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1. 发明申请

US20100288730A1 Vacuum Processing Apparatus And Vacuum Processing Method Using The Same 审中-公开
标题翻译：真空处理装置及其真空处理方法
公开(公告)号：US20100288730A1
公开(公告)日：2010-11-18
申请号：US12844268
申请日：2010-07-27
申请人： Toru Ito , Kotaro Fujimoto , Eiji Matsumoto , Atsushi Yoshida , Kouta Tanaka
发明人： Toru Ito , Kotaro Fujimoto , Eiji Matsumoto , Atsushi Yoshida , Kouta Tanaka
IPC分类号： C23F1/00 , C23C16/50
CPC分类号： G05D16/2013
摘要： The invention provides a vacuum processing chamber comprising a particle removing function and capable of improving the yield and process efficiency for processing samples. The vacuum processing apparatus for transferring and processing samples comprises a processing chamber 207 within a vacuum reactor 103 and a transfer chamber 217 which are communicated via a passage having a gate valve 218, wherein the apparatus further comprises a control unit 234 for performing control upon transferring a sample to be processed between the processing chamber 207 and the transfer chamber 217 by setting the opening of a variable valve 230 for controlling pressure disposed below the vacuum reactor 103 to a predetermined opening so as to decompress the interior of the vacuum reactor, and thereafter, without varying the opening of the variable valve 230 for controlling pressure, supplying a predetermined amount of gas through a feed hole 235 into the vacuum reactor 207 so as to create a gas flow, opening the gate valve 218 to transfer the sample, then closing the gate valve 218 and stopping the feeding of gas after the transfer of the sample has been completed.
摘要翻译：本发明提供一种真空处理室，其包括除尘功能，能够提高加工样品的产率和工艺效率。用于转移和处理样品的真空处理设备包括在真空反应器103内的处理室207和经由具有闸阀218的通道连通的传送室217，其中该设备还包括控制单元234，用于在传送通过将用于控制设置在真空反应器103下方的压力的可变阀230的开口设定为预定的开口，以便减压真空反应器的内部，然后将处理室207和转移室217之间的处理样品，而不改变用于控制压力的可变阀230的开口，将预定量的气体通过进料孔235供应到真空反应器207中，以产生气流，打开闸阀218以转移样品，然后关闭闸阀218和在样品转移后停止气体供给已经完成。

2. 发明申请

US20080170970A1 Vacuum Processing Apparatus and Vacuum Processing Method Using the Same 审中-公开
标题翻译：真空处理装置及其真空处理方法
公开(公告)号：US20080170970A1
公开(公告)日：2008-07-17
申请号：US11772850
申请日：2007-07-03
申请人： Toru Ito , Kotaro Fujimoto , Eiji Matsumoto , Atsushi Yoshida , Kouta Tanaka
发明人： Toru Ito , Kotaro Fujimoto , Eiji Matsumoto , Atsushi Yoshida , Kouta Tanaka
IPC分类号： G05D16/00
CPC分类号： G05D16/2013
摘要： The invention provides a vacuum processing chamber comprising a particle removing function and capable of improving the yield and process efficiency for processing samples. The vacuum processing apparatus for transferring and processing samples comprises a processing chamber 207 within a vacuum reactor 103 and a transfer chamber 217 which are communicated via a passage having a gate valve 218, wherein the apparatus further comprises a control unit 234 for performing control upon transferring a sample to be processed between the processing chamber 207 and the transfer chamber 217 by setting the opening of a variable valve 230 for controlling pressure disposed below the vacuum reactor 103 to a predetermined opening so as to decompress the interior of the vacuum reactor, and thereafter, without varying the opening of the variable valve 230 for controlling pressure, supplying a predetermined amount of gas through a feed hole 235 into the vacuum reactor 207 so as to create a gas flow, opening the gate valve 218 to transfer the sample, then closing the gate valve 218 and stopping the feeding of gas after the transfer of the sample has been completed.
摘要翻译：本发明提供一种真空处理室，其包括除尘功能，能够提高加工样品的产率和工艺效率。用于转移和处理样品的真空处理设备包括在真空反应器103内的处理室207和经由具有闸阀218的通道连通的传送室217，其中该设备还包括控制单元234，用于在传送通过将用于控制设置在真空反应器103下方的压力的可变阀230的开口设定为预定的开口，以便减压真空反应器的内部，然后将处理室207和转移室217之间的处理样品，而不改变用于控制压力的可变阀230的开口，将预定量的气体通过进料孔235供应到真空反应器207中，以产生气流，打开闸阀218以转移样品，然后关闭闸阀218和在样品转移后停止气体供给已经完成。

3. 发明申请

US20060191555A1 Method of cleaning etching apparatus 有权
标题翻译：清洗蚀刻装置的方法
公开(公告)号：US20060191555A1
公开(公告)日：2006-08-31
申请号：US11203092
申请日：2005-08-15
申请人： Atsushi Yoshida , Kotaro Fujimoto , Takeshi Shimada
发明人： Atsushi Yoshida , Kotaro Fujimoto , Takeshi Shimada
IPC分类号： B08B6/00 , B08B9/00
CPC分类号： B08B7/0035
摘要： To provide a cleaning method for an etching apparatus for a metal film that efficiently removes an etching residue deposited in an etching process chamber, assures the reproducibility of the etching performance, and keeps the etching process chamber in a low-dust-emission condition. Each time one workpiece with a metal film is etched (S1), the interior of the vacuum chamber is cleaned by replacing the workpiece with a dummy substrate (S2), performing a first step of plasma processing using oxygen (O2) and carbon tetrafluoride (CF4) to remove a carbon-based deposit pile (S3), and performing a second step of plasma processing using boron trichloride (BCl3) and chlorine (Cl2) to remove a residue that could not be removed by the first step and an etching residue of the metal film (S4).
摘要翻译：为了提供一种用于金属膜的蚀刻装置的清洁方法，其有效地去除在蚀刻处理室中沉积的蚀刻残留物，确保蚀刻性能的再现性，并且使蚀刻处理室保持在低灰尘发射状态。每次蚀刻具有金属膜的工件（S 1）时，通过用虚设衬底（S 2）代替工件来清洁真空室的内部，使用氧气进行等离子体处理的第一步骤（O < 2）和四氟化碳（CF 4 SO 4）以除去碳基沉积堆（S 3），并且使用三氯化硼（BCl 3）进行等离子体处理的第二步骤和氯（Cl 2 O 2），以除去第一步骤不能除去的残余物和金属膜的蚀刻残留物（S 4）。

4. 发明授权

US07662235B2 Method of cleaning etching apparatus 有权
标题翻译：清洗蚀刻装置的方法
公开(公告)号：US07662235B2
公开(公告)日：2010-02-16
申请号：US11203092
申请日：2005-08-15
申请人： Atsushi Yoshida , Kotaro Fujimoto , Takeshi Shimada
发明人： Atsushi Yoshida , Kotaro Fujimoto , Takeshi Shimada
IPC分类号： B08B3/12 , B08B6/00
CPC分类号： B08B7/0035
摘要： To provide a cleaning method for an etching apparatus for a metal film that efficiently removes an etching residue deposited in an etching process chamber, assures the reproducibility of the etching performance, and keeps the etching process chamber in a low-dust-emission condition.Each time one workpiece with a metal film is etched (S1), the interior of the vacuum chamber is cleaned by replacing the workpiece with a dummy substrate (S2), performing a first step of plasma processing using oxygen (O2) and carbon tetrafluoride (CF4) to remove a carbon-based deposit pile (S3), and performing a second step of plasma processing using boron trichloride (BCl3) and chlorine (Cl2) to remove a residue that could not be removed by the first step and an etching residue of the metal film (S4).
摘要翻译：为了提供一种用于金属膜的蚀刻装置的清洁方法，其有效地去除在蚀刻处理室中沉积的蚀刻残留物，确保蚀刻性能的再现性，并且使蚀刻处理室保持在低灰尘发射状态。每次蚀刻具有金属膜的一个工件（S1），通过用虚设衬底（S2）代替工件来清洁真空室的内部，使用氧（O 2）和四氟化碳（O 2）进行等离子体处理的第一步骤 CF4）以除去碳基沉积堆（S3），并且使用三氯化硼（BCl 3）和氯（Cl 2）进行等离子体处理的第二步骤，以除去第一步骤中不能除去的残留物和蚀刻残留物的金属膜（S4）。

5. 发明授权

US10613463B2 Image processing apparatus, method, and non-transitory computer-readable storage medium having tone correction based on status 有权
公开(公告)号：US10613463B2
公开(公告)日：2020-04-07
申请号：US16239974
申请日：2019-01-04
申请人： Hiroki Hamashoji , Atsushi Yoshida , Hayato Kano
发明人： Hiroki Hamashoji , Atsushi Yoshida , Hayato Kano
IPC分类号： G03G15/00 , G06K15/02
CPC分类号： G03G15/5041 , G03G15/5058 , G03G15/556 , G06K15/027 , G03G2215/00037
摘要： An image forming apparatus includes a memory and circuitry. The memory is configured to store a status of the image forming apparatus and a first detected density value obtained in a first tone correction based on a dither pattern. The circuitry is configured to calculate a difference between the status of the image forming apparatus upon the first tone correction and the status of the image forming apparatus upon a second tone correction following the first tone correction. The circuitry is further configured to calculate a correction value according to the difference in the status of the image forming apparatus, based on the first detected density value and a second detected density value obtained in the second tone correction based on a reference pattern.

6. 发明授权

US10291826B2 Image processing apparatus, image processing method, and computer program product 有权
公开(公告)号：US10291826B2
公开(公告)日：2019-05-14
申请号：US15839477
申请日：2017-12-12
申请人： Atsushi Yoshida
发明人： Atsushi Yoshida
IPC分类号： H04N1/60 , G06K15/14 , G06K15/12
摘要： An image processing apparatus includes a processor including a setting unit to assign a correction control point to a first color-space value dependent on a first output device and a color chart generator to convert the first color-space value to which the correction control point is assigned into a second color-space value dependent on a second output device, displace the second color-space value, convert a displaced second color-space value into a displaced first color-space value, and generate a color chart including a patch generated based on the displaced first color-space value; an image forming device to output the color chart; and a colorimeter to perform colorimetry of the color chart. The processor further includes a correction parameter generator to generate a correction parameter to correct an output profile with a colorimetric value by the colorimeter, and an output profile correction unit to correct the output profile using the correction parameter.

7. 发明授权

US09611333B2 Methods for preparing alkali cellulose and cellulose ether 有权
公开(公告)号：US09611333B2
公开(公告)日：2017-04-04
申请号：US11615367
申请日：2006-12-22
申请人： Mitsuo Narita , Masaki Tabata , Atsushi Yoshida , Hiroshi Umezawa
发明人： Mitsuo Narita , Masaki Tabata , Atsushi Yoshida , Hiroshi Umezawa
IPC分类号： C07H1/00 , C08B11/00 , C08B11/02 , C08B1/08 , C08B1/10 , C08B11/193
CPC分类号： C08B1/08 , C08B1/10 , C08B11/00 , C08B11/193
摘要： The invention is a method for efficiently preparing alkali cellulose having a uniform alkali distribution therein. More specifically, pulp and an excess alkali metal hydroxide solution are introduced continuously in a screw conveyor type contactor and brought into contact with each other in the screw conveyor type reactor. By changing at least one factor selected from the group consisting of a rotation speed of the screw conveyor, a screw pitch and a length of immersion zone, a ratio of an alkali to cellulose in the alkali cellulose obtained by draining is controlled. The alkali cellulose thus obtained is etherified into the corresponding cellulose ether.

8. 发明授权

US09144979B2 Liquid absorbing material, cap device and liquid ejecting apparatus 有权
标题翻译：液体吸收材料，盖装置和液体喷射装置
公开(公告)号：US09144979B2
公开(公告)日：2015-09-29
申请号：US12178221
申请日：2008-07-23
申请人： Atsushi Yoshida , Shinichi Kamoshida
发明人： Atsushi Yoshida , Shinichi Kamoshida
IPC分类号： B41J2/165
CPC分类号： B41J2/16523 , B41J2/16532
摘要： A liquid absorbing material, being provided in a liquid ejecting apparatus having a liquid ejecting head for ejecting liquid from nozzle openings formed on a nozzle forming surface, and being able to come into abutment with the liquid ejecting head so as to cover the nozzle openings and being stored in a cap having a discharge channel for discharging the liquid in the interior thereof, includes a body portion to be arranged in the cap when being stored in the cap, and a projecting portion arranged in the discharge channel.
摘要翻译：一种液体吸收材料，其设置在具有用于从形成在喷嘴形成表面上的喷嘴开口喷出液体的液体喷射头的液体喷射装置中，并且能够与液体喷射头抵接以覆盖喷嘴开口，存储在具有用于在其内部排出液体的排出通道的盖中，包括当被存储在盖中时要布置在盖中的主体部分和布置在排出通道中的突出部分。

9. 发明授权

US09076369B2 Image modulation apparatus, method, and program 有权
标题翻译：图像调制装置，方法和程序
公开(公告)号：US09076369B2
公开(公告)日：2015-07-07
申请号：US13754968
申请日：2013-01-31
申请人： Atsushi Yoshida
发明人： Atsushi Yoshida
IPC分类号： G09G5/02 , G06F3/14 , G09G5/00
CPC分类号： G09G5/02 , G06F3/1454 , G09G5/003 , G09G2320/0693 , G09G2370/022 , G09G2370/042
摘要： An image modulation apparatus includes a device information obtaining unit to obtain device property information of a plurality of display devices respectively disposed at a plurality of image distribution destination apparatuses; a simulated image generator to generate a simulated image to be displayed on each of the display devices disposed at each of the image distribution destination apparatuses based on a distribution target image, to be transmitted to each of the image distribution destination apparatuses, and the device property information of each of the display devices obtained by the device information obtaining unit; and an image modulation unit to modulate the distribution target image based on a modulation instruction prepared for the plurality of the simulated images simulated by the simulated image generator.
摘要翻译：图像调制装置包括：设备信息获取单元，用于获得分别设置在多个图像分发目的地设备上的多个显示设备的设备属性信息; 模拟图像生成器，用于生成待发送到每个图像分发目的地设备的基于分发对象图像而在每个图像分发目的地设备上设置的每个显示设备上显示的模拟图像，以及设备属性由设备信息获取单元获得的每个显示设备的信息; 以及图像调制单元，用于基于由模拟图像生成器模拟的多个模拟图像准备的调制指令来调制分布对象图像。

10. 发明授权

US08979615B2 Polishing apparatus and polishing method 有权
标题翻译：抛光设备和抛光方法
公开(公告)号：US08979615B2
公开(公告)日：2015-03-17
申请号：US13308857
申请日：2011-12-01
申请人： Masaya Seki , Tetsuji Togawa , Masayuki Nakanishi , Naoki Matsuda , Atsushi Yoshida
发明人： Masaya Seki , Tetsuji Togawa , Masayuki Nakanishi , Naoki Matsuda , Atsushi Yoshida
IPC分类号： B24B21/04 , B24B9/06 , B24B21/00
CPC分类号： B24B21/002 , B24B9/065 , B24B21/004 , B24B21/006 , B24B21/008 , B24B21/20
摘要： The polishing apparatus has a polishing unit capable of polishing a peripheral portion of the substrate to form a right-angled cross section. The polishing apparatus includes: a substrate holder that holds and rotates the substrate; guide rollers that support a polishing tape; and a polishing head having a pressing member that presses an edge of the polishing tape against the peripheral portion of the substrate from above. The guide rollers are arranged such that the polishing tape extends parallel to a tangential direction of the substrate and a polishing surface of the polishing tape is parallel to a surface of the substrate. The substrate holder includes: a holding stage that holds the substrate; and a supporting stage that supports a lower surface of the peripheral portion of the substrate in its entirety. The supporting stage rotates in unison with the holding stage.
摘要翻译：抛光装置具有能够抛光基板的周边部分以形成直角横截面的抛光单元。抛光装置包括：保持和旋转衬底的衬底保持器; 支撑抛光带的导辊; 以及抛光头，其具有从上方将研磨带的边缘压靠在基板的周边部分的按压部件。引导辊布置成使得抛光带平行于基板的切线方向延伸，并且抛光带的抛光表面平行于基板的表面。基板保持器包括：保持基板的保持台; 以及支撑台，其整体地支撑基板的周边部分的下表面。支撑台与保持台一致地旋转。

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