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    • 6. 发明申请
    • ISOTHERMAL WARM WALL CVD REACTOR
    • 同温度瓦斯CVD反应堆
    • US20160230279A1
    • 2016-08-11
    • US14619338
    • 2015-02-11
    • United Technologies Corporation
    • Kirk C. Newton
    • C23C16/46C23C16/32C23C16/44C23C16/40C23C16/06C23C16/26C23C16/34
    • C23C16/46C23C16/045C23C16/06C23C16/26C23C16/32C23C16/325C23C16/342C23C16/345C23C16/403C23C16/4401C23C16/4412
    • A chemical vapor deposition (CVD) reactor includes a double wall vacuum processing chamber with an inner wall and an outer wall and fluid passages between the walls. A layer of thermal insulation covers the outer wall. A layer of high temperature thermal insulation covers the inner wall. Heating elements are positioned in the interior of the processing chamber to heat a substrate mounted in the chamber. A gas inlet structure is positioned through the inner and outer walls of the chamber and oriented to direct a flow of reactant gas against the substrate to form a CVD coating on the substrate. A gas outlet structure connected to a vacuum and effluent management system is positioned through the inner and outer walls of the chamber. Fluid inlet and outlet structures positioned to circulate heated thermal transfer fluid through the passages between the inner and outer walls maintain a controlled isothermal inner wall temperature above a condensation temperature of reactant gas and effluent reacted gas byproducts from condensing on the inner walls and insulation in the chamber.
    • 化学气相沉积(CVD)反应器包括双壁真空处理室,其具有内壁和外壁以及壁之间的流体通道。 一层隔热层覆盖外墙。 一层高温绝热覆盖内壁。 加热元件位于处理室的内部以加热安装在腔室中的基底。 气体入口结构通过室的内壁和外壁定位,并被定向成将反应气体流引向衬底以在衬底上形成CVD涂层。 连接到真空和流出物管理系统的气体出口结构通过腔室的内壁和外壁定位。 定位成使加热的热传递流体通过内壁和外壁之间的通道循环的流体入口和出口结构保持高于反应物气体的冷凝温度和流出物反应的气体副产物在内壁上凝结的受控等温内壁温度,并且在 房间。