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1. 发明申请

US20070018583A1 High pressure discharge lamp 失效
标题翻译：高压放电灯
公开(公告)号：US20070018583A1
公开(公告)日：2007-01-25
申请号：US10574636
申请日：2004-10-07
申请人： Volker Hildenbrand , Achim Koerber , Antonius Van Amstel , Johannes Antonius Schellen , Marco Haverlag , Cornelis Pot
发明人： Volker Hildenbrand , Achim Koerber , Antonius Van Amstel , Johannes Antonius Schellen , Marco Haverlag , Cornelis Pot
IPC分类号： H01J61/12 , H01J17/20
CPC分类号： H01J61/125
摘要： The invention relates to a high pressure discharge lamp intended for use in assimilation lighting. According to the invention the high-pressure discharge lamp has a discharge vessel, which besides a buffer gas comprises substantially LiI as metal halide or a mixture of LiI and NaI.
摘要翻译：本发明涉及一种旨在用于同化照明的高压放电灯。根据本发明，高压放电灯具有放电容器，除了缓冲气体外还包含基本上为LiI的金属卤化物或LiI和NaI的混合物。

2. 发明授权

US5637237A Method for hot wall reactive ion etching using a dielectric or metallic liner with temperature control to achieve process stability 失效
标题翻译：使用具有温度控制的电介质或金属衬里的热壁反应离子蚀刻方法来实现工艺稳定性
公开(公告)号：US5637237A
公开(公告)日：1997-06-10
申请号：US473507
申请日：1995-06-07
申请人： Gottlieb S. Oehrlein , David Vender , Ying Zhang , Marco Haverlag
发明人： Gottlieb S. Oehrlein , David Vender , Ying Zhang , Marco Haverlag
IPC分类号： C23F4/00 , H01J37/32 , H01L21/302 , H01L21/3065 , H01L21/30
CPC分类号： H01J37/32862 , Y10S156/914
摘要： The present invention relates to a method and apparatus for etching semiconductor devices where the undesirable deposition of films on the internal surfaces of the apparatus are prevented during the etching process. The system for etching devices provides an etching chamber having a deposition resistant surface, a holder for holding the device to be etched, and a heater for heating the deposition resistant surface to a temperature between 100 C to 600 C to impede the formation of films on the walls of the chamber. The etching system may further include the deposition resistant surface surrounding the holder while not interfering with the plasma used to etch the substrate.
摘要翻译：本发明涉及一种用于蚀刻半导体器件的方法和装置，其中在蚀刻工艺期间防止膜在内表面上不期望的沉积。用于蚀刻装置的系统提供具有耐沉积表面的蚀刻室，用于保持被蚀刻装置的保持器和用于将耐沉积表面加热到100℃至600℃之间的温度以阻止膜上形成的加热器房间的墙壁。蚀刻系统还可以包括围绕保持器的耐沉积表面，而不干扰用于蚀刻衬底的等离子体。

3. 发明申请

US20080215124A1 Apparatus for Cosmetic Skin Rejuvenation Treatment 审中-公开
标题翻译：化妆品皮肤复原治疗仪
公开(公告)号：US20080215124A1
公开(公告)日：2008-09-04
申请号：US11917204
申请日：2006-06-13
申请人： Giovanna Wagenaar Cacciola , Vincent Fischer , Marco Haverlag , Robert John De Jonge
发明人： Giovanna Wagenaar Cacciola , Vincent Fischer , Marco Haverlag , Robert John De Jonge
IPC分类号： A61N5/06 , A61B18/18
CPC分类号： A61B18/203 , A61B2018/00452 , A61B2018/0047 , A61B2018/1807 , A61N5/0616
摘要： The present invention relates to an apparatus for cosmetic skin rejuvenation treatment, comprising a continuous wave light source accommodating a high-intensity discharge lamp (104; 204; 304; 604) which has at least one predominant spectral peak between 600 and 700 nm.
摘要翻译：本发明涉及一种用于美容皮肤复原治疗的装置，其包括连续波光源，其容纳具有600-700nm之间的至少一个主要光谱峰的高强度放电灯（104; 204; 304,604）。

4. 发明授权

US5883711A Method and device for selecting low-pressure mercury discharge lamps 失效
标题翻译：选择低压汞放电灯的方法和装置
公开(公告)号：US5883711A
公开(公告)日：1999-03-16
申请号：US899947
申请日：1997-07-24
申请人： Marco Haverlag , Franciscus J. Van Dam , Engelbertus C. P. Vossen
发明人： Marco Haverlag , Franciscus J. Van Dam , Engelbertus C. P. Vossen
IPC分类号： G01N21/64 , G01N21/62 , H01J9/42 , H01J9/50 , H01J9/52
CPC分类号： H01J9/52 , H01J9/42 , Y02W30/828
摘要： The invention relates to a method of selecting low-pressure mercury discharge lamps each provided with a discharge vessel which supports a luminescent layer on an inner surface, by which method the luminescent layer is excited and the low-pressure mercury discharge lamps are selected in dependence on the emission spectrum of the light radiated by the luminescent layer. The invention also relates to a device for selecting low-pressure mercury discharge lamps which are each provided with a discharge vessel supporting a luminescent layer on an inner surface, which device is provided with an excitation source for exciting the luminescent layers of the low-pressure mercury discharge lamps to be selected and with detection means for detecting the light radiated by the low-pressure mercury discharge lamps to be selected. According to the invention, the selection process comprises at least one step in which it is determined from previously defined portions of the emission spectrum whether or not the luminescent layer contains a given luminescent material. It was found to be possible by means of this selection criterion to subdivide the luminescent layers into a small number of groups, each group being capable of recycling in a simple manner and with a high yield.
摘要翻译：本发明涉及一种选择低压汞放电灯的方法，每个放电灯具有一个在内表面上支持发光层的放电容器，通过这种方法激发发光层，依靠选择低压汞放电灯关于由发光层照射的光的发射光谱。本发明还涉及一种用于选择低压汞放电灯的装置，每个设置有在内表面上支撑发光层的放电容器，该装置设置有用于激发低压发光层的激发源要选择的汞放电灯和用于检测由要选择的低压汞放电灯辐射的光的检测装置。根据本发明，选择过程包括至少一个步骤，其中根据发射光谱的先前定义的部分确定发光层是否含有给定的发光材料。发现通过该选择标准可以将发光层细分成少量组，每组能够以简单的方式和高产率回收。

5. 发明申请

US20080255547A1 Uv Lamp for Treatment of the Skin 审中-公开
标题翻译： Uv灯治疗皮肤
公开(公告)号：US20080255547A1
公开(公告)日：2008-10-16
申请号：US12065623
申请日：2006-09-01
申请人： Giovanna Wagenaar-Cacciola , Arjan Van Der Pol , Matthias Born , Marc Janssen , Marco Haverlag
发明人： Giovanna Wagenaar-Cacciola , Arjan Van Der Pol , Matthias Born , Marc Janssen , Marco Haverlag
IPC分类号： A61N7/00 , C09K11/77
CPC分类号： C09K11/778 , A61N5/0616 , A61N2005/0661 , A61N2005/0662 , C09K11/616 , C09K11/666 , C09K11/774 , H01J61/125
摘要： UV lamp for treatment of the skin, which lamp has a radiation capacity substantially entirely in the UV spectrum and in the red-light spectrum, wherein the radiation capacity of the lamp in the red light spectrum between 600 nm and 700 nm is at least 3% of the radiation capacity in the UV spectrum. In a first embodiment the lamp is a UV fluorescent lamp, having a first UV emitting phosphor and a second red light emitting phosphor, wherein the red light emitting phosphor is CeGdMgB5O10:Tb,Mn. In a second embodiment the lamp is a UV HID lamp, wherein the bulb of the lamp contains LiI and/or CaI2 as a red light radiation salt.
摘要翻译：用于治疗皮肤的UV灯，该灯具有基本上完全在UV光谱和红光光谱中的辐射能力，其中在600nm和700nm之间的红光光谱中的灯的辐射能量为至少3 UV光谱中的辐射能量的百分比。在第一实施例中，灯是具有第一UV发射荧光体和第二红色发光荧光体的UV荧光灯，其中红色发光荧光体是CeGdMgB 5 O 10 >：Tb，Mn。在第二实施例中，灯是UV HID灯，其中灯泡包含作为红光辐射盐的LiI和/或CaI 2 2。

6. 发明授权

US5798016A Apparatus for hot wall reactive ion etching using a dielectric or metallic liner with temperature control to achieve process stability 失效
标题翻译：用于使用具有温度控制的电介质或金属衬垫进行热壁反应离子蚀刻的设备，以实现工艺稳定性
公开(公告)号：US5798016A
公开(公告)日：1998-08-25
申请号：US208158
申请日：1994-03-08
申请人： Gottlieb Stefan Oehrlein , David Vender , Ying Zhang , Marco Haverlag
发明人： Gottlieb Stefan Oehrlein , David Vender , Ying Zhang , Marco Haverlag
IPC分类号： C23F4/00 , H01J37/32 , H01L21/302 , H01L21/3065
CPC分类号： H01J37/32862 , Y10S156/914
摘要： The present invention relates to a method and apparatus for etching semiconductor devices where the undesirable deposition of films on the internal surfaces of the apparatus are prevented during the etching process. The system for etching devices provides an etching chamber having a deposition resistant surface, a holder for holding the device to be etched, and a heater for heating the deposition resistant surface to a temperature between 100.degree. C. to 600.degree. C. to impede the formation of films on the walls of the chamber. The etching system may further include the deposition resistant surface surrounding the holder while not interfering with the plasma used to etch the substrate.
摘要翻译：本发明涉及一种用于蚀刻半导体器件的方法和装置，其中在蚀刻工艺期间防止膜在内表面上不期望的沉积。用于蚀刻装置的系统提供具有耐沉积表面的蚀刻室，用于保持被蚀刻装置的保持器和用于将耐沉积表面加热到100℃至600℃的温度的加热器，以阻止在室壁上形成膜。蚀刻系统还可以包括围绕保持器的耐沉积表面，而不干扰用于蚀刻衬底的等离子体。

7. 发明授权

US07190118B2 Metal halide lamp having ionizable iodide salt 有权
标题翻译：金属卤化物灯具有可电离的碘化物盐
公开(公告)号：US07190118B2
公开(公告)日：2007-03-13
申请号：US10521135
申请日：2003-06-17
申请人： Karst Vaartjes , Marco Haverlag , Josephus Christiaan Maria Hendricx
发明人： Karst Vaartjes , Marco Haverlag , Josephus Christiaan Maria Hendricx
IPC分类号： H01J17/16
CPC分类号： H01J61/125
摘要： A metal halide lamp comprising a substantially cylindrical discharge vessel having an internal diameter Di
摘要翻译：一种金属卤化物灯，包括具有内径Di <2.0mm并填充有可电离填充物的基本上圆柱形的放电容器，其中两个电极存在于相互距离EA处以保持放电容器中的放电，其中所述填充物包含惰性诸如Xe的气体，其在室温下的压力在5至25巴之间，以及可电离盐，其特征在于所述可电离盐选自PrI 3，NdI 3和LuI 3。

8. 发明申请

US20060175975A1 Fluorescent lamp with auxiliary discharge and method for manufacturing the same 审中-公开
标题翻译：具有辅助放电的荧光灯及其制造方法
公开(公告)号：US20060175975A1
公开(公告)日：2006-08-10
申请号：US10565812
申请日：2004-07-16
申请人： Marco Haverlag , Wilhelmus Hellebrekers , Rolf De Man , Lambert Kaldenhoven
发明人： Marco Haverlag , Wilhelmus Hellebrekers , Rolf De Man , Lambert Kaldenhoven
IPC分类号： H01K1/62 , H01J17/34
CPC分类号： H01J61/24 , H01J61/72
摘要： Fluorescent lamp comprising a glass discharge vessel (2) in which an ionizable and vaporizable filling is present, which discharge vessel is on two sides provided with a tubular end portion including a glass stem, wherein an exhaust tube (6) extends axially outwardly from said stem for supplying and/or discharging gases during production of the lamp, wherein a main electrode (8) extends axially inwardly through the stem for generating and maintaining a discharge in the discharge vessel, and wherein the lamp comprises means including an auxiliary electrode (15) for controlling the pressure of said filling in the vapor phase, despite changes in temperature thereof, with the special feature that said auxiliary electrode is located on at least one end portion for generating and maintaining an auxiliary discharge between the main electrode and the auxiliary electrode.
摘要翻译：荧光灯包括其中存在可电离和可蒸发的填充物的玻璃放电容器（2），该放电容器在两侧设置有包括玻璃杆的管状端部，其中排气管（6）从所述用于在灯的生产期间供应和/或排出气体的阀杆，其中主电极（8）沿轴向向内延伸穿过所述阀杆，以产生并保持在所述放电容器中的放电，并且其中所述灯包括装置，所述装置包括辅助电极），用于控制气相中所述填充的压力，尽管其温度变化，其特征在于所述辅助电极位于至少一个端部上，用于在主电极和辅助电极之间产生和保持辅助放电。

9. 发明申请

US20050253535A1 Starter 失效
标题翻译：起动机
公开(公告)号：US20050253535A1
公开(公告)日：2005-11-17
申请号：US10515742
申请日：2003-06-04
申请人： Willem Van Den Hoek , Marco Haverlag
发明人： Willem Van Den Hoek , Marco Haverlag
IPC分类号： H05B41/18 , H05B41/04 , H05B37/02
CPC分类号： H05B41/046 , Y10S315/05
摘要： A starter for igniting a fluorescent lamp comprises means for synchronizing the ignition voltage pulse with the preheat current in such a way that the ignition voltage pulse is applied in the direct vicinity of a zero-crossing of the preheat current. Lamp life is thereby considerably lengthened.
摘要翻译：用于点燃荧光灯的起动器包括用于使点火电压脉冲与预热电流同步的装置，使点火电压脉冲直接接近预热电流的过零点。因此灯泡寿命显着延长。

10. 发明申请

US20050104500A1 Discharge lamp 审中-公开
标题翻译：放电灯
公开(公告)号：US20050104500A1
公开(公告)日：2005-05-19
申请号：US10500509
申请日：2002-12-20
申请人： Marco Haverlag , Robertus Keijser , Pascale Hepp
发明人： Marco Haverlag , Robertus Keijser , Pascale Hepp
IPC分类号： H01J61/10 , H01J5/48 , H01J5/50 , H01J61/34 , H01J61/50 , H01J61/82
CPC分类号： H01J61/827 , H01J61/10 , H01J61/34
摘要： The invention relates to a discharge lamp (1) having an outer bulb (2) that is provided with a lamp cap (3) at one end. The outer bulb encloses a discharge vessel (4) comprising electrodes, a first current conductor (5) and a second current conductor (6) arranged at some distance from the first current conductor, which current conductors establish an electric connection between the electrodes and the lamp cap. The shortest distance between the electrodes forms a discharge axis (40) of the discharge vessel. Part of the second current conductor (6) is placed substantially sidelong to the discharge axis. According to the invention, the second current conductor (6) comprises successive parts (7,8,9) arranged sidelong to the discharge axis and at mutually different distances from said axis.
摘要翻译：本发明涉及具有在一端设置有灯头（3）的外灯泡（2）的放电灯（1）。外部灯泡包围放电容器（4），其包括电极，布置在与第一电流导体一定距离处的第一电流导体（5）和第二电流导体（6），该电流导体在电极和电极之间建立电连接灯头电极之间的最短距离形成放电容器的放电轴线（40）。第二电流导体（6）的一部分基本上被放置在放电轴线上。根据本发明，第二电流导体（6）包括连续的部分（7,8,9），该连续部分布置在排出轴线的正上方且与所述轴线相距不同的距离处。

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