专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5663973A Tunable narrowband source of a coherent radiation 失效
标题翻译：可调窄带源的相干辐射
公开(公告)号：US5663973A
公开(公告)日：1997-09-02
申请号：US661229
申请日：1996-06-10
申请人： Uwe Stamm , Ingo Klaft , Vadim Berger , Stefan Borneis , Peter Lokai
发明人： Uwe Stamm , Ingo Klaft , Vadim Berger , Stefan Borneis , Peter Lokai
IPC分类号： G02F1/39 , H01S3/10
CPC分类号： G02F1/39
摘要： A tunable narrowband source of a coherent radiation, comprisinga first optical parametric oscillator (OPO1) which includes at least one first optical parametric amplifier medium (K.sub.1) in a resonator (18, 20; 20, 34) or an optical parametric generator;at least one second optical parametric oscillator (OPO2) which includes at least one second optical parametric amplifier medium (K.sub.2) in a resonator (22, 24) and into which is coupled the output radiation (28; 28b) of the first optical parametric oscillator (OPO1);at least one third optical parametric amplifier medium (OPA) into which is coupled the output radiation (30) of the second optical parametric oscillator (OPO2); andmeans (12, 14, 16, 26) for generating and coupling the pump radiation (10, 10') into the first and second optical parametric oscillators (OPO1, OPO2) and into the third optical parametric amplifier medium OPA), whereinthe output radiation (28; 28b) of the first optical parametric oscillator (OPO1) which is coupled into the second optical parametric oscillator (OPO2) has a bandwidth which is smaller than the spacing of the only one longitudinal mode is excited and coupled into the third optical parametric amplifier medium (K.sub.3, K.sub.4) and amplified therein.
摘要翻译：包括相干辐射的可调窄带源，包括第一光参量振荡器（OPO1），其包括在谐振器（18,20; 20,34）中的至少一个第一光参量放大器介质（K1）或光参量发生器; 至少一个第二光参量振荡器（OPO2），其包括在谐振器（22,24）中的至少一个第二光参量放大器介质（K2），其中耦合到所述第一光参量振荡器的输出辐射（28; 28b）（OPO1）; 至少一个第三光参量放大器介质（OPA），其耦合到所述第二光参量振荡器（OPO2）的输出辐射（30）; 以及用于产生并将泵浦辐射（10,10'）耦合到第一和第二光学参量振荡器（OPO1，OPO2）并进入第三光学参量放大器介质OPA的装置（12,14,16,26）），其中耦合到第二光参量振荡器（OPO2）中的第一光参量振荡器（OPO1）的输出辐射（28; 28b）具有小于仅一个纵模的间隔的带宽被激发并耦合到第三光参参振荡器光学参量放大器介质（K3，K4）并在其中放大。

2. 发明授权

US5896220A Production of narrow-band coherent radiation by using at least one optical parametric oscillator 失效
标题翻译：通过使用至少一个光学参数振荡器来生产窄带相干辐射
公开(公告)号：US5896220A
公开(公告)日：1999-04-20
申请号：US906523
申请日：1997-08-05
申请人： Uwe Stamm , Ingo Klaft , Stefan Borneis , Vadim Berger , Peter Lokai
发明人： Uwe Stamm , Ingo Klaft , Stefan Borneis , Vadim Berger , Peter Lokai
IPC分类号： G02F1/39
CPC分类号： G02F1/39
摘要： A source of narrow-band coherent radiation has a first optical parametric oscillator (OPO 1) for producing seed radiation, and a second optical parametric oscillator (OPO 2), into which the seed radiation is input after passing through a wavelength-selective element (G). In order to stabilize and adjust the bandwidth of the radiation (14) emitted by the second optical parametric oscillator (OPO 2), radiation of this type is also input into the wavelength-selective element (G) and thereby analyzed, in order, in accordance with the analysis, to adjust the wavelength-selective element or the OPO 2.
摘要翻译：窄带相干辐射源具有用于产生种子辐射的第一光学参量振荡器（OPO 1）和第二光学参量振荡器（OPO 2），种子辐射在通过波长选择元件之后被输入其中 G）。为了稳定和调整由第二光参量振荡器（OPO 2）发射的辐射（14）的带宽，这种类型的辐射也被输入到波长选择元件（G）中，从而依次分析按照分析，调整波长选择元素或OPO 2。

3. 发明授权

US5661595A Tunable, optical parametric oscillator 失效
标题翻译：可调谐光参量振荡器
公开(公告)号：US5661595A
公开(公告)日：1997-08-26
申请号：US626505
申请日：1996-04-02
申请人： Uwe Stamm , Peter Lokai , Vadim Berger , Stefan Borneis
发明人： Uwe Stamm , Peter Lokai , Vadim Berger , Stefan Borneis
IPC分类号： G02F1/39
CPC分类号： G02F1/39
摘要： A tunable, optical, parametric oscillator including at least one non-linear optical crystal (10) comprises a first deflector mirror (18) arranged inside the resonator between the resonator mirror (12) and the crystal (10) to couple in the pump radiation (16) as well as a second deflector mirror (20) arranged outside the resonator behind a second resonator mirror (14) to separate the pump radiation (22) from the radiation (24) generated in the optical parametric oscillator.
摘要翻译：包括至少一个非线性光学晶体（10）的可调谐光学参量振荡器包括布置在谐振器反射镜（12）和晶体（10）之间的谐振器内部的第一偏转镜（18），以在泵浦辐射（16）以及布置在谐振器外部的第二谐振镜（14）之后的第二偏转镜（20），以将泵浦辐射（22）与在光学参量振荡器中产生的辐射（24）分离。

4. 发明授权

US06243405B1 Very stable excimer or molecular fluorine laser 有权
标题翻译：非常稳定的准分子或分子氟激光
公开(公告)号：US06243405B1
公开(公告)日：2001-06-05
申请号：US09484818
申请日：2000-01-18
申请人： Stefan Borneis , Klaus Brunwinkel , Uwe Stamm , Frank Voss
发明人： Stefan Borneis , Klaus Brunwinkel , Uwe Stamm , Frank Voss
IPC分类号： H01S322
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70575 , H01S3/036 , H01S3/134 , H01S3/225
摘要： A technique of stabalizing during operation a gas mixture with a gas composition initially provided within a discharge chamber of an excimer or molecular fluorine gas discharge laser includes monitoring a temporal pulse shape of the laser beam and adjusting and/or determining the status of the gas mixture based on the monitored temporal pulse shape. The monitored temporal pulse shape is preferably compared with a reference temporal pulse shape. The difference or deviation between the monitored temporal pulse shape and a reference temporal pulse shape is calculated. The amount of and intervals between gas replenishment actions are determined based on the calculated deviation. The energy of the beam is also monitored and the driving voltage and gas actions are adjusted to stabilize the energy, energy stability and/or energy dose.
摘要翻译：在操作期间稳定化技术，其中最初设置在准分子或分子氟气放电激光器的放电室内的气体组成的气体混合物包括监测激光束的时间脉冲形状并调节和/或确定气体混合物的状态基于监视的时间脉冲形状。所监视的时间脉冲形状优选地与参考时间脉冲形状进行比较。计算所监视的时间脉冲形状与参考时间脉冲形状之间的差异或偏差。基于计算的偏差来确定补充气体动作的量和间隔。还监测光束的能量，并且调节驱动电压和气体动作以稳定能量，能量稳定性和/或能量剂量。

5. 发明授权

US08349226B2 Method of increasing the laser damage threshold of diffraction gratings 失效
$Method of increasing the laser damage threshold of diffraction gratings$
标题翻译：增加衍射光栅的激光损伤阈值的方法
公开(公告)号：US08349226B2
公开(公告)日：2013-01-08
申请号：US11883435
申请日：2006-02-16
申请人： Stefan Borneis , Eckehard Onkels , Dasa Javorkova , Paul Neumayer
发明人： Stefan Borneis , Eckehard Onkels , Dasa Javorkova , Paul Neumayer
IPC分类号： B29D11/00
CPC分类号： H01S3/0057 , B23K26/0604 , B23K26/0613 , B23K26/067 , G02B1/12 , G02B5/18
摘要： For increasing the laser damage threshold (LDT) of diffraction gratings, particularly of multi-layer dielectric diffraction (MLD) gratings, the invention proposes a method for treating a diffraction grating to be used in a high energy laser apparatus having a first laser with the steps of providing the diffraction grating, providing a second treatment laser and irradiating the diffraction grating with laser light from the second treatment laser until the laser damage threshold of the diffraction grating has increased.Furthermore, the invention proposes a diffraction grating treated according to the method, as well as a laser system, which comprises such a diffraction grating.
摘要翻译：为了增加衍射光栅的激光损伤阈值（LDT），特别是多层介质衍射（MLD）光栅的激光损伤阈值（LDT），本发明提出了一种用于处理具有第一激光器的高能激光装置中的衍射光栅的方法，提供衍射光栅的步骤，提供第二处理激光器并用来自第二处理激光器的激光照射衍射光栅，直到衍射光栅的激光损伤阈值增加。此外，本发明提出了根据该方法处理的衍射光栅以及包括这种衍射光栅的激光系统。

6. 发明申请

US20090028206A1 Method of Increasing the Laser Damage Threshold of Diffraction Gratings 失效
$Method of Increasing the Laser Damage Threshold of Diffraction Gratings$
标题翻译：增加衍射光栅的激光损伤阈值的方法
公开(公告)号：US20090028206A1
公开(公告)日：2009-01-29
申请号：US11883435
申请日：2006-02-16
申请人： Stefan Borneis , Eckcherd Onkels , Dasa Javorkova , Paul Neumayer
发明人： Stefan Borneis , Eckcherd Onkels , Dasa Javorkova , Paul Neumayer
IPC分类号： H01S3/08
CPC分类号： H01S3/0057 , B23K26/0604 , B23K26/0613 , B23K26/067 , G02B1/12 , G02B5/18
摘要： For increasing the laser damage threshold (LDT) of diffraction gratings, particularly of multi-layer dielectric diffraction (MLD) gratings, the invention proposes a method for treating a diffraction grating to be used in a high energy laser apparatus having a first laser with the steps of providing the diffraction grating, providing a second treatment laser and irradiating the diffraction grating with laser light from the second treatment laser until the laser damage threshold of the diffraction grating has increased.Furthermore, the invention proposes a diffraction grating treated according to the method, as well as a laser system, which comprises such a diffraction grating.
摘要翻译：为了增加衍射光栅的激光损伤阈值（LDT），特别是多层介质衍射（MLD）光栅的激光损伤阈值（LDT），本发明提出了一种用于处理具有第一激光器的高能激光装置中的衍射光栅的方法，提供衍射光栅的步骤，提供第二处理激光器并用来自第二处理激光器的激光照射衍射光栅，直到衍射光栅的激光损伤阈值增加。此外，本发明提出了根据该方法处理的衍射光栅以及包括这种衍射光栅的激光系统。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式