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    • 1. 发明授权
    • Method and an apparatus for the treatment of components by a gas mixture
    • 用于通过气体混合物处理组分的方法和装置
    • US5938866A
    • 1999-08-17
    • US973650
    • 1998-03-25
    • Goran AnderssonAnte BrunskogTore ErikssonTorsten HolmTorgny Wingbro
    • Goran AnderssonAnte BrunskogTore ErikssonTorsten HolmTorgny Wingbro
    • C21D1/613C21D1/767C21D1/773C21D9/00
    • C21D9/0062C21D1/613C21D1/767C21D1/773
    • An apparatus for the treatment of components by means of a gas mixture, comprising mainly a first light gas and minor amounts of a second gas being heavier than the first gas, has a treatment chamber (10) in which the treatment occurs and a concentration, and purification device (19, 29, 30) in which the gas mixture is concentrated and purified to increase the concentration of the first gas. The treatment chamber (10) comprises an outlet member (19) provided in an upper part of the treatment chamber (10) and means (14, 15) being arranged to move the gas mixture upwardly and out through the outlet member (19). Said means may comprise an inlet member (14) provided in a lower part of the treatment chamber (10) and arranged to supply additional gas and to admit a laminar inward flow of said additional gas.
    • PCT No.PCT / SE96 / 00743 Sec。 371日期:1998年3月25日 102(e)1998年3月25日PCT PCT 1996年6月5日PCT公布。 出版物WO97 / 00974 日期1997年1月9日一种用于通过气体混合物处理组分的装置,其主要包括第一轻质气体和少量比第一气体重的第二气体,其具有处理室(10),处理室 发生浓缩和净化装置(19,29,30),其中气体混合物被浓缩和净化以增加第一气体的浓度。 处理室(10)包括设置在处理室(10)的上部的出口构件(19)和布置成使气体混合物向上并通过出口构件(19)移出的装置(14,15)。 所述装置可包括设置在处理室(10)下部的入口构件(14),并布置成供应附加气体并允许所述附加气体的层流向内流动。