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1. 发明申请

US20230100544A1 DIELECTRIC BARRIER PLASMA GENERATOR AND PLASMA DISCHARGE STARTING METHOD FOR DIELECTRIC BARRIER PLASMA GENERATOR 有权
公开(公告)号：US20230100544A1
公开(公告)日：2023-03-30
申请号：US17800881
申请日：2021-01-18
申请人： Ushio Denki Kabushiki Kaisha
发明人： Takahiro Hiraoka , Kensuke Nakamura , Takanori Samejima
IPC分类号： H05H1/24
摘要： A dielectric barrier plasma generator includes: a dielectric substrate, a high-voltage electrode provided on a first surface of the dielectric substrate, a low-voltage electrode provided to face a second surface of the dielectric substrate, a power introduction section provided at a first end of the high-voltage electrode, a gas channel formed from a first end to a second end thereof between the dielectric substrate and the low-voltage electrode to allow gas to flow from the first end of the gas channel to the second end thereof, and a blowout outlet formed at the second end of the gas channel to blow out the gas that has flown through the gas channel and plasma that has been generated in the gas channel. The dielectric substrate includes a portion having a thickness being thinner when being closer to the blowout outlet.

2. 发明授权

US09480136B2 Extreme UV radiation light source device 有权
标题翻译：极紫外辐射光源装置
公开(公告)号：US09480136B2
公开(公告)日：2016-10-25
申请号：US14786057
申请日：2014-04-24
申请人： USHIO DENKI KABUSHIKI KAISHA
发明人： Yusuke Teramoto , Gota Niimi , Takahiro Hiraoka , Pieter Goldhoorn
IPC分类号： H05G2/00
CPC分类号： H05G2/008 , H01S3/1643 , H01S3/2232 , H01S3/23 , H05G2/005 , H05G2/006
摘要： An extreme ultraviolet light source device includes a raw material supplying mechanism. The raw material supplying mechanism includes a disk-shaped rotor, a motor for causing the rotor to rotate, a cover-shaped structure surrounding the rotor via a gap, and a first reservoir provided inside the cover-shaped structure for reserving a liquid high temperature plasma raw material. When the rotor rotates, a portion of the surface on the rotor becomes coated with the liquid high temperature plasma raw material. A portion of the cover-shaped structure has an aperture exposing that surface of the rotor which coated with the high temperature plasma raw material. The high temperature plasma raw material is irradiated with an energy beam from an energy beam supply device through the aperture, and generates EUV radiation.
摘要翻译：极紫外光源装置包括原料供给机构。原料供给机构包括盘状转子，使转子旋转的电动机，经由间隙围绕转子的盖状结构，以及设置在盖状结构内部的第一储存器，用于保持液体高温等离子体原料。当转子旋转时，转子表面的一部分被液体高温等离子体原料涂覆。盖形结构的一部分具有暴露转子的表面的孔，该表面涂覆有高温等离子体原料。高能等离子体原料通过孔径从能量束供给装置照射能量束，并产生EUV辐射。

3. 发明授权

US09686846B2 Extreme UV radiation light source device 有权
公开(公告)号：US09686846B2
公开(公告)日：2017-06-20
申请号：US15227082
申请日：2016-08-03
申请人： USHIO DENKI KABUSHIKI KAISHA
发明人： Yusuke Teramoto , Gota Niimi , Takahiro Hiraoka , Pieter Goldhoorn
IPC分类号： H05G2/00 , H01S3/16 , H01S3/223 , H01S3/23
CPC分类号： H05G2/008 , H01S3/1643 , H01S3/2232 , H01S3/23 , H05G2/005 , H05G2/006
摘要： An extreme ultraviolet light source device includes a raw material supplying mechanism. The raw material supplying mechanism includes a disk-shaped rotor, a motor for causing the rotor to rotate, a cover-shaped structure surrounding the rotor via a gap, and a first reservoir provided inside the cover-shaped structure for reserving a liquid high temperature plasma raw material. When the rotor rotates, a portion of the surface on the rotor becomes coated with the liquid high temperature plasma raw material. A portion of the cover-shaped structure has an aperture exposing that surface of the rotor which coated with the high temperature plasma raw material. The high temperature plasma raw material is irradiated with an energy beam from an energy beam supply device through the aperture, and generates EUV radiation.

4. 发明公开

US20230158452A1 GAS TREATMENT METHOD AND GAS TREATMENT DEVICE 审中-公开
公开(公告)号：US20230158452A1
公开(公告)日：2023-05-25
申请号：US17919206
申请日：2021-06-15
申请人： Ushio Denki Kabushiki Kaisha
发明人： Yuichi Otsuka , Takahiro Hiraoka , Masaki Miura , Kensuke Nakamura
IPC分类号： B01D53/76 , B01D53/00 , B01D53/72 , B01J19/12 , C01B13/10
CPC分类号： B01D53/76 , B01D53/005 , B01D53/72 , B01J19/123 , C01B13/10 , B01J2219/1203 , B01J2219/0875
摘要： A gas treatment method includes: a process (a) of allowing gas to be treated in which a target substance to be treated is mixed with air to pass through inside a housing, the target substance to be treated exhibiting volatility at room temperature and belonging to at least one substance selected from a group consisting of carbon compounds, nitrogen compounds, and sulfur compounds; a process (b) of introducing ozone into a space through which the gas to be treated flows inside the housing at 200° C. or lower; a process (c) of stirring the gas to be treated after the process (b); and a process (d) of heating the gas to be treated to 300° C. or higher after executing the process (c).

5. 发明授权

US09253865B2 Method of calibrating a DPP-generated EUV light source 有权
标题翻译：校准DPP生成的EUV光源的方法
公开(公告)号：US09253865B2
公开(公告)日：2016-02-02
申请号：US14108727
申请日：2013-12-17
申请人： USHIO Denki Kabushiki Kaisha
发明人： Sven Walter Probst , Mohamad Hussein El-Husseini , Takahiro Hiraoka
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70041 , G03F7/70558
摘要： A method for controlling a discharge plasma-based radiation source for stabilizing a radiation dose emitted in a pulsed manner is disclosed. A calibration function is determined from a relationship between values of an input quantity and values of an operating parameter of the source by applying different values of the input quantity to the source. Reference value selected from the values of the operating parameter is brought about during a pulse of the source. The value of a test quantity is acquired at each pulse. Any quantity influencing the emitted radiation dose can be selected as test quantity. A statistical value is formed from a defined quantity of values of the test quantity. A deviation between the statistical value and the reference value is determined. A result of a comparison of the deviation with a predefined tolerance range determines whether the method is repeated.
摘要翻译：公开了一种用于控制用于稳定以脉冲方式发射的辐射剂量的基于放电等离子体的辐射源的方法。通过将输入量的不同值应用于源，根据输入量的值和源的操作参数的值之间的关系确定校准函数。在源的脉冲期间产生从操作参数的值中选择的参考值。在每个脉冲下获得测试量的值。任何影响发射辐射剂量的数量都可以选择作为试验量。从定量的测试数量的值形成统计值。确定统计值与参考值之间的偏差。将偏差与预定义的公差范围进行比较的结果确定该方法是否重复。

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