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    • 1. 发明授权
    • Dual focus lens with extended depth of focus
    • 双焦距镜头,具有更高的焦距
    • US06330118B1
    • 2001-12-11
    • US09288269
    • 1999-04-08
    • Walter DaschnerBarry BlockArnold ThorntonBernard Kress
    • Walter DaschnerBarry BlockArnold ThorntonBernard Kress
    • G02B310
    • G11B7/1365G02B5/1876G02B5/188G11B7/0908G11B7/1353G11B7/1374G11B7/13922G11B2007/0006
    • A magneto optic or optical disk drive comprises a laser source for providing laser beam, and a lens or compound lens for focussing the laser onto a currently inserted recording disk with specific overcoat thickness. In one embodiment, the lens is a compound lens that can focus aberration-free spots on different types of disk media having recording layers located under overcoats of different thicknesses. When a specific disk is inserted, only one spot in focussed onto the current recording layer. Furthermore, if the disk spins rapidly, it can wobble. The lens or compound lens comprises different regions where the focal length may vary slightly and continuously or discretely. Because of this, as the disk wobbles, the lens can nonetheless continue to focus laser light onto a small spot on the recording media, providing increased depth of focus in the vicinity of the currently inserted recording media. Furthermore, the increased depth of focus will also remedy problems related to the change in focal length of the lens with changes in wavelength of the laser source. Because some of these changes in wavelength occur abruptly, this is also a case in which the limited performance of the auto-focus tracking system would be overly burdened.
    • 磁光盘或光盘驱动器包括用于提供激光束的激光源和用于将激光聚焦到具有特定外涂层厚度的当前插入的记录盘上的透镜或复合透镜。 在一个实施例中,透镜是可以将像差自由点聚焦在具有位于不同厚度的外涂层下的记录层的不同类型的盘介质上的复合透镜。 当插入特定盘时,只有一个点集中在当前记录层上。 此外,如果磁盘快速旋转,则可能会摆动。 透镜或复合透镜包括不同的区域,其中焦距可以稍微和连续地或离散地变化。 正因为如此,随着磁盘的摆动,透镜可以继续将激光聚焦到记录介质上的一个小点上,从而在当前插入的记录介质附近提供增加的焦点深度。 此外,增加的焦深也将补救与激光源的波长变化相关的透镜焦距变化的问题。 因为这些波长的一些变化突然发生,所以这也是自动对焦跟踪系统的有限性能过度负担的情况。
    • 5. 发明授权
    • Infrared laser detector employing a pressure controlled differential
optoacoustic detector
    • 红外激光探测器采用压力差分光电探测器
    • US4019056A
    • 1977-04-19
    • US572013
    • 1975-04-28
    • Barry BlockHarry E. Aine
    • Barry BlockHarry E. Aine
    • G01N21/17G01J3/42
    • G01N21/1702
    • An infrared laser absorption spectrometer is disclosed wherein a pair of detector cells are disposed serially along the laser beam path. The laser beam is modulated to produce a modulation of the absorption by the sample materials in the two cells. Modulated absorption by the samples produces an acoustic wave in each cell which is detected by a suitable microphone and subtracted so as to produce a difference signal corresponding to the difference in infrared absorption between the two cells so that undesired background effects common to both cells are cancelled. A pressure controller, which is responsive to the pressure difference between the sample pressure in the two cells at a frequency substantially below the beam modulation frequency is employed for controlling the pressure differential. In one embodiment the pressure controller includes a compliant membrane partitioning the two cells so that the membrane may move so as to equalize the pressures. In a second embodiment, deflection of the diaphragm of a differential microphone coupled into both cells is employed to derive an output utilized to control either the flow through the cells and/or the volume of the respective cells to control the pressure difference between the cells.
    • 公开了一种红外激光吸收光谱仪,其中一对检测器单元沿着激光束路径串联布置。 调制激光束以产生两个单元中的样品材料的吸收的调制。 样本的调制吸收在每个单元中产生声波,由合适的麦克风检测并减去,以产生对应于两个单元之间的红外吸收差的差信号,从而消除两个单元共同的不期望的背景效应 。 采用压力控制器,该压力控制器以基本上低于束调制频率的频率响应两个单元中的样品压力之间的压力差来控制压力差。 在一个实施例中,压力控制器包括分隔两个电池的顺应膜,使得膜可以移动以便均衡压力。 在第二实施例中,使用耦合到两个单元中的差分麦克风的隔膜的偏转来导出用于控制通过单元的流量和/或各个单元的体积以控制单元之间的压力差的输出。
    • 9. 发明授权
    • Thermal fluid flow sensing method and apparatus for sensing flow over a
wide range of flow rates
    • 热流体流量检测方法和装置,用于检测大范围流量的流量
    • US4733559A
    • 1988-03-29
    • US892111
    • 1986-08-04
    • Harry E. AineBarry Block
    • Harry E. AineBarry Block
    • G01F1/684G01F1/696G01F7/00G01F1/68
    • G01F1/696G01F1/684G01F1/6845G01F1/6847G01F7/00
    • Miniature thermal fluid flow sensors of the airfoil type are made in batch form by forming the thermal fluid flow sensors on a thin sheet of material and bonding the sheet over an array of duct structures and dicing the individual sensors and duct structures apart. In one thermal flow sensor configuration, a flow heater is dispsoed inbetween first and second thermal flow sensors in heat exchanging relation therewith. A third thermal flow sensor is disposed upstream of the others out of heat exchanging relation with the heater for operation of the heater at a certain temperature above that sensed by the third sensor. In the low flow regime, flow is measured by the difference between the outputs of the first and second sensors, whereas in the high flow regime, the power required to maintain the temperature of the heater serves as a measure of the flow.
    • 通过在薄片材料上形成热流体流量传感器并将片材粘合在管道结构阵列上并将各个传感器和管道结构分开切割,从而以分批形式制造翼型的微型热流体流量传感器。 在一个热流传感器配置中,流动加热器分布在与其交换热交换的第一和第二热流传感器之间。 第三热流传感器设置在与加热器的热交换关系之外的其他热流传感器的上游,以在高于由第三传感器感测的温度的一定温度下操作加热器。 在低流量状态下,通过第一和第二传感器的输出之间的差异测量流量,而在高流量状态下,维持加热器温度所需的功率用作流量的度量。
    • 10. 发明授权
    • Method for producing a mask for use in X-ray photolithography and
resulting structure
    • 用于生产用于X射线光刻及其结构的掩模的方法
    • US4680243A
    • 1987-07-14
    • US761993
    • 1985-08-02
    • Alexander R. ShimkunasBarry Block
    • Alexander R. ShimkunasBarry Block
    • G03F1/22H01L21/027G21K5/00B44C1/22C23F1/02G03F9/00
    • G03F1/22
    • A method for manufacturing a mask (100) for use in x-ray photolithographic processes includes the step of coating a silicon wafer (10) with a layer of boron nitride (12). A masking substance (14) is used to coat one side of the boron nitride coated wafer, and the boron nitride is etched off of the other side of the wafer. The wafer (10) is then bonded to a pyrex ring (16) using a field assisted thermal bonding process. During the field assisted thermal bonding process, the silicon (11) is bonded directly to the pyrex (16). Then, a zirconium layer (24) is used to cover the mask and is selectively etched where it is desired to remove a circular portion of the silicon. Thereafter the silicon is subjected to a semianisotropic etch. The remaining structure includes a pyrex ring bonded to a silicon ring across which a layer of boron nitride is stretched. The layer of boron nitride is subjected to an annealing process and is then coated with an x-ray opaque material.
    • 制造用于x射线光刻工艺的掩模(100)的方法包括用氮化硼层(12)涂覆硅晶片(10)的步骤。 掩模物质(14)用于涂覆氮化硼涂覆的晶片的一侧,氮化硼从晶片的另一侧蚀刻掉。 然后使用场辅助热粘合工艺将晶片(10)结合到焦耳环(16)。 在场辅助热粘合过程中,硅(11)直接键合到发烟(16)。 然后,使用锆层(24)覆盖掩模,并且在需要去除硅的圆形部分的情况下被选择性地蚀刻。 此后,将硅进行半等向各向异性蚀刻。 剩余的结构包括结合到硅环上的发烟环,氮化硼层被拉伸通过该硅环。 对氮化硼层进行退火处理,然后用X射线不透明材料涂覆。