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1. 发明申请

US20060144519A1 Coaxial type impedance matching device and impedance detecting method for plasma generation 有权
标题翻译：同轴型阻抗匹配装置及等离子体发生阻抗检测方法
公开(公告)号：US20060144519A1
公开(公告)日：2006-07-06
申请号：US11370780
申请日：2006-03-08
申请人： Toshiaki Kitamura , Koichi Rokuyama , Shigeru Kasai , Takashi Ogino , Yuki Osada
发明人： Toshiaki Kitamura , Koichi Rokuyama , Shigeru Kasai , Takashi Ogino , Yuki Osada
IPC分类号： C23F1/00
CPC分类号： H01J37/32174 , H01J37/32082 , H01J37/32183 , H01P5/026 , H01P5/04
摘要： A plasma generating method generates plasma in a treating chamber by controlling a high-frequency generating unit to generate a high-frequency signal and by feeding the high-frequency signal to the treating chamber through an impedance matching device. The plasma generating method includes controlling the impedance matching device, when the plasma is generated in the treating chamber, so as to satisfy a preset matching condition, and then controlling the high-frequency generating unit to generate and feed the high-frequency signal of the power generating the plasma, to the treating chamber.
摘要翻译：等离子体产生方法通过控制高频发生单元产生高频信号并通过阻抗匹配装置将高频信号馈送到处理室来在处理室中产生等离子体。等离子体产生方法包括当在处理室中产生等离子体时，控制阻抗匹配装置，以便满足预设的匹配条件，然后控制高频产生单元以产生和馈送高频信号产生等离子体的功率到处理室。

2. 发明授权

US06856211B2 Coaxial type impedance matching device 有权
标题翻译：同轴型阻抗匹配装置
公开(公告)号：US06856211B2
公开(公告)日：2005-02-15
申请号：US10441906
申请日：2003-05-20
申请人： Fumio Yamada , Toshiaki Kitamura , Hiroyuki Kobayashi , Koichi Rokuyama , Akihiro Kubota , Shigeru Kasai , Takashi Ogino , Yuki Osada
发明人： Fumio Yamada , Toshiaki Kitamura , Hiroyuki Kobayashi , Koichi Rokuyama , Akihiro Kubota , Shigeru Kasai , Takashi Ogino , Yuki Osada
IPC分类号： H01R13/646 , H03H7/38 , H01Q1/50
CPC分类号： H01R24/542 , H01R24/44 , H01R2103/00
摘要： A coaxial type impedance matching device includes a matching device body including an external conductor and an internal conductor arranged in the external conductor, an input side dielectric disposed in the matching device body and including a first dielectric and a second dielectric, and an output side dielectric disposed in the matching device body and including a third dielectric and a fourth dielectric. Distance between opposed surfaces of the first dielectric and the second dielectric is a predetermined distance, which is in a range of Nλ/4−λ/6 to Nλ/4−λ/6, where λ represents a guide wavelength of an input signal in the matching device body and N represents odd number. Distance between opposed surfaces of the third dielectric and the fourth dielectric is the predetermined distance.
摘要翻译：同轴型阻抗匹配装置包括匹配装置主体，其包括外部导体和布置在外部导体中的内部导体，输入侧电介质设置在匹配装置主体中并且包括第一电介质和第二电介质，以及输出侧电介质设置在匹配装置主体中并且包括第三电介质和第四电介质。第一电介质和第二电介质的相对表面之间的距离为Nλ/ 4-λ/ 6至Nλ/ 4-λ/ 6的范围内的预定距离，其中λ表示输入信号的引导波长匹配装置主体，N表示奇数。第三电介质和第四电介质的相对表面之间的距离为预定距离。

3. 发明授权

US07355379B2 Coaxial type impedance matching device and impedance detecting method for plasma generation 有权
标题翻译：同轴型阻抗匹配装置及等离子体发生阻抗检测方法
公开(公告)号：US07355379B2
公开(公告)日：2008-04-08
申请号：US11370780
申请日：2006-03-08
申请人： Toshiaki Kitamura , Koichi Rokuyama , Shigeru Kasai , Takashi Ogino , Yuki Osada
发明人： Toshiaki Kitamura , Koichi Rokuyama , Shigeru Kasai , Takashi Ogino , Yuki Osada
IPC分类号： G01R23/00 , G01R25/00
CPC分类号： H01J37/32174 , H01J37/32082 , H01J37/32183 , H01P5/026 , H01P5/04
摘要： A plasma generating method generates plasma in a treating chamber by controlling a high-frequency generating unit to generate a high-frequency signal and by feeding the high-frequency signal to the treating chamber through an impedance matching device. The plasma generating method includes controlling the impedance matching device, when the plasma is generated in the treating chamber, so as to satisfy a preset matching condition, and then controlling the high-frequency generating unit to generate and feed the high-frequency signal of the power generating the plasma, to the treating chamber.
摘要翻译：等离子体产生方法通过控制高频发生单元产生高频信号并通过阻抗匹配装置将高频信号馈送到处理室来在处理室中产生等离子体。等离子体产生方法包括当在处理室中产生等离子体时，控制阻抗匹配装置，以便满足预设的匹配条件，然后控制高频产生单元以产生和馈送高频信号产生等离子体的功率到处理室。

4. 发明授权

US06819052B2 Coaxial type impedance matching device and impedance detecting method for plasma generation 有权
标题翻译：同轴型阻抗匹配装置及等离子体发生阻抗检测方法
公开(公告)号：US06819052B2
公开(公告)日：2004-11-16
申请号：US10441899
申请日：2003-05-20
申请人： Toshiaki Kitamura , Koichi Rokuyama , Shigeru Kasai , Takashi Ogino , Yuki Osada
发明人： Toshiaki Kitamura , Koichi Rokuyama , Shigeru Kasai , Takashi Ogino , Yuki Osada
IPC分类号： H01J724
CPC分类号： H01J37/32174 , H01J37/32082 , H01J37/32183 , H01P5/026 , H01P5/04
摘要： For plasma generation, an impedance matching device and a process of controlling and detecting the impedance matching device are provided to satisfy a preset matching condition. The impedance matching device includes a tubular external conductor and an internal conductor disposed therein, a matching device body including a plurality of dielectrics, a moving mechanism, a storing unit for storing a data table, a measuring device, and a calculation control unit. The impedance detecting process includes inputting a progressive wave and a reflected wave outputted by a directional coupler connected to an object to be matched, generating different signals, and mixing the signals to determine relative phase differences and amplitude ratios of the signals, and detecting an input impedance of the object to be matched on a basis of the detected amplitude ratios and that of a true phase difference between the progressive wave and the reflected wave that is detected by referring to a relationship prepared in advance.
摘要翻译：对于等离子体产生，提供阻抗匹配装置和控制和检测阻抗匹配装置的过程以满足预设的匹配条件。阻抗匹配装置包括管状外部导体和布置在其中的内部导体，包括多个电介质的匹配装置主体，移动机构，用于存储数据表的存储单元，测量装置和计算控制单元。阻抗检测处理包括：输入由连接到要匹配对象的定向耦合器输出的行波和反射波，产生不同的信号，以及混合信号以确定信号的相对相位差和振幅比，以及检测输入基于检测到的振幅比来匹配的物体的阻抗以及通过参照预先准备的关系检测到的行进波和反射波之间的真相位差的阻抗。

5. 发明授权

US07176634B2 Coaxial type impedance matching device and impedance detecting method for plasma generation 有权
标题翻译：同轴型阻抗匹配装置及等离子体发生阻抗检测方法
公开(公告)号：US07176634B2
公开(公告)日：2007-02-13
申请号：US10951049
申请日：2004-09-27
申请人： Toshiaki Kitamura , Koichi Rokuyama , Shigeru Kasai , Takashi Ogino , Yuki Osada
发明人： Toshiaki Kitamura , Koichi Rokuyama , Shigeru Kasai , Takashi Ogino , Yuki Osada
IPC分类号： H01J7/24 , H03H7/38
CPC分类号： H01J37/32174 , H01J37/32082 , H01J37/32183 , H01P5/026 , H01P5/04
摘要： A plasma generating method generates plasma in a treating chamber by controlling a high-frequency generating unit to generate a high-frequency signal and by feeding the high-frequency signal to the treating chamber through an impedance matching device. The plasma generating method includes controlling the impedance matching device, when the plasma is generated in the treating chamber, so as to satisfy a preset matching condition, and then controlling the high-frequency generating unit to generate and feed the high-frequency signal of the power generating the plasma, to the treating chamber.
摘要翻译：等离子体产生方法通过控制高频发生单元产生高频信号并通过阻抗匹配装置将高频信号馈送到处理室来在处理室中产生等离子体。等离子体产生方法包括当在处理室中产生等离子体时，控制阻抗匹配装置，以便满足预设的匹配条件，然后控制高频产生单元以产生和馈送高频信号产生等离子体的功率到处理室。

6. 发明申请

US20050057164A1 Coaxial type impedance matching device and impedance detecting method for plasma generation 有权
标题翻译：同轴型阻抗匹配装置及等离子体发生阻抗检测方法
公开(公告)号：US20050057164A1
公开(公告)日：2005-03-17
申请号：US10951049
申请日：2004-09-27
申请人： Toshiaki Kitamura , Koichi Rokuyama , Shigeru Kasai , Takashi Ogino , Yuki Osada
发明人： Toshiaki Kitamura , Koichi Rokuyama , Shigeru Kasai , Takashi Ogino , Yuki Osada
IPC分类号： H01J37/32 , H01J7/24 , H05B31/26
CPC分类号： H01J37/32174 , H01J37/32082 , H01J37/32183 , H01P5/026 , H01P5/04
摘要： A plasma generating method generates plasma in a treating chamber by controlling a high-frequency generating unit to generate a high-frequency signal and by feeding the high-frequency signal to the treating chamber through an impedance matching device. The plasma generating method includes controlling the impedance matching device, when the plasma is generated in the treating chamber, so as to satisfy a preset matching condition, and then controlling the high-frequency generating unit to generate and feed the high-frequency signal of the power generating the plasma, to the treating chamber.
摘要翻译：等离子体产生方法通过控制高频发生单元产生高频信号并通过阻抗匹配装置将高频信号馈送到处理室来在处理室中产生等离子体。等离子体产生方法包括当在处理室中产生等离子体时，控制阻抗匹配装置，以便满足预设的匹配条件，然后控制高频产生单元以产生和馈送高频信号产生等离子体的功率到处理室。

7. 发明授权

US07445690B2 Plasma processing apparatus 有权
标题翻译：等离子体处理装置
公开(公告)号：US07445690B2
公开(公告)日：2008-11-04
申请号：US11088811
申请日：2005-03-25
申请人： Shigeru Kasai , Yuki Osada , Takashi Ogino
发明人： Shigeru Kasai , Yuki Osada , Takashi Ogino
IPC分类号： C23C16/00 , H01L21/306
CPC分类号： H05B6/705
摘要： A plasma processing apparatus includes a chamber for containing a substrate to be processed, a gas supply unit for supplying a processing gas into the chamber, and a microwave introducing unit for introducing plasma generating microwaves into the chamber. The microwave introducing unit includes a microwave oscillator for outputting a plurality if microwaves having specified outputs, and an antenna section having a plurality of antennas to which the microwaves outputted from the microwave oscillator are respectively transmitted.
摘要翻译：等离子体处理装置包括用于容纳待处理基板的室，用于将处理气体供应到室中的气体供给单元和用于将等离子体产生微波引入室的微波引入单元。微波引入单元包括微波振荡器，用于输出具有指定输出的多个微波，以及具有分别从微波振荡器输出微波的多个天线的天线部分。

8. 发明授权

US08163128B2 Plasma processing apparatus 有权
标题翻译：等离子体处理装置
公开(公告)号：US08163128B2
公开(公告)日：2012-04-24
申请号：US12243598
申请日：2008-10-01
申请人： Shigeru Kasai , Yuki Osada , Takashi Ogino
发明人： Shigeru Kasai , Yuki Osada , Takashi Ogino
IPC分类号： C23C16/00 , H01L21/306
CPC分类号： H05B6/705
摘要： A plasma processing apparatus includes a chamber for containing a substrate to be processed, a gas supply unit for supplying a processing gas into the chamber, and a microwave introducing unit for introducing plasma generating microwaves into the chamber. The microwave introducing unit includes a microwave oscillator for outputting a plurality of microwaves having specified outputs, and an antenna section having a plurality of antennas to which the microwaves outputted from the microwave oscillator are respectively transmitted.
摘要翻译：等离子体处理装置包括用于容纳待处理基板的室，用于将处理气体供应到室中的气体供给单元和用于将等离子体产生微波引入室的微波引入单元。微波引入单元包括微波振荡器，用于输出具有特定输出的多个微波，以及具有分别从微波振荡器输出微波的多个天线的天线部分。

9. 发明申请

US20050160987A1 Plasma processing apparatus 有权
标题翻译：等离子体处理装置
公开(公告)号：US20050160987A1
公开(公告)日：2005-07-28
申请号：US11088811
申请日：2005-03-25
申请人： Shigeru Kasai , Yuki Osada , Takashi Ogino
发明人： Shigeru Kasai , Yuki Osada , Takashi Ogino
IPC分类号： C23C16/00 , C23F1/00
CPC分类号： H05B6/705
摘要： A plasma processing apparatus includes a chamber for containing a substrate to be processed, a gas supply unit for supplying a processing gas into the chamber, and a microwave introducing unit for introducing plasma generating microwaves into the chamber. The microwave introducing unit includes a microwave oscillator for outputting a plurality of microwaves having specified outputs, and an antenna section having a plurality of antennas to which the microwaves outputted from the microwave oscillator are respectively transmitted.
摘要翻译：等离子体处理装置包括用于容纳待处理基板的室，用于将处理气体供应到室中的气体供给单元和用于将等离子体产生微波引入室的微波引入单元。微波引入单元包括微波振荡器，用于输出具有特定输出的多个微波，以及具有分别从微波振荡器输出微波的多个天线的天线部分。

10. 发明授权

US08494384B2 Image forming apparatus 有权
标题翻译：图像形成装置
公开(公告)号：US08494384B2
公开(公告)日：2013-07-23
申请号：US13205084
申请日：2011-08-08
申请人： Takao Furuya , Yoshinari Iwaki , Seigo Makida , Takashi Ogino , Kiyoshi Hosoi , Katsumi Sakamaki
发明人： Takao Furuya , Yoshinari Iwaki , Seigo Makida , Takashi Ogino , Kiyoshi Hosoi , Katsumi Sakamaki
IPC分类号： G03G15/00
CPC分类号： G03G15/5029 , G03G15/235 , G03G2215/00776
摘要： An image forming apparatus includes a forming section that forms an image on a side of paper; a fixing section that applies heat to fix the image onto the side of the paper; a paper reversing section that reverses a front and back of the paper having the image fixed onto a first side in the fixing section; a first measuring section that is provided between a registration roller and the forming section to measure a first moisture content of the paper before an image is formed on the first side, and a second moisture content of the paper before an image is formed on a second side, after the image is fixed on the first side; and a calculating section that calculates amount of change of the size of the paper on the basis of the difference between the first moisture content and the second moisture content.
摘要翻译：图像形成装置包括在纸侧形成图像的成形部; 固定部分，其施加热量以将图像固定到纸张的侧面; 纸张反转部分，其将具有固定在固定部分的第一侧上的图像的纸张的正面和背面反转; 第一测量部分，设置在定位辊和成形部分之间，以在第一侧形成图像之前测量纸张的第一含水量，并且在第二侧形成图像之前的纸张的第二含水量在图像固定在第一面之后; 以及计算部，其基于第一含水量和第二湿度含量之间的差来计算纸的尺寸的变化量。

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