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    • 1. 发明授权
    • Semiconductor laser device
    • 半导体激光器件
    • US6118799A
    • 2000-09-12
    • US817602
    • 1997-06-10
    • Atsushi OkuboYoshikazu YamadaTsuyoshi FujimotoSatoru OkadaYumi NaitoKiyofumi Muro
    • Atsushi OkuboYoshikazu YamadaTsuyoshi FujimotoSatoru OkadaYumi NaitoKiyofumi Muro
    • H01S5/20H01S5/22H01S5/223H01S5/343H01S3/085
    • B82Y20/00H01S5/2231H01S5/2238H01S5/204H01S5/222H01S5/3432
    • A semiconductor device including a buffer layer 32 on n-GaAs, a clad layer 31, a wave guide layer 30 and a carrier block layer 29 of n-AlGaAs, a side barrier layer 28 of non-doped AlGaAs, an active layer 27 which is formed by two non-doped GaAs quantum well layers and a barrier layer of AlGaAs, a side barrier layer 26 of non-doped AlGaAs, a carrier block layer 25, a wave guide layer 23 and a clad layer 22 of p-AlGaAs, and a cap layer 21 of p-GaAs are grown in this order. Inside the wave guide layer 23, current blocking layers 24 having a lower refractive index and higher Al-composition than that of the wave guide layer and sandwich a strip-shaped active region 34. This creates a refractive index difference between the active region 34 and buried regions 33 in which each of the current blocking layers 24 exists, thereby forming a refractive index guide structure. Thus, it is possible to obtain a high-output semiconductor laser device of the refractive index guided type which is easy to manufacture.
    • PCT No.PCT / JP95 / 02118 Sec。 371日期:1997年6月10日 102(e)日期1997年6月10日PCT提交1995年10月16日PCT公布。 WO96 / 12328 PCT出版物 日期:1996年04月25日包括n-GaAs上的缓冲层32,n-AlGaAs的覆盖层31,波导层30和载流子层29的半导体器件,非掺杂AlGaAs的侧面阻挡层28, 由两个非掺杂GaAs量子阱层和AlGaAs的势垒层,非掺杂AlGaAs的侧阻层26,载流子阻挡层25,波导层23和覆盖层22形成的有源层27 的p-AlGaAs,并且p-GaAs的覆盖层21依次生长。 在波导层23内,电流阻挡层24具有比波导层低的折射率和更高的Al组分,并且夹持条形有源区域34.这在活性区域34和 其中存在每个电流阻挡层24的埋入区域33,从而形成折射率引导结构。 因此,可以获得易于制造的折射率导向型的高输出半导体激光器件。
    • 3. 发明授权
    • Method of fabricating semiconductor laser using selective growth
    • 使用选择性增长制造半导体激光器的方法
    • US06171878B2
    • 2001-01-09
    • US09157246
    • 1998-09-18
    • Tsuyoshi FujimotoYumi NaitoAtsushi OkuboYoshikazu Yamada
    • Tsuyoshi FujimotoYumi NaitoAtsushi OkuboYoshikazu Yamada
    • H01S302
    • H01S5/2231B82Y20/00H01S5/2077H01S5/2206H01S5/34313H01S5/3432H01S2304/00
    • In a self-aligned structure semiconductor laser in which a pair of optical guide layers are respectively formed on both faces of an active layer, the optical guide layers having a bandgap which is wider than that of the active layer, a pair of cladding layers are formed so as to sandwich the active layer and the optical guide layers, the cladding layers having a bandgap which is wider than bandgap of the optical guide layers, a pair of carrier blocking layers are respectively formed between the active layer and the optical guide layers, the carrier blocking layers having a bandgap which is wider than bandgaps of the active layer and the optical guide layers, and a current blocking layer having a stripe-like window is embedded in at least one of the optical guide layers, the current blocking layer is formed by selective growth. In this way, a window of a current blocking layer can be accurately formed and the fabrication yield can be improved while avoiding maleffects on other layers.
    • 在其中在有源层的两个表面上分别形成一对导光层的自对准结构半导体激光器中,具有比有源层宽的带隙的导光层,一对包覆层是 形成为夹持有源层和导光层,包层具有比导光层的带隙宽的带隙,在有源层和导光层之间分别形成一对载流子阻挡层, 具有比有源层和导光层的带隙宽的带隙的载流子阻挡层和具有条状窗口的电流阻挡层嵌入到至少一个导光层中,电流阻挡层是 通过选择性生长形成。以这种方式,可以精确地形成电流阻挡层的窗口,并且可以提高制造产率,同时避免对其他层的不良影响。