转化为羟基; 其中将由X表示的羟基前体官能团转化为羟基的步骤包括在单分子膜上形成含有由以下通式（2）或（3）表示的化合物的聚合物层，

4. 发明授权

US08053179B2 Method for manufacturing substrate for making microarray 有权
标题翻译：制造微阵列基板的方法
公开(公告)号：US08053179B2
公开(公告)日：2011-11-08
申请号：US12071889
申请日：2008-02-27
申请人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
发明人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
IPC分类号： G03F7/26
CPC分类号： G03F7/0397
摘要： A method for manufacturing a substrate for making a microarray wherein a monomolecular film for immobilizing a target molecule can be simply formed position-selectively in manufacture of the substrate for making the microarray is provided.A method for manufacturing a substrate for making a microarray, comprising, a step of forming a resist film on the substrate using a chemically amplified positive resist composition using a copolymer where a content of a monomer unit having a hydroxyl group is 5 mole % or less relative to total monomer units as a binder; a step of patterning the resist film; a step of forming a monomolecular film having a silicon oxide chain on the substrate having the patterned resist film; and subsequently a step of removing the resist film.
摘要翻译：提供了制造用于制造微阵列的基板的方法，其中用于固定靶分子的单分子膜可以简单地在用于制备微阵列的基板的制造中位置选择性地形成。一种制造微阵列的基板的制造方法，其特征在于，使用使用了具有羟基的单体单元的含量为5摩尔％以下的共聚物的化学放大型正性抗蚀剂组合物在基板上形成抗蚀剂膜的工序相对于作为粘合剂的总单体单元; 图案化抗蚀剂膜的步骤; 在具有图案化抗蚀剂膜的基板上形成具有氧化硅链的单分子膜的步骤; 随后除去抗蚀剂膜的步骤。

5. 发明申请

US20100055337A1 Method for producing substrate for making microarray 有权
标题翻译：制备微阵列的基质的制备方法
公开(公告)号：US20100055337A1
公开(公告)日：2010-03-04
申请号：US12458637
申请日：2009-07-17
申请人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
发明人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
IPC分类号： B05D1/36
CPC分类号： G01N33/54353 , B01J2219/00527 , B01J2219/00596 , B01J2219/00612 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , C40B40/04 , C40B50/18
摘要： There is disclosed a method for producing a substrate for making a microarray, the method comprising: at least, a step of forming a monomolecular film having orientated oxysilanyl groups toward an outmost surface on the substrate; and a step of forming a monomolecular film having orientated amino groups toward an outmost surface on the substrate by applying a solution containing a diamine compound to the oxysilanyl groups. There can be provided a method for producing a substrate for making a microarray in which density and orientation of amino groups orientated toward an outmost surface are controllable, and in addition, there is no delamination of a monomolecular film formed on the substrate.
摘要翻译：公开了一种制造微阵列的基板的制造方法，该方法至少包括：向基板的最外表面形成具有取向的氧联苯乙烯基的单分子膜的工序; 以及通过将含有二胺化合物的溶液施加到氧联苯乙酰基上而形成具有取向氨基的单分子膜朝向基板上的最外表面的步骤。可以提供一种制造用于制造微阵列的基板的方法，其中朝向最外表面取向的氨基的密度和取向是可控的，此外，在基板上形成的单分子膜不会发生分层。

6. 发明申请

US20080233521A1 Method for manufacturing substrate for making microarray 有权
标题翻译：制造微阵列基板的方法
公开(公告)号：US20080233521A1
公开(公告)日：2008-09-25
申请号：US12071889
申请日：2008-02-27
申请人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
发明人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
IPC分类号： G03F7/38
CPC分类号： G03F7/0397
摘要： A method for manufacturing a substrate for making a microarray wherein a monomolecular film for immobilizing a target molecule can be simply formed position-selectively in manufacture of the substrate for making the microarray is provided.A method for manufacturing a substrate for making a microarray, comprising, a step of forming a resist film on the substrate using a chemically amplified positive resist composition using a copolymer where a content of a monomer unit having a hydroxyl group is 5 mole % or less relative to total monomer units as a binder; a step of patterning the resist film; a step of forming a monomolecular film having a silicon oxide chain on the substrate having the patterned resist film; and subsequently a step of removing the resist film.
摘要翻译：提供了制造用于制造微阵列的基板的方法，其中用于固定靶分子的单分子膜可以简单地在用于制备微阵列的基板的制造中位置选择性地形成。一种制造微阵列的基板的制造方法，其特征在于，使用使用了具有羟基的单体单元的含量为5摩尔％以下的共聚物的化学放大型正性抗蚀剂组合物在基板上形成抗蚀剂膜的工序相对于作为粘合剂的总单体单元; 图案化抗蚀剂膜的步骤; 在具有图案化抗蚀剂膜的基板上形成具有氧化硅链的单分子膜的步骤; 随后除去抗蚀剂膜的步骤。

7. 发明申请

US20080233409A1 Method for manufacturing substrate for making microarray 审中-公开
标题翻译：制造微阵列基板的方法
公开(公告)号：US20080233409A1
公开(公告)日：2008-09-25
申请号：US12071885
申请日：2008-02-27
申请人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
发明人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
IPC分类号： B32B9/04
CPC分类号： B01J19/0046 , B01J2219/00317 , B01J2219/00608 , B01J2219/00617 , B01J2219/00621 , B01J2219/00626 , B01J2219/00635 , B01J2219/00637 , B01J2219/00722 , Y10T428/31663
摘要： A method for manufacturing a substrate for making a microarray, in which a monomolecular film is not detached when a target molecule is immobilized on the substrate using the monomolecular film having a silicon oxide chain is provided.A method for manufacturing a substrate for making a microarray comprising; at least a step of forming a monomolecular film on the substrate using a silane compound, wherein the monomolecular film is formed using a solution comprising the silane compound and a nitrogen-containing organic base in the step.
摘要翻译：提供一种制造微阵列的基板的方法，其中当使用具有氧化硅链的单分子膜将靶分子固定在基板上时，单分子膜不分离。一种制造微阵列用基板的方法，包括：至少使用硅烷化合物在基板上形成单分子膜的步骤，其中在该步骤中使用包含硅烷化合物和含氮有机碱的溶液形成单分子膜。

8. 发明申请

US20080233309A1 Method for manufacturing substrate for making microarray 有权
标题翻译：制造微阵列基板的方法
公开(公告)号：US20080233309A1
公开(公告)日：2008-09-25
申请号：US12073953
申请日：2008-03-12
申请人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
发明人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
IPC分类号： C23C14/28
CPC分类号： G01N33/54353 , B01J2219/00317 , B01J2219/00608 , B01J2219/00617 , B01J2219/00621 , B01J2219/00626 , B01J2219/00635 , B01J2219/00637 , B01J2219/00659 , B01J2219/00722
摘要： To provide a method for manufacturing a substrate for making a microarray which will ensure the secure immobilization of a material in a site-selective manner at a low cost. The method comprises the steps of: forming a monomolecular film on the surface of a substrate using a silane compound represented by the following general formula (1), Y3Si—(CH2)m—X (1) ,wherein m represents an integer from 3 to 20; X represents a hydroxyl group precursor functional group which will be converted to a hydroxyl group when exposed to acid; and Y independently represents a halogen atom or alkoxy group having 1-4 carbon atoms; and converting the hydroxyl group precursor functional group represented by X to a hydroxyl group; wherein the step of converting a hydroxyl group precursor functional group represented by X to a hydroxyl group comprises forming, on the monomolecular film, a polymer layer containing a compound represented by the following general formula (2) or (3),
摘要翻译：提供一种用于制造微阵列的基板的方法，该方法将以低成本确保以选址方式安全地固定材料。该方法包括以下步骤：使用由以下通式（1）表示的硅烷化合物在基材表面上形成单分子膜：<？在线式描述=“在线式”末端=“铅 “→> Y 3 -S-（CH 2）m -X（1）<βin-line-formula description =”In- 线式“end =”tail“？>，其中m表示3至20的整数; X表示当暴露于酸时将转化为羟基的羟基前体官能团; Y独立地表示具有1-4个碳原子的卤原子或烷氧基; 并将由X表示的羟基前体官能团转化为羟基; 其中将由X表示的羟基前体官能团转化为羟基的步骤包括在单分子膜上形成含有由以下通式（2）或（3）表示的化合物的聚合物层，

9. 发明申请

US20080233292A1 Method for manufacturing substrate for microarray 审中-公开
标题翻译：制造微阵列基板的方法
公开(公告)号：US20080233292A1
公开(公告)日：2008-09-25
申请号：US12076182
申请日：2008-03-14
申请人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
发明人： Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
IPC分类号： B05D3/00
CPC分类号： G01N33/54353
摘要： To provide a method for manufacturing a substrate for microarray which will allow, when a monomolecular film with silicon oxide chains formed on a substrate is used for the immobilization of a target molecule, a chemically amplified type resist film to be directly applied onto the substrate so as to simplify the process and enable fine processing, without causing therewith any problems such as the degradation of resolution and detachment, through more simplified procedures than are possible with the conventional method.The method for manufacturing a substrate for microarray comprises at least the steps of: forming a monomolecular film on the surface of a substrate using a silane compound represented by the following general formula (1), Y3Si—(CH2)m—X, (1) wherein m represents an integer from 3 to 20; X a hydroxyl group precursor functional group; and Y independently represent a halogen atom or an alkoxy group having 1-4 carbon atoms; and converting the hydroxyl group precursor functional group represented by X to a hydroxyl group.
摘要翻译：提供一种制造微阵列用基板的方法，当使用在基板上形成的具有氧化硅链的单分子膜用于固定靶分子时，将直接施加到基板上的化学放大型抗蚀剂膜为了简化处理并且能够通过比常规方法可能的更简化的程序，而不引起诸如分辨率和分离的劣化的任何问题的精细处理。制造微阵列基板的方法至少包括以下步骤：使用由以下通式（1）表示的硅烷化合物在基板表面上形成单分子膜，<？在线配方说明=“In 线“公式”end =“lead”？> Y 3 -X-（CH 2）2 -X，（1）<α在 -line-formula description =“In-line Formulas”end =“tail”？>其中m表示3至20的整数; X为羟基前体官能团; 和Y独立地表示卤素原子或具有1-4个碳原子的烷氧基; 并将由X表示的羟基前体官能团转化成羟基。

10. 发明授权

US08541158B2 Positive resist compositions and patterning process 有权
标题翻译：正极抗蚀剂组成和图案化工艺
公开(公告)号：US08541158B2
公开(公告)日：2013-09-24
申请号：US13013143
申请日：2011-01-25
申请人： Wataru Kusaki , Takeshi Kinsho , Takeru Watanabe
发明人： Wataru Kusaki , Takeshi Kinsho , Takeru Watanabe
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0397 , G03F7/2041
摘要： A positive resist composition is provided comprising an acid generator, a resin component which generates resin-solubilizing groups under the action of acid so that the resin component becomes soluble in an alkaline developer, at least some resin-solubilizing groups being carboxyl groups, and a compound for activating or condensing a carboxyl group. When processed by the lithography, the resist composition forms a resist pattern having a very high resolution and good mask fidelity.
摘要翻译：提供了一种正性抗蚀剂组合物，其包含酸产生剂，在酸的作用下产生树脂增溶基团的树脂组分，使得树脂组分变得可溶于碱性显影剂，至少一些树脂增溶基团为羧基，用于活化或缩合羧基的化合物。当通过光刻处理时，抗蚀剂组合物形成具有非常高的分辨率和良好的掩模保真度的抗蚀剂图案。

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