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    • 10. 发明申请
    • PHOTOMASK DATA PROCESSING METHOD, PHOTOMASK DATA PROCESSING SYSTEM AND MANUFACTURING METHOD
    • 光电数据处理方法,光电数据处理系统和制造方法
    • US20090228860A1
    • 2009-09-10
    • US12401252
    • 2009-03-10
    • Tomoyuki OKADA
    • Tomoyuki OKADA
    • G06F17/50
    • G03F1/36
    • A computer-implemented method, of processing design data to obtain photomask data, includes: selecting, amongst design data, data representing a first cell; selecting a first area in said first cell for which a configuration of a corresponding first pattern is influenced by patterns arranged outward relative to said first cell area; selecting a second area other than said first area in said first cell; constructing a hierarchical structure for said data representing said first cell area that includes said first area and said second area; subjecting the first area to optical proximity correction on the basis of a relationship between the first pattern and the patterns arranged around said first cell area; performing optical proximity correction in said second area on the basis of the first pattern; and synthesizing the corrected first area and the corrected second area, according to the hierarchical structure, to obtain photomask data.
    • 一种处理设计数据以获得光掩模数据的计算机实现的方法,包括:在设计数​​据中选择表示第一小区的数据; 选择所述第一单元中的相对应的第一图案的配置受到相对于所述第一单元格区域向外布置的图案的影响的第一区域; 选择所述第一小区中除所述第一区域之外的第二区域; 为表示包括所述第一区域和所述第二区域的所述第一单元区域的所述数据构造分层结构; 基于所述第一图案与布置在所述第一单元区域周围的图案之间的关系对所述第一区域进行光学邻近校正; 基于第一图案在所述第二区域中执行光学邻近校正; 以及根据层次结构合成校正的第一区域和校正的第二区域,以获得光掩模数据。