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1. 发明授权

US4900448A Membrane dehumidification 失效
标题翻译：膜除湿
公开(公告)号：US4900448A
公开(公告)日：1990-02-13
申请号：US289467
申请日：1988-12-21
申请人： Ulrich Bonne , David W. Deetz , Juey H. Lai , David J. Odde , J. David Zook
发明人： Ulrich Bonne , David W. Deetz , Juey H. Lai , David J. Odde , J. David Zook
IPC分类号： B01D53/26 , B01D61/38 , F24F3/14
CPC分类号： F24F3/1417 , B01D53/268 , B01D61/38 , F24F2003/1435 , F24F2003/144
摘要： The instant invention provides a method and system for dehumidifying air by microphorous organic hollow fibers having a hygroscopic liquid disposed in the pores thereof for providing a concentration gradient sufficient to provide a continuous water removal mechanism.
摘要翻译：本发明提供了一种通过微孔有机中空纤维对空气进行除湿的方法和系统，其具有设置在其孔中的吸湿性液体，以提供足以提供连续除水机构的浓度梯度。

2. 发明授权

US4915838A Membrane dehumidification 失效
标题翻译：膜除湿
公开(公告)号：US4915838A
公开(公告)日：1990-04-10
申请号：US289466
申请日：1988-12-21
申请人： Ulrich Bonne , David W. Deetz , Juey H. Lai , David J. Odde , J. David Zook
发明人： Ulrich Bonne , David W. Deetz , Juey H. Lai , David J. Odde , J. David Zook
IPC分类号： B01D53/26 , B01D61/38 , F24F3/14
CPC分类号： F24F3/1417 , B01D53/268 , B01D61/38 , F24F2003/1435 , F24F2003/144
摘要： Organic vapor species ranging from polar to non-polar are removed from the ambient atmosphere by means of a thin microporous membrane medium in conjunction with a non-volatile collecting fluid having an affinity for the species of interest. The collecting fluid may be regenerated if desired.
摘要翻译：通过薄的微孔膜介质与对感兴趣的物种具有亲和力的非挥发性收集流体结合，从环境气氛中除去极性至非极性的有机蒸气物质。如果需要，收集液可以再生。

3. 发明授权

US4414313A Sensitive positive electron beam resists 失效
标题翻译：敏感正电子束抵抗
公开(公告)号：US4414313A
公开(公告)日：1983-11-08
申请号：US363334
申请日：1982-03-29
申请人： Juey H. Lai
发明人： Juey H. Lai
IPC分类号： G03F7/039 , B05D3/06
CPC分类号： G03F7/039
摘要： A process for making highly sensitive positive electron beam resists comprised of copolymers of methacrylic acid (MAA) and methyl .alpha.-chloroacrylate (MCA) is disclosed in which a thin film of high molecular weight MAA/MCA copolymer is applied to a suitable substrate. Prior to exposure, the copolymer is prebaked at a temperature below the decomposition temperature to improve the sensitivity and resolution of the resist. The exposed resist is developed by spraying with a suitable solvent. The positive electron resists produced in accordance with the present invention exhibit a high sensitivity and good submicron resolution.
摘要翻译：公开了一种制备由甲基丙烯酸（MAA）和α-氯丙烯酸甲酯（MCA）的共聚物构成的高敏感性正电子束抗蚀剂的方法，其中将高分子量MAA / MCA共聚物的薄膜施加到合适的基材上。在曝光之前，共聚物在低于分解温度的温度下预烘烤，以提高抗蚀剂的灵敏度和分辨率。曝光的抗蚀剂通过用合适的溶剂喷涂而显影。根据本发明生产的正电子抗蚀剂表现出高灵敏度和良好的亚微米分辨率。

4. 发明授权

US4302529A Process for developing a positive electron resist 失效
标题翻译：开发正电子抗蚀剂的方法
公开(公告)号：US4302529A
公开(公告)日：1981-11-24
申请号：US110295
申请日：1980-01-08
申请人： Juey H. Lai
发明人： Juey H. Lai
IPC分类号： G03F7/32 , G03C5/24
CPC分类号： G03F7/325
摘要： A method of developing a positive electron resist for delineating a desired integrated circuit pattern upon a circuit substrate is disclosed for a positive resist consisting of a copolymer film of poly (methyl alpha-chloroacrylate-co-methacrylonitrile) utilizing a developer selected from the group consisting of benzonitrile, a mixture of benzonitrile and methyl cellosolve, and a mixture of benzonitrile and methyl ethyl ketone.
摘要翻译：公开了一种用于在电路基板上划定所需集成电路图案的正电子抗蚀剂的方法，该正性抗蚀剂由聚（甲基α-氯代丙烯酸酯 - 共 - 甲基丙烯腈）共聚物膜组成，该共聚物膜使用选自以下的显影剂：的苄腈，苄腈和甲基溶纤剂的混合物，以及苄腈和甲基乙基酮的混合物。

5. 发明授权

US5268396A Organosilicon soft denture liners 失效
标题翻译：有机硅软义齿衬垫
公开(公告)号：US5268396A
公开(公告)日：1993-12-07
申请号：US911555
申请日：1992-07-07
申请人： Juey H. Lai
发明人： Juey H. Lai
IPC分类号： A61K6/093 , C08F2/46 , C08F30/08 , C09D183/06 , C08J3/28
CPC分类号： C09D183/06 , C08F30/08 , Y10S522/908
摘要： Improved permanent soft denture liners are disclosed which consist substantially of an amount of one or more polysiloxanes selected from acryloxyalkyl and methacryloxyalkyl-terminated polydialkylsiloxanes in which the polysiloxane is crosslinked by a material selected from suitable heat, light or chemically activated initiators with or without crosslinking agents. The preferred embodiments are visible light activated and can be applied, fitted, cured and installed in one sitting.
摘要翻译：公开了改进的永久性软义齿衬里，其基本上由一种或多种选自丙烯酰氧基烷基和甲基丙烯酰氧基烷基封端的聚二烷基硅氧烷的聚硅氧烷组成，其中聚硅氧烷通过选自具有或不具有交联剂的合适的热，光或化学活化的引发剂的材料交联。优选的实施方案是活化的可见光，并且可以一次使用，安装，固化和安装。

6. 发明授权

US4415653A Method of making sensitive positive electron beam resists 失效
标题翻译：制造敏感正电子束抗蚀剂的方法
公开(公告)号：US4415653A
公开(公告)日：1983-11-15
申请号：US447579
申请日：1982-12-07
申请人： Juey H. Lai , Richard Douglas , Lloyd Shepherd
发明人： Juey H. Lai , Richard Douglas , Lloyd Shepherd
IPC分类号： G03F7/039 , G03F7/16 , G03C5/00
CPC分类号： G03F7/039 , G03F7/168 , Y10S430/111
摘要： The method of making highly sensitive positive electron beam resists comprised of copolymers of methacrylic acid (MAA) and methacrylonitrile (MCN) is disclosed utilizing a prebaking step in which the copolymer resist in film form on the substrate is prebaked at a temperature below the decomposition temperature to improve the sensitivity of the resist. The positive electron resists produced in accordance with the present invention exhibit a high sensitivity, and high plasma etch resistance which makes them desirable for dry etching techniques in addition to other masking techniques which enable submicron resolution.
摘要翻译：公开了一种由甲基丙烯酸（MAA）和甲基丙烯腈（MCN）的共聚物构成的高灵敏度的正电子束抗蚀剂的方法，其中使用预烘烤步骤，其中在基板上的膜形式的共聚物抗蚀剂在低于分解温度的温度下预烘烤以提高抗蚀剂的灵敏度。根据本发明生产的正电子抗蚀剂除了能够实现亚微米分辨率的其它掩蔽技术之外，表现出高灵敏度和高耐等离子体耐蚀刻性，这使得它们对于干蚀刻技术是理想的。

7. 发明授权

US5081164A Organosilicon dental composite restorative materials 失效
标题翻译：有机硅牙科复合材料
公开(公告)号：US5081164A
公开(公告)日：1992-01-14
申请号：US626622
申请日：1990-12-07
申请人： Juey H. Lai
发明人： Juey H. Lai
IPC分类号： A61K6/093 , C08F290/06
CPC分类号： A61K6/083 , C08F290/068 , Y10S522/908
摘要： A restorative dental composite material consists essentially of an organosilicon monomer selected from a class of siloxane materials which are cross-linkable utilizing visible light sensitive photoinitiators, an amount of filler material, a coupling agent and an amount of activator. An amount of ethylenically unsaturated monomer, an amount of thermally pre-polymerized particle material and/or a pigment material can be added to the composite if indicated. The materials exhibit greatly improved properties including a high degree of conversion, minimum water sorption and good color stability.
摘要翻译：修复性牙科复合材料基本上由选自使用可见光敏感光引发剂可交联的一类硅氧烷材料，一定量的填充材料，偶联剂和一定量的活化剂的有机硅单体组成。如果指出，可以将一定量的烯键式不饱和单体，一定量的热预聚合的颗粒材料和/或颜料材料加入复合材料中。该材料具有极高的性能，包括高转化率，最小吸水率和良好的颜色稳定性。

8. 发明授权

US5584886A Maxillofacial prosthetic materials 失效
标题翻译：颌面假肢材料
公开(公告)号：US5584886A
公开(公告)日：1996-12-17
申请号：US420205
申请日：1995-04-11
申请人： Juey H. Lai
发明人： Juey H. Lai
IPC分类号： A61L27/18 , A61F2/02
CPC分类号： A61L27/18
摘要： A maxillofacial prosthetic material is disclosed with a composition based on the methacrylic siloxane resin methacryloxypropyl-terminated polydimethylsiloxane (MPDS) in combination with an amount of filler material, an amount of thermally activated initiator and an amount of crosslinking agent together with an amount of coloring pigment and UV stabilizer added to and dispersed in the polymer prior to cure.
摘要翻译：公开了一种基于甲基硅氧烷树脂甲基丙烯酰氧基丙基封端的聚二甲基硅氧烷（MPDS）的组合物与一定量的填充材料，一定量的热活化引发剂和一定量的交联剂以及一定量着色颜料的组合物的颌面修复材料和UV固化剂加入并分散在聚合物中。

9. 发明授权

US4476217A Sensitive positive electron beam resists 失效
标题翻译：敏感正电子束抵抗
公开(公告)号：US4476217A
公开(公告)日：1984-10-09
申请号：US578987
申请日：1984-02-13
申请人： Richard B. Douglas , Barbara J. Fure , Juey H. Lai
发明人： Richard B. Douglas , Barbara J. Fure , Juey H. Lai
IPC分类号： B05D3/10 , G03F7/039 , B05D3/02 , G03C5/16 , G03C5/24
CPC分类号： B05D3/10 , G03F7/039
摘要： Highly sensitive positive electron beam resists comprised of copolymers of methacrylic acid (MAA) and t-butyl methacrylate (TBM) are disclosed in which a thin film of high molecular weight MAA/TBM copolymer is applied to a suitable substrate. Prior to exposure, the copolymer is prebaked at a temperature below the decomposition temperature to improve the sensitivity and resolution of the resist. The exposed resist is developed by spraying with a suitable solvent. The positive electron resists produced in accordance with the present invention exhibit a high sensitivity and good submicron resolution.
摘要翻译：公开了由甲基丙烯酸（MAA）和甲基丙烯酸叔丁酯（TBM）的共聚物组成的高度敏感的正电子束抗蚀剂，其中将高分子量MAA / TBM共聚物的薄膜施加到合适的基材上。在曝光之前，共聚物在低于分解温度的温度下预烘烤，以提高抗蚀剂的灵敏度和分辨率。曝光的抗蚀剂通过用合适的溶剂喷涂而显影。根据本发明生产的正电子抗蚀剂表现出高灵敏度和良好的亚微米分辨率。

10. 发明授权

US4386152A Plasma developable electron resist process 失效
标题翻译：等离子显影电子抗蚀剂工艺
公开(公告)号：US4386152A
公开(公告)日：1983-05-31
申请号：US275553
申请日：1981-06-19
申请人： Juey H. Lai
发明人： Juey H. Lai
IPC分类号： G03F7/36 , C08F2/00 , C08F291/00 , G03F7/033 , G03F7/038 , G03F7/095 , G03F7/11 , G03F7/26 , G03F7/38 , H01L21/027 , G03C5/24
CPC分类号： G03F7/033 , G03F7/0955 , G03F7/38
摘要： A method of fabricating a negative electron resist pattern for microcircuit is disclosed which combines electron beam resist exposure with dry plasma etch developing. The technique utilizes a coating of a barrier polymer over the negative electron resist film prior to exposure to the electron beam film to prevent vacuum sublimation of the constituents of the negative electron resist film.
摘要翻译：公开了一种制造用于微电路的负电子抗蚀剂图案的方法，其结合电子束抗蚀剂暴露与干等离子体蚀刻显影。该技术在暴露于电子束膜之前在负电子抗蚀剂膜上使用阻挡聚合物的涂层以防止负电子抗蚀剂膜的组分的真空升华。

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