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    • 1. 发明授权
    • Package with environmental control material carrier
    • 包装与环境控制材料载体
    • US06664779B2
    • 2003-12-16
    • US09992178
    • 2001-11-05
    • Vincent C. LopesJwei Wien Liu
    • Vincent C. LopesJwei Wien Liu
    • G01R342
    • H01L23/26B81B3/0005B81B7/0038H01L2924/0002H01L2924/00
    • A drop-in environmental control material carrier assembly 55, which improves the performance and lowers the cost of semiconductor packages. The environmental control materials are positioned inside the package cavity by means of a drop-in environmental control material carrier assembly 54, which can hold up to eight materials. Three types of environmental control materials are typically used in micromirror packages: (1) one for absorbing moisture inside the package, (2) one for absorbing adhesive outgassing constituents inside the package, and (3) one for storing the PFDA lubricant used to prevent the micromirror mirrors from sticking. The performance and lifetime of the micromirror devices are improved and the cost of projection display systems, in which these micromirrors are central components, is lowered.
    • 一种落入式环境控制材料载体组件55,其改进了性能并降低了半导体封装的成本。 环境控制材料通过能够容纳多达八种材料的落入式环境控制材料载体组件54定位在包装腔内。 微镜包装中通常使用三种环境控制材料:(1)用于吸收包装内水分的一种,(2)用于吸收包装内粘合剂除气成分的一种;(3)一种用于储存PFDA润滑剂用于防止 微镜反射镜粘贴。 提高了微镜器件的性能和寿命,降低了这些微镜是中心部件的投影显示系统的成本。
    • 2. 发明授权
    • Package with environmental control material carrier
    • 包装与环境控制材料载体
    • US06879147B2
    • 2005-04-12
    • US10674829
    • 2003-09-30
    • Vincent C. LopesJwei Wien Liu
    • Vincent C. LopesJwei Wien Liu
    • B81B7/00H01L23/26G01R31/302
    • H01L23/26B81B3/0005B81B7/0038H01L2924/0002H01L2924/00
    • A drop-in environmental control material carrier assembly 55, which improves the performance and lowers the cost of semiconductor packages. The disclosed approach positions the environmental control materials inside the package cavity by means of a drop-in environmental control material carrier assembly 54, which can hold up to eight materials. In the case of a packaged micromirror, the getters consist of at least three types; i.e., (1) one for absorbing moisture inside the package, (2) one for absorbing adhesive outgassing constituents inside the package, and (3) one for storing the PFDA lubricant used to prevent the micromirror mirrors from sticking. The performance and lifetime of the micromirror devices are improved and the cost of projection display systems, in which these micromirrors are central components, is lowered. The preceding abstract is submitted with the understanding that it only will be used to assist in determining, from a cursory inspection, the nature and gist of the technical disclosure as described in 37 C.F.R. § 1.72(b). In no case should this abstract be used for interpreting the scope of any patent claims.
    • 一种落入式环境控制材料载体组件55,其改进了性能并降低了半导体封装的成本。 所公开的方法通过能够容纳多达八种材料的落入式环境控制材料载体组件54将环境控制材料定位在包装腔内。 在包装微镜的情况下,吸气剂由至少三种类型组成; 即(1)用于吸收包装内的水分的装置,(2)用于吸收包装内的粘合剂除气成分的装置,和(3)用于储存用于防止微反射镜粘附的PFDA润滑剂的装置。 提高了微镜器件的性能和寿命,降低了这些微镜是中心部件的投影显示系统的成本。 提交上述摘要的理解是,它只会用于协助从粗略检查中确定37 C.F.R.描述的技术披露的性质和要点。 §1.72(b)。 在任何情况下,本摘要不得用于解释任何专利权利要求的范围。
    • 4. 发明授权
    • Separating wafers coated with plastic films
    • US07071025B2
    • 2006-07-04
    • US10038813
    • 2001-12-31
    • Michael F. BrennerVincent C. Lopes
    • Michael F. BrennerVincent C. Lopes
    • H01L21/48H01L21/31
    • B81C1/00896
    • The method of protecting micromechanical structures during a wafer fabrication process. A protective layer 402 is deposited to protect the fragile microstructures during a wafer separation process and a post separation cleanup process. Suitable protective layers 402 typically are plastic and tend to deform or delaminate when the wafer is sawn. The deformation of the protective overcoat during the saw process destroys the structures it is intended to protect. To prevent deformation of the protective layer 402, a brittle layer 404 is deposited on the protective layer 402 to hold the protective layer in place during the saw process. Cured photoresist is a suitable protective layer. The photoresist can be applied to the protective layer using standard processes and cured, typically by baking the photoresist. Once the wafer is separated, the brittle layer may be removed. After the debris created during the saw process is removed, the protective overcoat may be removed. The brittle layer 404 and the protective overcoat 402 may be removed at the same time. The preceding abstract is submitted with the understanding that it only will be used to assist in determining, from a cursory inspection, the nature and gist of the technical disclosure as described in 37 C.F.R. § 1.72(b). In no case should this abstract be used for interpreting the scope of any patent claims.