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    • 4. 发明授权
    • Electrolytic etching method and apparatus
    • 电解蚀刻方法和装置
    • US07691241B2
    • 2010-04-06
    • US10998617
    • 2004-11-30
    • Tsutomu MurakamiKoji Tsuzuki
    • Tsutomu MurakamiKoji Tsuzuki
    • C25F3/14C25F7/00
    • B23H3/00B23H3/04C25F3/14C25F7/00H01L31/18
    • The present invention relates to a method and apparatus for partial etching or pattern etching using an electrolysis reaction, wherein, conventionally, there was the problem that an etching line could not be finely formed on a cell edge because of apparatus problems concerning alignment accuracy. The present invention provides a method and apparatus with which fine line etching is possible and which can form a line on a cell edge.Provided is a an electrolytic etching method of a substrate which is formed having a subject etching layer on a surface, having the steps of providing a fixed gap from a substrate end surface which is external to an end surface of the substrate for placing a working part of a working electrode and passing current between the substrate and the working electrode.
    • 本发明涉及一种使用电解反应进行局部蚀刻或图案蚀刻的方法和装置,其中传统上存在由于关于对准精度的装置问题而在细胞边缘上不能精细地形成蚀刻线的问题。 本发明提供了可以进行细线蚀刻并且可以在单元边缘上形成线的方法和装置。 本发明提供一种基板的电解蚀刻方法,该方法形成在表面上具有被摄体蚀刻层,具有从基板端面提供固定间隙的步骤,该基板端面位于基板的端面外部,用于放置工作部分 的工作电极,并在基板和工作电极之间通过电流。
    • 6. 发明授权
    • Fuel supply control method and apparatus of internal combustion engine
    • 燃油供应控制方法和内燃机装置
    • US07287514B2
    • 2007-10-30
    • US11305194
    • 2005-12-19
    • Masao KakinumaTsutomu Murakami
    • Masao KakinumaTsutomu Murakami
    • F02M51/00F02D41/10F02M69/28
    • F02D41/107
    • The invention provides a fuel supply control method and apparatus in which an air fuel ratio does not become rich even if an acceleration and deceleration operation is repeated for a short time in the case that a time lag with respect to a response from a detection of an acceleration state to a fuel amount increase is large, and troubles such as a black smoke generation from an exhaust pipe, an engine stop and the like are not generated. In a fuel supply control method of an internal combustion chamber for increasing an amount of a fuel for acceleration so as to inject from an injection apparatus, at a time of detecting a transient state at an accelerating time or the like on the basis of data such as an opening degree of a throttle valve and/or an air suction pressure, the method inhibits the fuel amount increase for acceleration on the basis of the detection of the transient state, if a total amount of an injection fuel per a unit time is more than a fixed value.
    • 本发明提供一种燃料供给控制方法和装置,其中即使在相对于来自检测到的检测的响应的时间滞后的情况下,即使在短时间内重复加减速操作,空燃比也不变浓 燃料量增加的加速状态大,并且不产生诸如从排气管,发动机停止等产生的黑烟等问题。 在用于增加用于加速的燃料量以便从注射装置注入的内燃机的燃料供应控制方法中,在基于加速时间等检测瞬态的时候, 作为节流阀的开度和/或空气吸入压力,如果每单位时间的喷射燃料的总量多,则该方法基于过渡状态的检测来抑制加速燃料量的增加 比固定值。
    • 8. 发明授权
    • Semiconductor element and method and apparatus for fabricating the same
    • 半导体元件及其制造方法和装置
    • US6132585A
    • 2000-10-17
    • US749727
    • 1996-11-15
    • Takafumi MidorikawaTsutomu MurakamiTakahiro MoriHirofumi Ichinose
    • Takafumi MidorikawaTsutomu MurakamiTakahiro MoriHirofumi Ichinose
    • H01L31/04H01L31/20C25D5/02
    • H01L31/208Y02E10/50Y02P70/521Y10S136/29
    • The present invention aims to provide a highly reliable semiconductor element with high performance, and a fabrication method for such highly reliable semiconductor with excellent mass producibility. The photovoltaic elements comprise an electric conductor, semiconductor regions and a transparent conductor layer, which are sequentially formed on a substrate. The shunt resistance in the semiconductor element is rendered in the range from 1.times.10.sup.3 .OMEGA.cm.sup.2 to 1.times.10.sup.6 .OMEGA.cm.sup.2 by performing a forming treatment and a short circuit passivation treatment after forming the transparent conductor layer, and then selectively covering with insulation the defective portions with a cationic or anionic electrodeposited resin, or performing a forming treatment, after forming the semiconductor layers, then selectively covering with insulation the defective portions with a cationic or anionic electrodeposited resin, and then forming the transparent conductor layer.
    • 本发明旨在提供一种具有高性能的高可靠性半导体元件,以及具有优异的大规模生产能力的这种高可靠性半导体的制造方法。 光电元件包括​​依次形成在基板上的电导体,半导体区域和透明导体层。 通过在形成透明导体层之后进行成形处理和短路钝化处理,半导体元件中的分流电阻在1×10 3欧姆·cm2至1×10 6欧姆·平方厘米的范围内,然后用阳离子选择性地覆盖缺陷部分 或阴离子电沉积树脂,或者在形成半导体层之后进行成形处理,然后用阳离子或阴离子电沉积树脂绝缘地选择性地覆盖缺陷部分,然后形成透明导体层。
    • 10. 发明授权
    • Pin junction photovoltaic device having an i-type a-SiGe semiconductor
layer with a maximal point for the Ge content
    • 具有具有Ge含量最大点的i型a-SiGe半导体层的pin结光电器件
    • US5324364A
    • 1994-06-28
    • US45176
    • 1993-04-13
    • Koichi MatsudaMasafumi SanoTsutomu Murakami
    • Koichi MatsudaMasafumi SanoTsutomu Murakami
    • H01L31/04H01L31/0376H01L31/075
    • H01L31/076H01L31/03765H01L31/065H01L31/075Y02E10/548
    • A pin junction photovoltaic device comprising a substrate and a pin junction semiconductor active layer region disposed on said substrate, said pin junction semiconductor active layer region comprising a p-type semiconductor layer composed of a p-type non-single crystalline semiconductor material, an i-type semiconductor layer composed of an i-type non-single crystalline semiconductor material, and an n-type semiconductor layer composed of an n-type non-single crystalline semiconductor material, characterized in that (a) a buffer layer comprising a non-single crystalline silicon semiconductor material substantially free of germanium atoms is interposed between said p-type semiconductor layer and said i-type semiconductor layer, (b) a buffer layer comprising a non-single crystalline silicon semiconductor material substantially free of germanium atoms is interposed between said i-type semiconductor layer and said n-type semiconductor layer, and said i-type semiconductor layer is formed of an amorphous silicon germanium semiconductor material containing the germanium atoms in an amount of 20 to 70 atomic % in the entire region in which the concentration distribution of the germanium atoms in the thickness direction is varied while providing a maximum concentration point.
    • 一种pin结光电器件,包括衬底和设置在所述衬底上的pin结半导体有源层区域,所述pin结半导体有源层区域包括由p型非单晶半导体材料构成的p型半导体层,i 由n型非单晶半导体材料构成的n型半导体层以及由n型非单晶半导体材料构成的n型半导体层,其特征在于,(a) 基本上不含锗原子的单晶硅半导体材料介于所述p型半导体层和所述i型半导体层之间,(b)包含基本上不含锗原子的非单晶硅半导体材料的缓冲层介于 所述i型半导体层和所述n型半导体层,并且所述i型半导体层形成为o f是在锗原子在厚度方向上的浓度分布同时提供最大浓度点的整个区域中含有锗原子的含量为20至70原子%的非晶硅锗半导体材料。