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1. 发明申请

US20050189230A1 Method for forming re alloy coating film having high re content through electroplating 失效
标题翻译：通过电镀形成高含量的再合金涂膜的方法
公开(公告)号：US20050189230A1
公开(公告)日：2005-09-01
申请号：US10501813
申请日：2003-01-17
申请人： Toshio Narita , Shigenari Hayashi , Takayuki Yoshioka , Hiroshi Yakuwa , Michiaki Souma , Michihisa Fukumoto
发明人： Toshio Narita , Shigenari Hayashi , Takayuki Yoshioka , Hiroshi Yakuwa , Michiaki Souma , Michihisa Fukumoto
IPC分类号： C25D3/56
CPC分类号： C25D3/56
摘要： Disclosed is a method for forming a high-Re-content alloy film, such as a Re-based film containing Re at 98% or more by atomic composition, or an alloy film containing Re in the range of 65 to less than 98% by atomic composition and at least one of Ni, Fe and Co. The method comprises performing an electroplating process using an electroplating bath containing an aqueous solution which includes a perrhenate ion, at least one ion selected from the group consisting of Ni, Fe, Co and Cr ions, and at least one of a Li ion and a Na ion. The present invention allows a high-Re-content alloy film usable as a corrosion-resistant alloy coating for a high-temperature component or the like to be formed through an electroplating process using an aqueous solution, so as to provide heat/corrosion resistances to the component, even if it has a complicated shape, in a simplified manner at a low cost.
摘要翻译：公开了一种用于形成高Re含量合金膜的方法，例如含有Re为98％以上的Re为原子组成的Re基膜，或者含有Re为65〜98％以下的合金膜的方法为原子组成和Ni，Fe和Co中的至少一种。该方法包括使用含有水溶液的电镀浴进行电镀工艺，该水溶液包括高铼酸根离子，至少一种选自Ni，Fe，Co和 Cr离子和Li离子和Na离子中的至少一种。本发明允许通过使用水溶液的电镀工艺形成可用作高温组分等的耐腐蚀合金涂层的高Re含量合金膜，以提供耐热腐蚀性该组件即使具有复杂的形状，也以简单的方式以低成本。

2. 发明授权

US07368048B2 Method for forming Re alloy coating film having high-Re-content through electroplating 失效
标题翻译：通过电镀形成具有高Re含量的Re合金涂膜的方法
公开(公告)号：US07368048B2
公开(公告)日：2008-05-06
申请号：US10501813
申请日：2003-01-17
申请人： Toshio Narita , Shigenari Hayashi , Takayuki Yoshioka , Hiroshi Yakuwa , Michiaki Souma , Michihisa Fukumoto
发明人： Toshio Narita , Shigenari Hayashi , Takayuki Yoshioka , Hiroshi Yakuwa , Michiaki Souma , Michihisa Fukumoto
IPC分类号： C25D3/56
CPC分类号： C25D3/56
摘要： Disclosed is a method for forming a high-Re-content alloy film, such as a Re-based film containing Re at 98% or more by atomic composition, or an alloy film containing Re in the range of 65 to less than 98% by atomic composition and at least one of Ni, Fe and Co. The method comprises performing an electroplating process using an electroplating bath containing an aqueous solution which includes a perrhenate ion, at least one ion selected from the group consisting of Ni, Fe, Co and Cr ions, and at least one of a Li ion and a Na ion. The present invention allows a high-Re-content alloy film usable as a corrosion-resistant alloy coating for a high-temperature component or the like to be formed through an electroplating process using an aqueous solution, so as to provide heat/corrosion resistances to the component, even if it has a complicated shape, in a simplified manner at a low cost.
摘要翻译：公开了一种用于形成高Re含量合金膜的方法，例如含有Re为98％以上的Re为原子组成的Re基膜，或者含有Re为65〜98％以下的合金膜的方法为原子组成和Ni，Fe和Co中的至少一种。该方法包括使用含有水溶液的电镀浴进行电镀工艺，该水溶液包括高铼酸根离子，至少一种选自Ni，Fe，Co和 Cr离子和Li离子和Na离子中的至少一种。本发明允许通过使用水溶液的电镀工艺形成可用作高温组分等的耐腐蚀合金涂层的高Re含量合金膜，以提供耐热腐蚀性该组件即使具有复杂的形状，也以简单的方式以低成本。

3. 发明申请

US20050126922A1 Method for forming re coating film or re-cr alloy coating film through electroplating 失效
标题翻译：通过电镀形成再涂膜或再Cr合金涂膜的方法
公开(公告)号：US20050126922A1
公开(公告)日：2005-06-16
申请号：US10501720
申请日：2003-01-17
申请人： Toshio Narita , Shigenari Hayashi , Takayuki Yoshioka , Hiroshi Yakuwa , Michiaki Souma
发明人： Toshio Narita , Shigenari Hayashi , Takayuki Yoshioka , Hiroshi Yakuwa , Michiaki Souma
IPC分类号： C25D3/56
CPC分类号： C25D3/56
摘要： Disclosed is a method for forming: a Re—Cr alloy film consisting of Re in the range of greater than 0 (zero) to less than 98% by atomic composition, and the remainder being Cr except inevitable impurities; a Re-based film consisting of 98% or more, by atomic composition, of Re, with the remainder being Cr and inevitable impurities; or a Re—Cr—Ni alloy film consisting of Re in the range of 50 to less than 98% by atomic composition, Cr in the range of 2 to less than 45% by atomic composition, and the remainder being Ni except inevitable impurities. The method comprises performing an electroplating process using an electroplating bath containing an aqueous solution which includes a perrhenate ion and a chromium (III) ion. The present invention allows a Re—Cr alloy, Re-based or Re—Cr—Ni alloy film usable as a corrosion-resistant alloy coating for a high-temperature component or the like to be formed through an electroplating process using an aqueous solution, so as to provide heat/corrosion resistances to the component, even if it has a complicated shape, in a simplified manner at a low cost.
摘要翻译：公开了一种用于形成由Re组成的Re-Cr合金膜的方法，所述Re在大于0（零）至小于98％的范围内的原子组成，其余为除了不可避免的杂质之外的Cr; 由Re原子组成为98％以上的Re基膜，其余为Cr和不可避免的杂质; 或由Re组成的Re-Cr-Ni合金膜的原子组成为50〜小于98％的范围，Cr为2〜小于45原子的组成，余量为Ni，不包括不可避免的杂质。该方法包括使用含有包含高铼酸根离子和铬（III）离子的水溶液的电镀浴进行电镀工艺。本发明允许通过使用水溶液的电镀工艺形成可用作高温组分等的耐腐蚀合金涂层的Re-Cr合金，Re基或Re-Cr-Ni合金膜，以便以简单的方式以低成本为零件提供耐热/耐腐蚀性，即使其具有复杂的形状。

4. 发明授权

US06979392B2 Method for forming Re—Cr alloy film or Re-based film through electroplating process 失效
标题翻译：通过电镀工艺形成Re-Cr合金膜或Re基膜的方法
公开(公告)号：US06979392B2
公开(公告)日：2005-12-27
申请号：US10501720
申请日：2003-01-17
申请人： Toshio Narita , Shigenari Hayashi , Takayuki Yoshioka , Hiroshi Yakuwa , Michiaki Souma
发明人： Toshio Narita , Shigenari Hayashi , Takayuki Yoshioka , Hiroshi Yakuwa , Michiaki Souma
IPC分类号： C25D3/56
CPC分类号： C25D3/56
摘要： Disclosed is a method for forming: a Re—Cr alloy film consisting of Re in the range of greater than 0 (zero) to less than 98% by atomic composition, and the remainder being Cr except inevitable impurities; a Re-based film consisting of 98% or more, by atomic composition, of Re, with the remainder being Cr and inevitable impurities; or a Re—Cr—Ni alloy film consisting of Re in the range of 50 to less than 98% by atomic composition, Cr in the range of 2 to less than 45% by atomic composition, and the remainder being Ni except inevitable impurities. The method comprises performing an electroplating process using an electroplating bath containing an aqueous solution which includes a perrhenate ion and a chromium (III) ion. The present invention allows a Re—Cr alloy, Re-based or Re—Cr—Ni alloy film usable as a corrosion-resistant alloy coating for a high-temperature component or the like to be formed through an electroplating process using an aqueous solution, so as to provide heat/corrosion resistances to the component, even if it has a complicated shape, in a simplified manner at a low cost.
摘要翻译：公开了一种用于形成由Re组成的Re-Cr合金膜的方法，所述Re在大于0（零）至小于98％的范围内的原子组成，其余为除了不可避免的杂质之外的Cr; 由Re原子组成为98％以上的Re基膜，其余为Cr和不可避免的杂质; 或由Re组成的Re-Cr-Ni合金膜的原子组成为50〜小于98％的范围，Cr为2〜小于45原子的组成，余量为Ni，不包括不可避免的杂质。该方法包括使用含有包含高铼酸根离子和铬（III）离子的水溶液的电镀浴进行电镀工艺。本发明允许通过使用水溶液的电镀工艺形成可用作高温组分等的耐腐蚀合金涂层的Re-Cr合金，Re基或Re-Cr-Ni合金膜，以便以简单的方式以低成本为零件提供耐热/耐腐蚀性，即使其具有复杂的形状。

5. 发明授权

US06998035B2 Method for forming Re-Cr alloy film through electroplating process using bath containing Cr(VI) 失效
标题翻译：通过使用含有Cr（VI）的浴的电镀工艺形成Re-Cr合金膜的方法
公开(公告)号：US06998035B2
公开(公告)日：2006-02-14
申请号：US10502027
申请日：2003-01-17
申请人： Toshio Narita , Shigenari Hayashi , Takayuki Yoshioka , Hiroshi Yakuwa , Michiaki Souma
发明人： Toshio Narita , Shigenari Hayashi , Takayuki Yoshioka , Hiroshi Yakuwa , Michiaki Souma
IPC分类号： C25D3/56
CPC分类号： C25D3/56
摘要： Disclosed is a method for forming a Re—Cr alloy film consisting of Re in the range of 60 to 90% by atomic composition. The method comprises performing an electroplating process using an electroplating bath containing an aqueous solution which includes a perrhenate ion and a chromium (VI) ion. The present invention allows a Re—Cr alloy film usable as a corrosion-resistant alloy coating for a high-temperature component or the like to be formed through an electroplating process using an aqueous solution, so as to provide heat/corrosion resistances to the component, even if it has a complicated shape, in a simplified manner at a low cost.
摘要翻译：公开了由Re组成的Re-Cr合金膜的60〜90％的原子组成的方法。该方法包括使用包含含有高铼酸根离子和铬（VI）离子的水溶液的电镀浴进行电镀工艺。本发明允许通过使用水溶液的电镀工艺形成用作高温组分等的耐腐蚀合金涂层的Re-Cr合金膜，从而为组分提供耐热/耐腐蚀性即使它具有复杂的形状，也以简单的方式以低成本。

6. 发明申请

US20050167282A1 Method for forming Re-Cr alloy film through electroplating process using bath containing Cr(VI) 失效
标题翻译：通过使用含有Cr（VI）的浴的电镀工艺形成Re-Cr合金膜的方法
公开(公告)号：US20050167282A1
公开(公告)日：2005-08-04
申请号：US10502027
申请日：2003-01-17
申请人： Toshio Narita , Shigenari Hayashi , Takayuki Yoshioka , Hiroshi Yakuwa , Michiaki Souma
发明人： Toshio Narita , Shigenari Hayashi , Takayuki Yoshioka , Hiroshi Yakuwa , Michiaki Souma
IPC分类号： C25D3/56
CPC分类号： C25D3/56
摘要： Disclosed is a method for forming a Re—Cr alloy film consisting of Re in the range of 60 to 90% by atomic composition. The method comprises performing an electroplating process using an electroplating bath containing an aqueous solution which includes a perrhenate ion and a chromium (IV) ion. The present invention allows a Re—Cr alloy film usable as a corrosion-resistant alloy coating for a high-temperature component or the like to be formed through an electroplating process using an aqueous solution, so as to provide heat/corrosion resistances to the component, even if it has a complicated shape, in a simplified manner at a low cost.
摘要翻译：公开了由Re组成的Re-Cr合金膜的60〜90％的原子组成的方法。该方法包括使用包含含有高铼酸根离子和铬（IV）离子的水溶液的电镀浴进行电镀工艺。本发明允许通过使用水溶液的电镀工艺形成用作高温组分等的耐腐蚀合金涂层的Re-Cr合金膜，从而为组分提供耐热/耐腐蚀性即使它具有复杂的形状，也以简单的方式以低成本。

7. 发明授权

US07192655B2 ReCrNi alloy coating for diffusion barrier 有权
标题翻译： ReCrNi合金涂层用于扩散屏障
公开(公告)号：US07192655B2
公开(公告)日：2007-03-20
申请号：US10494022
申请日：2002-09-13
申请人： Toshio Narita , Shigenari Hayashi , Takayuki Yoshioka , Hiroshi Yakuwa
发明人： Toshio Narita , Shigenari Hayashi , Takayuki Yoshioka , Hiroshi Yakuwa
IPC分类号： B32B15/00
CPC分类号： C23C28/321 , C23C28/325 , C23C28/345 , C23C30/00 , Y02T50/67 , Y10T428/12 , Y10T428/12493 , Y10T428/12771 , Y10T428/12847 , Y10T428/12854 , Y10T428/12937
摘要： Disclosed is a ReCrNi alloy coating for diffusion barrier, such as a high-temperature equipment member, consisting essentially of a ternary alloy and having, except for inevitable impurities, an atomic composition of 20% to 80% Re, an atomic composition of 20% to 60% Cr, and an atomic composition of 5% to 40% Ni. Even if the alloy coating for diffusion barrier includes a diffusion layer containing at least one of the group consisting of Al, Si and Cr, a desired alloy composition of the alloy coating for diffusion barrier can be assured by a surface coating process and diffused components from the substrate while substantially preventing the diffusion of the elements of the diffusion layer during a homogenizing heat treatment. The alloy coating for diffusion barrier may include a Re-containing-alloy stress relief layer inserted between the film and the substrate. The ReCrNi alloy coating can suppress the deterioration of the substrate and the coating layer due to the reaction therebetween to provide an extended life span of the equipment member.
摘要翻译：公开了用于扩散阻挡层的ReCrNi合金涂层，例如高温设备构件，其基本上由三元合金组成，除了不可避免的杂质外，其原子组成为20％至80％Re，原子组成为20％至60％的Cr，原子组成为5％至40％的Ni。即使用于扩散阻挡层的合金涂层包括含有由Al，Si和Cr组成的组中的至少一种的扩散层，也可以通过表面涂覆工艺和扩散组分来确保用于扩散阻挡层的合金涂层的所需合金组成同时基本上防止在均质化热处理期间扩散层的元件的扩散。用于扩散阻挡层的合金涂层可以包括插入在膜和衬底之间的Re含合金应力消除层。 ReCrNi合金涂层可以抑制由于它们之间的反应导致的基板和涂层的劣化，从而延长设备的使用寿命。

8. 发明申请

US20050037222A1 Recrni alloy coating for diffusion barrier 有权
标题翻译：用于扩散屏障的合金涂层
公开(公告)号：US20050037222A1
公开(公告)日：2005-02-17
申请号：US10494022
申请日：2002-09-13
申请人： Toshio Narita , Shigenari Hayashi , Takayuki Yoshioka , Hiroshi Yakuwa
发明人： Toshio Narita , Shigenari Hayashi , Takayuki Yoshioka , Hiroshi Yakuwa
IPC分类号： C23C28/00 , C23C28/02 , C23C30/00 , B32B1/00
CPC分类号： C23C28/321 , C23C28/325 , C23C28/345 , C23C30/00 , Y02T50/67 , Y10T428/12 , Y10T428/12493 , Y10T428/12771 , Y10T428/12847 , Y10T428/12854 , Y10T428/12937
摘要： Disclosed is a ReCrNi alloy coating for diffusion barrier, such as a high-temperature equipment member, consisting essentially of a ternary alloy and having, except for inevitable impurities, an atomic composition of 20 % to 80 % Re, an atomic composition of 20 % to 60 % Cr, and an atomic composition of 5 % to 40 % Ni. Even if the alloy coating for diffusion barrier includes a diffusion layer containing at least one of the group consisting of Al, Si and Cr, a desired alloy composition of the alloy coating for diffusion barrier can be assured by a surface coating process and diffused components from the substrate while substantially preventing the diffusion of the elements of the diffusion layer during a homogenizing heat treatment. The alloy coating for diffusion barrier may include a Re-containing-alloy stress relief layer inserted between the film and the substrate. The ReCrNi alloy coating can suppress the deterioration of the substrate and the coating layer due to the reaction therebetween to provide an extended life span of the equipment member.
摘要翻译：公开了一种用于扩散阻挡层的ReCrNi合金涂层，例如高温设备构件，其基本上由三元合金组成，除了不可避免的杂质外，其原子组成为20％至80％Re，原子组成为20％至60％的Cr，原子组成为5％至40％的Ni。即使用于扩散阻挡层的合金涂层包括含有由Al，Si和Cr组成的组中的至少一种的扩散层，也可以通过表面涂覆工艺和扩散组分来确保用于扩散阻挡层的合金涂层的所需合金组成同时基本上防止在均质化热处理期间扩散层的元件的扩散。用于扩散阻挡层的合金涂层可以包括插入在膜和衬底之间的Re含合金应力消除层。 ReCrNi合金涂层可以抑制由于它们之间的反应导致的基板和涂层的劣化，从而延长设备的使用寿命。

9. 发明授权

US07060368B2 ReCr alloy coating for diffusion barrier 失效
标题翻译： ReCr合金涂层用于扩散屏障
公开(公告)号：US07060368B2
公开(公告)日：2006-06-13
申请号：US10494015
申请日：2002-09-13
申请人： Toshio Narita , Shigenari Hayashi , Takayuki Yoshioka , Hiroshi Yakuwa
发明人： Toshio Narita , Shigenari Hayashi , Takayuki Yoshioka , Hiroshi Yakuwa
IPC分类号： B32B15/00
CPC分类号： C23C28/321 , C23C28/325 , C23C28/345 , C23C28/3455 , C23C30/00 , Y02T50/67 , Y10T428/12771 , Y10T428/12854 , Y10T428/12944
摘要： Disclosed is a ReCr alloy coating for diffusion barrier formed on a substrate, such as a high-temperature equipment member, which comprises an atomic composition of 50% to less than 90% Re, with the remainder consisting essentially of Cr except for inevitable impurities. Even if the alloy coating for diffusion barrier includes a diffusion layer containing at least one of the group consisting of Al, Si and Cr, a desired alloy composition of the alloy coating for diffusion barrier can be assured by a surface coating process and diffused components from the substrate while substantially preventing the diffusion of the elements of the diffusion layer during a homogenizing heat treatment. The alloy coating for diffusion barrier may include a Re-containing-alloy stress relief layer inserted between the film and the substrate. The ReCr—Ni alloy coating can suppress the deterioration of the substrate and the coating layer due to the reaction therebetween to provide an extended life span of the equipment member.
摘要翻译：公开了一种用于扩散阻挡层的ReCr合金涂层，其形成在诸如高温设备构件的基底上，其包含50％至小于90％的Re的原子组成，其余余量基本上由Cr除外，不同之处在于不可避免的杂质。即使用于扩散阻挡层的合金涂层包括含有由Al，Si和Cr组成的组中的至少一种的扩散层，也可以通过表面涂覆工艺和扩散组分来确保用于扩散阻挡层的合金涂层的所需合金组成同时基本上防止在均质化热处理期间扩散层的元件的扩散。用于扩散阻挡层的合金涂层可以包括插入在膜和衬底之间的Re含合金应力消除层。 ReCr-Ni合金涂层可以抑制由于其间的反应导致的基板和涂层的劣化，从而延长设备构件的使用寿命。

10. 发明申请

US20050031893A1 Recr alloy coating for diffusion barrier 失效
标题翻译：用于扩散屏障的合金涂层
公开(公告)号：US20050031893A1
公开(公告)日：2005-02-10
申请号：US10494015
申请日：2002-09-13
申请人： Toshio Narita , Shigenari Hayashi , Takayuki Yoshioka , Hiroshi Yakuwa
发明人： Toshio Narita , Shigenari Hayashi , Takayuki Yoshioka , Hiroshi Yakuwa
IPC分类号： C23C28/00 , C23C28/02 , C23C30/00 , B32B15/00
CPC分类号： C23C28/321 , C23C28/325 , C23C28/345 , C23C28/3455 , C23C30/00 , Y02T50/67 , Y10T428/12771 , Y10T428/12854 , Y10T428/12944
摘要： Disclosed is a ReCr alloy coating for diffusion barrier formed on a substrate, such as a high-temperature equipment member, which comprises an atomic composition of 50% to less than 90% Re, with the remainder consisting essentially of Cr except for inevitable impurities. Even if the alloy coating for diffusion barrier includes a diffusion layer containing at least one of the group consisting of Al, Si and Cr, a desired alloy composition of the alloy coating for diffusion barrier can be assured by a surface coating process and diffused components from the substrate while substantially preventing the diffusion of the elements of the diffusion layer during a homogenizing heat treatment. The alloy coating for diffusion barrier may include a Re-containing-alloy stress relief layer inserted between the film and the substrate. The ReCr—Ni alloy coating can suppress the deterioration of the substrate and the coating layer due to the reaction therebetween to provide an extended life span of the equipment member.
摘要翻译：公开了一种用于扩散阻挡层的ReCr合金涂层，其形成在诸如高温设备构件的基底上，其包含50％至小于90％的Re的原子组成，其余余量基本上由Cr除外，不同之处在于不可避免的杂质。即使用于扩散阻挡层的合金涂层包括含有由Al，Si和Cr组成的组中的至少一种的扩散层，也可以通过表面涂覆工艺和扩散组分来确保用于扩散阻挡层的合金涂层的所需合金组成同时基本上防止在均质化热处理期间扩散层的元件的扩散。用于扩散阻挡层的合金涂层可以包括插入在膜和衬底之间的Re含合金应力消除层。 ReCr-Ni合金涂层可以抑制由于其间的反应导致的基板和涂层的劣化，从而延长设备构件的使用寿命。

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