专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06357649B1 Method and apparatus for automatically soldering a lead wire to a solar battery 有权
标题翻译：将引线自动焊接到太阳能电池的方法和装置
公开(公告)号：US06357649B1
公开(公告)日：2002-03-19
申请号：US09532195
申请日：2000-03-22
申请人： Toshihide Okatsu , Masataka Kondo , Akimine Hayashi , Eiji Kuribe
发明人： Toshihide Okatsu , Masataka Kondo , Akimine Hayashi , Eiji Kuribe
IPC分类号： B23K3100
CPC分类号： B23K3/0615 , B23K1/06 , B23K2101/42 , H01L21/67138 , H01L31/0201 , H01L31/046 , H01L31/188 , H01L2924/0002 , H01R43/02 , Y02E10/50 , H01L2924/00
摘要： A plurality of solder bumps are arranged in a row at regular pitch in a lead wire soldering region of a solar battery. A soldering apparatus for soldering a lead wire to the lead wire soldering region via the solder bumps comprises a lead wire feeding section for feeding out the lead wire. An end of the lead wire in the lead wire feeding section is chucked and the lead wire is laid over all length of the row of solder bumps. The soldering apparatus further comprises a soldering unit for soldering the lead wire onto the solder bump. The soldering unit has a lead wire holding member for holding the lead wire on a solder bump and a soldering iron. The soldering apparatus repeats an operation for welding the lead wire to the solder bump by means of the soldering iron, while the lead wire is held by the lead wire holding member.
摘要翻译：多个焊料凸块在太阳能电池的引线焊接区域中以规则的间距排成一列。用于通过焊锡凸块将引线焊接到引线焊接区域的焊接装置包括用于馈送引线的引线馈送部分。引线馈电部分中的引线的一端被卡住，并且引线布置在一排焊料凸块的所有长度上。焊接装置还包括用于将引线焊接到焊料凸块上的焊接单元。焊接单元具有用于将引线保持在焊料凸块和烙铁上的引线保持构件。焊接装置通过烙铁重复将引线焊接到焊料凸块的操作，同时引线由引线保持部件保持。

2. 发明授权

US06271149B1 Method of forming a thin film on a substrate of a semiconductor device 有权
标题翻译：在半导体器件的基板上形成薄膜的方法
公开(公告)号：US06271149B1
公开(公告)日：2001-08-07
申请号：US09531549
申请日：2000-03-20
申请人： Masataka Kondo , Katsuhiko Hayashi , Eiji Kuribe
发明人： Masataka Kondo , Katsuhiko Hayashi , Eiji Kuribe
IPC分类号： H01L2131
CPC分类号： H01L21/67028 , H01L31/18
摘要： A method of manufacturing a semiconductor device having a substrate with a thin film formed thereon, the method including washing the substrate with a washing liquid, removing the washing liquid from the substrate by blowing a compressed air to the substrate washed, and forming a thin film on the substrate immediately after blowing the compressed air on the substrate without performed another step, wherein the compressed air to be blown on the substrate may be pre-heated or ionized and the substrate may be washed with an inert gas in the form of plasma before the thin film is formed.
摘要翻译：一种制造具有在其上形成有薄膜的基板的半导体器件的方法，所述方法包括用洗涤液洗涤所述基板，通过向被冲洗的基板吹入压缩空气，从所述基板除去所述洗涤液，并形成薄膜在不进行另一步骤的情况下立即将衬底上的压缩空气吹入基板上，其中待在基板上吹送的压缩空气可以被预热或电离，并且可以用等离子体形式的惰性气体洗涤基板形成薄膜。

3. 发明授权

US06849560B2 Method of depositing silicon thin film and silicon thin film solar cell 有权
标题翻译：沉积硅薄膜和硅薄膜太阳能电池的方法
公开(公告)号：US06849560B2
公开(公告)日：2005-02-01
申请号：US10271473
申请日：2002-10-15
申请人： Takashi Suezaki , Eiji Kuribe
发明人： Takashi Suezaki , Eiji Kuribe
IPC分类号： C03C17/00 , C03C17/22 , C23C16/24 , C23C16/458 , H01L31/18 , H01L21/31
CPC分类号： C23C16/4585 , C03C17/002 , C03C17/22 , C03C2217/282 , C03C2218/152 , C23C16/24 , H01L31/182 , Y02E10/546 , Y02P70/521
摘要： In a method of depositing a silicon thin film by using a vertical plasma CVD apparatus having steps of holding a substrate having an area not smaller than 1,200 cm2 and having a conductive film formed thereon with a substrate holder, disposing the substrate to face an electrode, and depositing a silicon thin film under a power density of 100 mW/cm2 or more, the substrate holder is electrically insulated from the conductive film formed on the surface of the substrate by forming a separation groove in the conductive film.
摘要翻译：在通过使用具有保持具有不小于1,200cm 2的面积的基板并且在其上形成有导电膜的基板保持器的步骤的垂直等离子体CVD装置中沉积硅薄膜的方法中，将基板设置为电极，在100mW / cm 2以上的功率密度下沉积硅薄膜，通过在导电膜中形成分离槽，使基板保持器与形成在基板表面上的导电膜电绝缘。

4. 发明申请

US20120315395A1 THIN-FILM MANUFACTURING EQUIPMENT, METHOD FOR MANUFACTURING THIN FILM, AND METHOD FOR MAINTAINING THIN-FILM MANUFACTURING EQUIPMENT 审中-公开
标题翻译：薄膜制造设备，制造薄膜的方法和用于维护薄膜制造设备的方法
公开(公告)号：US20120315395A1
公开(公告)日：2012-12-13
申请号：US13579881
申请日：2011-02-09
申请人： Eiji Kuribe , Takeyoshi Takahashi
发明人： Eiji Kuribe , Takeyoshi Takahashi
IPC分类号： C23C16/458 , B65H29/00 , H01L21/677 , H01L31/18
CPC分类号： H01L21/67781 , H01L21/67724 , H01L21/67736
摘要： The present invention aims to provide thin-film manufacturing equipment, a method for manufacturing a thin film, and a method for maintaining thin-film manufacturing equipment, which are capable of depositing with high productivity even in the occurrence of unexpected failure. Thin-film manufacturing equipment provided herein includes a group of deposition chambers that is a collection of deposition chambers each provided with a deposition compartment, in which a thin film is deposited on a substrate, a movable chamber designed to convey a substrate, and more than two substrate temporary holding devices each for temporarily holding a substrate, wherein the movable device is designed to deliver and receive the substrate to and from each of the deposition chambers and designed to perform at least one action selected from the group consisting of receiving and discharging of the substrate from and to each of the more than two substrate temporary holding devices.
摘要翻译：本发明的目的在于提供薄膜制造设备，薄膜制造方法以及保持薄膜制造设备的方法，即使在出现意外的故障的情况下也能够以高生产率进行存储。本文提供的薄膜制造设备包括一组沉积室，每个沉积室各自设置有沉积室，沉积室中沉积有薄膜，设计成输送基板的可移动室，以及多于两个用于临时保持基板的基板临时保持装置，其中可移动装置被设计成向每个沉积室输送和接收基板，并被设计成执行选自以下的至少一个动作：接收和排出基板从多于两个的基板临时保持装置中的每一个到基板。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式