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1. 发明授权

US4825535A Method of manufacturing a resistor element 失效
标题翻译：制造电阻元件的方法
公开(公告)号：US4825535A
公开(公告)日：1989-05-02
申请号：US153444
申请日：1988-02-08
申请人： Tsunenari Saito , Kazuyuki Ota , Teruyasu Suzuki , Keiji Honda , Takahiko Yamakami
发明人： Tsunenari Saito , Kazuyuki Ota , Teruyasu Suzuki , Keiji Honda , Takahiko Yamakami
IPC分类号： H01J29/48 , H01C7/00 , H01C13/00 , H01C17/00 , H01C17/02 , H01C17/30 , H01J9/14
CPC分类号： H01C7/001 , H01C17/02 , H01C17/30 , Y10T29/49082 , Y10T29/49087 , Y10T29/49099
摘要： A method of manufacturing a resistor element, particularly one for use as an arc suppressing resistor in a cathode ray tube which consists in providing an arc suppressing resistor having a resistor core of predetermined resistance covered with an integral ceramic insulating layer, and baking the resistor in a vacuum atmosphere at a vacuum ranging from 1.times.10.sup.-3 Torr to 1.times.10.sup.-7 Torr, a temperature from 250.degree. to 500.degree. C. and a treatment time or more than 30 minutes.
摘要翻译：一种制造电阻元件的方法，特别是在阴极射线管中用作消弧电阻器的电阻元件的制造方法，其特征在于，提供具有由整体式陶瓷绝缘层覆盖的预定电阻的电阻芯的电弧抑制电阻器，在真空范围为1×10 -3乇至1×10 -7乇，温度为250〜500℃，处理时间或30分钟以上的真空气氛。

2. 发明授权

US08437003B2 Information processing apparatus and method 有权
标题翻译：信息处理装置和方法
公开(公告)号：US08437003B2
公开(公告)日：2013-05-07
申请号：US12812008
申请日：2009-01-28
申请人： Hiroshi Yoshikawa , Yusuke Mitarai , Masafumi Takimoto , Kazuyuki Ota , Kenji Saitoh , Masakazu Matsugu
发明人： Hiroshi Yoshikawa , Yusuke Mitarai , Masafumi Takimoto , Kazuyuki Ota , Kenji Saitoh , Masakazu Matsugu
IPC分类号： G01N21/55
CPC分类号： G01N21/57 , G01N21/4738 , G01N2021/4735
摘要： An information processing apparatus includes an obtaining unit configured to obtain first information regarding a distribution of reflected light from a target to be measured and second information regarding geometrical-optics components of the reflected light, a calculating unit configured to calculate third information on the basis of the first information and the second information, the third information indicating an approximation of the distribution of reflected light, and an output unit configured to output information regarding wave-optics components of the reflected light on the basis of the third information.
摘要翻译：一种信息处理设备，包括：获取单元，被配置为获得关于来自待测目标的反射光的分布的第一信息和关于反射光的几何光学分量的第二信息;计算单元，被配置为基于所述第一信息和所述第二信息，所述第三信息指示反射光的分布的近似值;以及输出单元，被配置为基于所述第三信息输出关于所述反射光的波长成分的信息。

3. 发明申请

US20110037984A1 INFORMATION PROCESSING APPARATUS AND METHOD 有权
标题翻译：信息处理装置和方法
公开(公告)号：US20110037984A1
公开(公告)日：2011-02-17
申请号：US12812008
申请日：2009-01-28
申请人： Hiroshi Yoshikawa , Yusuke Mitarai , Masafumi Takimoto , Kazuyuki Ota , Kenji Saitoh , Masakazu Matsugu
发明人： Hiroshi Yoshikawa , Yusuke Mitarai , Masafumi Takimoto , Kazuyuki Ota , Kenji Saitoh , Masakazu Matsugu
IPC分类号： G01N21/55
CPC分类号： G01N21/57 , G01N21/4738 , G01N2021/4735
摘要： An information processing apparatus includes an obtaining unit configured to obtain first information regarding a distribution of reflected light from a target to be measured and second information regarding geometrical-optics components of the reflected light, a calculating unit configured to calculate third information on the basis of the first information and the second information, the third information indicating an approximation of the distribution of reflected light, and an output unit configured to output information regarding wave-optics components of the reflected light on the basis of the third information.
摘要翻译：一种信息处理设备，包括：获取单元，被配置为获得关于来自待测目标的反射光的分布的第一信息和关于反射光的几何光学分量的第二信息;计算单元，被配置为基于所述第一信息和所述第二信息，所述第三信息指示反射光的分布的近似值;以及输出单元，被配置为基于所述第三信息输出关于所述反射光的波长成分的信息。

4. 发明授权

US5990610A Manufacturing method and apparatus for insulating member 失效
标题翻译：绝缘件的制造方法和装置
公开(公告)号：US5990610A
公开(公告)日：1999-11-23
申请号：US305283
申请日：1994-09-12
申请人： Shigeo Matsumoto , Takashi Setsuda , Haruo Ito , Kazuyuki Ota
发明人： Shigeo Matsumoto , Takashi Setsuda , Haruo Ito , Kazuyuki Ota
IPC分类号： H01J9/30 , H01B3/46 , H01J9/34 , H01J29/90 , H01J29/92 , H01R33/76 , H01J29/82
CPC分类号： H01R33/7678 , H01J29/92
摘要： This invention secures the breakdown voltage between stem pins or the like for high voltage service in a cathode ray tube. This insulator is formed of a clay-like silicone compound having a tip-throughhole and pin-throughholes or a stem base with the electric insulator mounted to the stem base. An inter-stem electric insulation device is structured by mounting either one of the electric insulator or the stem base with the electric insulator to the stem of a cathode ray tube and by pressing to fix together. This structure does not allow bubble generation caused by the electric insulator, and makes the handling easy, and furthermore, allows an automatic mounting of the electric insulator to a stem.
摘要翻译：本发明可确保阴极射线管中的高压电力线路管脚之间的击穿电压等。该绝缘体由具有尖端通孔和针穿孔的粘土状硅氧烷化合物或具有安装到茎基部的电绝缘体的茎基构成。通过将电绝缘体中的任一个或茎基与电绝缘体一起安装到阴极射线管的杆上并通过按压固定在一起来构成茎间电绝缘装置。这种结构不允许由电绝缘体引起的气泡产生，并且使操作变得容易，此外，允许将电绝缘体自动安装到杆上。

5. 发明授权

US08497995B2 Measurement apparatus and method for measuring surface shape and roughness 有权
标题翻译：用于测量表面形状和粗糙度的测量装置和方法
公开(公告)号：US08497995B2
公开(公告)日：2013-07-30
申请号：US12669825
申请日：2008-08-14
申请人： Kazuyuki Ota , Hiroshi Yoshikawa , Yusuke Mitarai , Masafumi Takimoto , Kazunori Okudomi , Hiroyuki Shinbata , Kenji Saitoh , Masakazu Matsugu
发明人： Kazuyuki Ota , Hiroshi Yoshikawa , Yusuke Mitarai , Masafumi Takimoto , Kazunori Okudomi , Hiroyuki Shinbata , Kenji Saitoh , Masakazu Matsugu
IPC分类号： G01B11/24
CPC分类号： G01B11/24 , G01B11/30
摘要： A measurement apparatus includes an illumination light setting unit which sets illumination light having an optical characteristic corresponding to a microstructure which is formed on the surface of a measurement target and is to be measured, and a measurement unit which measures reflected light when the measurement target is irradiated with the illumination light. In addition, an extraction unit extracts, from the measured reflected light, information about the surface shape of the measurement target and the microstructure formed on the surface.
摘要翻译：测量装置包括照明光设定单元，其设置具有对应于形成在测量对象物的表面上并要被测量的微结构的光学特性的照明光，以及测量单元，其在测量对象为用照明光照射。此外，提取单元从测量的反射光中提取关于测量目标的表面形状和形成在表面上的微结构的信息。

6. 发明授权

US08456621B2 Measurement system and measurement processing method 有权
标题翻译：测量系统和测量处理方法
公开(公告)号：US08456621B2
公开(公告)日：2013-06-04
申请号：US13595013
申请日：2012-08-27
申请人： Kazuyuki Ota , Masakazu Matsugu , Kenji Saitoh
发明人： Kazuyuki Ota , Masakazu Matsugu , Kenji Saitoh
IPC分类号： G01N21/00
CPC分类号： G01B11/25
摘要： This invention is directed to extract the scattering characteristic of a measurement target together when measuring the surface shape in a measurement system, which measures the surface shape of a measurement target, by the pattern projection method. To accomplish this, the measurement system includes an illumination unit which irradiates a measurement target with dot pattern light, a reflected light measurement unit which receives the reflected light at a reflection angle almost equal to a incident angle, and a reflected light extraction unit which extracts the inclination of the surface of the measurement target, based on the shift amount between the light receiving position of the received reflected light and a predetermined reference position, and extracts the luminance value of the reflected light and the dot diameter of the dot pattern light as information about the scattering characteristic.
摘要翻译：本发明旨在通过图案投影法在测量测量对象的表面形状的测量系统中测量表面形状时，将测量对象的散射特性一起提取。为了实现这一点，测量系统包括用点阵图形光照射测量对象的照明单元，以几乎等于入射角的反射角接收反射光的反射光测量单元和提取出的反射光提取单元基于接收到的反射光的光接收位置与预定的基准位置之间的偏移量，测量对象的表面的倾斜度，并将点阵图案光的反射光的亮度值和点直径提取为关于散射特性的信息。

7. 发明授权

US08274646B2 Measurement system and measurement processing method 有权
标题翻译：测量系统和测量处理方法
公开(公告)号：US08274646B2
公开(公告)日：2012-09-25
申请号：US12816069
申请日：2010-06-15
申请人： Kazuyuki Ota , Masakazu Matsugu , Kenji Saitoh
发明人： Kazuyuki Ota , Masakazu Matsugu , Kenji Saitoh
IPC分类号： G01N21/00
CPC分类号： G01B11/25
摘要： This invention is directed to extract the scattering characteristic of a measurement target together when measuring the surface shape in a measurement system, which measures the surface shape of a measurement target, by the pattern projection method. To accomplish this, the measurement system includes an illumination unit which irradiates a measurement target with dot pattern light, a reflected light measurement unit which receives the reflected light at a reflection angle almost equal to a incident angle, and a reflected light extraction unit which extracts the inclination of the surface of the measurement target, based on the shift amount between the light receiving position of the received reflected light and a predetermined reference position, and extracts the luminance value of the reflected light and the dot diameter of the dot pattern light as information about the scattering characteristic.
摘要翻译：本发明旨在通过图案投影法在测量测量对象的表面形状的测量系统中测量表面形状时，将测量对象的散射特性一起提取。为了实现这一点，测量系统包括用点阵图形光照射测量对象的照明单元，以几乎等于入射角的反射角接收反射光的反射光测量单元和提取出的反射光提取单元基于接收到的反射光的光接收位置与预定的基准位置之间的偏移量，测量对象的表面的倾斜度，并将点阵图案光的反射光的亮度值和点直径提取为关于散射特性的信息。

8. 发明授权

US08970674B2 Three-dimensional measurement apparatus, three-dimensional measurement method and storage medium 有权
标题翻译：三维测量装置，三维测量方法和存储介质
公开(公告)号：US08970674B2
公开(公告)日：2015-03-03
申请号：US13325463
申请日：2011-12-14
申请人： Kazuyuki Ota
发明人： Kazuyuki Ota
IPC分类号： H04N13/02 , G01B11/16 , G01B11/25
CPC分类号： H04N13/254 , G01B11/16 , G01B11/25
摘要： A three-dimensional measurement apparatus comprises a light irradiation unit adapted to irradiate a measurement target with pattern light, an image capturing unit adapted to capture an image of the measurement target, and a measurement unit adapted to measure a three-dimensional shape of the measurement target from the captured image, the three-dimensional measurement apparatus further comprising: a change region extraction unit adapted to extract a change region where a change has occurred when comparing an image of the measurement target captured in advance with the captured image of the measurement target; and a light characteristic setting unit adapted to set characteristics of the pattern light from the change region, wherein the measurement unit measures the three-dimensional shape of the measurement target at the change region in a captured image after irradiation of the change region with the pattern light with the characteristics set by the light characteristic setting unit.
摘要翻译：三维测量装置包括适于用图案光照射测量对象的光照射单元，适于捕获测量对象的图像的图像捕获单元和适于测量测量的三维形状的测量单元所述三维测量装置还包括：变化区域提取单元，用于当将预先捕获的测量对象的图像与测量对象的拍摄图像进行比较时，提取发生变化的变化区域 ; 以及光特性设定单元，其适于设定来自所述变化区域的图案光的特性，其中，所述测量单元在所述图案的所述变化区域的照射之后，在拍摄图像中的所述变化区域测量所述测量对象的三维形状具有由光特性设定单元设定的特征的光。

9. 发明申请

US20120327400A1 MEASUREMENT SYSTEM AND MEASUREMENT PROCESSING METHOD 有权
标题翻译：测量系统和测量处理方法
公开(公告)号：US20120327400A1
公开(公告)日：2012-12-27
申请号：US13595013
申请日：2012-08-27
申请人： Kazuyuki Ota , Masakazu Matsugu , Kenji Saitoh
发明人： Kazuyuki Ota , Masakazu Matsugu , Kenji Saitoh
IPC分类号： G01B11/25 , G01N21/47
CPC分类号： G01B11/25
摘要： This invention is directed to extract the scattering characteristic of a measurement target together when measuring the surface shape in a measurement system, which measures the surface shape of a measurement target, by the pattern projection method. To accomplish this, the measurement system includes an illumination unit which irradiates a measurement target with dot pattern light, a reflected light measurement unit which receives the reflected light at a reflection angle almost equal to a incident angle, and a reflected light extraction unit which extracts the inclination of the surface of the measurement target, based on the shift amount between the light receiving position of the received reflected light and a predetermined reference position, and extracts the luminance value of the reflected light and the dot diameter of the dot pattern light as information about the scattering characteristic.
摘要翻译：本发明旨在通过图案投影法在测量测量对象的表面形状的测量系统中测量表面形状时，将测量对象的散射特性一起提取。为了实现这一点，测量系统包括用点阵图形光照射测量对象的照明单元，以几乎等于入射角的反射角接收反射光的反射光测量单元和提取出的反射光提取单元基于接收到的反射光的光接收位置与预定的基准位置之间的偏移量，测量对象的表面的倾斜度，并将点阵图案光的反射光的亮度值和点直径提取为关于散射特性的信息。

10. 发明申请

US20120162371A1 THREE-DIMENSIONAL MEASUREMENT APPARATUS, THREE-DIMENSIONAL MEASUREMENT METHOD AND STORAGE MEDIUM 有权
标题翻译：三维测量装置，三维测量方法和存储介质
公开(公告)号：US20120162371A1
公开(公告)日：2012-06-28
申请号：US13325463
申请日：2011-12-14
申请人： Kazuyuki Ota
发明人： Kazuyuki Ota
IPC分类号： H04N13/02
CPC分类号： H04N13/254 , G01B11/16 , G01B11/25
摘要： A three-dimensional measurement apparatus comprises a light irradiation unit adapted to irradiate a measurement target with pattern light, an image capturing unit adapted to capture an image of the measurement target, and a measurement unit adapted to measure a three-dimensional shape of the measurement target from the captured image, the three-dimensional measurement apparatus further comprising: a change region extraction unit adapted to extract a change region where a change has occurred when comparing an image of the measurement target captured in advance with the captured image of the measurement target; and a light characteristic setting unit adapted to set characteristics of the pattern light from the change region, wherein the measurement unit measures the three-dimensional shape of the measurement target at the change region in a captured image after irradiation of the change region with the pattern light with the characteristics set by the light characteristic setting unit.
摘要翻译：三维测量装置包括适于用图案光照射测量对象的光照射单元，适于捕获测量对象的图像的图像捕获单元和适于测量测量的三维形状的测量单元所述三维测量装置还包括：变化区域提取单元，用于当将预先捕获的测量对象的图像与测量对象的拍摄图像进行比较时，提取发生变化的变化区域 ; 以及光特性设定单元，其适于设定来自所述变化区域的图案光的特性，其中，所述测量单元在所述图案的所述变化区域的照射之后，在拍摄图像中的所述变化区域测量所述测量对象的三维形状具有由光特性设定单元设定的特征的光。

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