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1. 发明授权

US08618568B2 Method for manufacturing light-emitting device and film formation substrate 有权
标题翻译：制造发光元件及成膜基板的方法
公开(公告)号：US08618568B2
公开(公告)日：2013-12-31
申请号：US13259378
申请日：2010-04-08
申请人： Tomoya Aoyama , Kohei Yokoyama , Rena Tsuruoka , Hideki Uchida , Toru Sonoda , Satoshi Inoue
发明人： Tomoya Aoyama , Kohei Yokoyama , Rena Tsuruoka , Hideki Uchida , Toru Sonoda , Satoshi Inoue
IPC分类号： H01L33/00
CPC分类号： H01L51/0013 , C23C14/048 , H01L51/56
摘要： In a method for manufacturing a light-emitting device according to an embodiment of the present invention, one surface of a first substrate including a reflective layer including an opening, a light absorption layer formed over the reflective layer to cover the opening in the reflective layer, a protective layer formed over the light absorption layer and including a groove at a position overlapped with the opening in the reflective layer, and a material layer formed over the protective layer and a deposition surface of a second substrate are disposed to face each other and light irradiation is performed from the other surface side of the first substrate, so that an EL layer is formed in a region on the deposition surface of the second substrate, which is overlapped with the opening in the reflective layer.
摘要翻译：在本发明的实施方式的发光装置的制造方法中，具有包括开口部的反射层的第一基板的一个面，形成在反射层上的光吸收层覆盖反射层的开口部形成在所述光吸收层上并且在与所述反射层中的所述开口重叠的位置处的凹槽以及形成在所述保护层上方的材料层和所述第二基板的沉积表面上的保护层设置成彼此面对，从第一基板的另一表面侧进行光照射，从而在第二基板的沉积表面上与反射层中的开口重叠的区域中形成EL层。

2. 发明申请

US20120012883A1 METHOD FOR MANUFACTURING LIGHT-EMITTING DEVICE AND FILM FORMATION SUBSTRATE 有权
标题翻译：用于制造发光器件和膜形成衬底的方法
公开(公告)号：US20120012883A1
公开(公告)日：2012-01-19
申请号：US13259378
申请日：2010-04-08
申请人： Tomoya Aoyama , Kohei Yakoyama , Rena Tsuruoka , Hideki Uchida , Toru Sonoda , Satoshi Inoue
发明人： Tomoya Aoyama , Kohei Yakoyama , Rena Tsuruoka , Hideki Uchida , Toru Sonoda , Satoshi Inoue
IPC分类号： H01L33/46 , H01L33/60
CPC分类号： H01L51/0013 , C23C14/048 , H01L51/56
摘要： In a method for manufacturing a light-emitting device according to an embodiment of the present invention, one surface of a first substrate including a reflective layer including an opening, a light absorption layer formed over the reflective layer to cover the opening in the reflective layer, a protective layer formed over the light absorption layer and including a groove at a position overlapped with the opening in the reflective layer, and a material layer formed over the protective layer and a deposition surface of a second substrate are disposed to face each other and light irradiation is performed from the other surface side of the first substrate, so that an EL layer is formed in a region on the deposition surface of the second substrate, which is overlapped with the opening in the reflective layer.
摘要翻译：在本发明的实施方式的发光装置的制造方法中，具有包括开口部的反射层的第一基板的一个面，形成在反射层上的光吸收层覆盖反射层的开口部形成在所述光吸收层上并且在与所述反射层中的所述开口重叠的位置处的凹槽以及形成在所述保护层上方的材料层和所述第二基板的沉积表面上的保护层设置成彼此面对，从第一基板的另一表面侧进行光照射，从而在第二基板的沉积表面上与反射层中的开口重叠的区域中形成EL层。

3. 发明授权

US08900675B2 Deposition method and method for manufacturing deposition substrate 有权
标题翻译：用于制造沉积基板的沉积方法和方法
公开(公告)号：US08900675B2
公开(公告)日：2014-12-02
申请号：US13635227
申请日：2011-02-28
申请人： Takahiro Ibe , Tomoya Aoyama , Rena Tsuruoka , Satoshi Inoue , Tohru Sonoda
发明人： Takahiro Ibe , Tomoya Aoyama , Rena Tsuruoka , Satoshi Inoue , Tohru Sonoda
IPC分类号： B05D3/06 , H01L51/56 , C23C14/12 , C23C14/28 , H05B33/10 , H01L51/00 , C23C14/56 , H01L51/50
CPC分类号： H05B33/10 , C23C14/048 , C23C14/12 , C23C14/28 , C23C14/564 , H01L51/0027 , H01L51/5012 , H01L51/56
摘要： One embodiment of the present invention is a deposition method for forming a layer 13a containing a deposition material on a deposition target surface of a second substrate, comprising the steps of forming an absorbing layer 12 over one surface of a first substrate 11; forming a material layer 13 containing the deposition material over the absorbing layer; performing first heat treatment on the material layer from the other surface of the first substrate to a temperature lower than the sublimation temperature of the deposition material so as to remove an impurity 14 in the material layer 13; disposing the one surface of the first substrate and the deposition target surface of the second substrate to face each other; and performing second heat treatment on the material layer from the other surface of the first substrate.
摘要翻译：本发明的一个实施方案是用于在第二基底的沉积靶表面上形成含有沉积材料的层13a的沉积方法，包括以下步骤：在第一基底11的一个表面上形成吸收层12; 在吸收层上形成含有沉积材料的材料层13; 在所述材料层上从所述第一基板的另一表面进行第一热处理至低于所述沉积材料的升华温度的温度，以除去所述材料层13中的杂质14; 将第一基板的一个表面和第二基板的沉积目标表面布置成彼此面对; 以及从所述第一基板的另一表面对所述材料层进行第二热处理。

4. 发明授权

US09444051B2 Method of manufacturing light-emitting device, and evaporation donor substrate 有权
标题翻译：制造发光装置的方法和蒸发供体基板
公开(公告)号：US09444051B2
公开(公告)日：2016-09-13
申请号：US13442133
申请日：2012-04-09
申请人： Tomoya Aoyama , Yosuke Sato , Kohei Yokoyama , Rena Takahashi
发明人： Tomoya Aoyama , Yosuke Sato , Kohei Yokoyama , Rena Takahashi
IPC分类号： H01L51/00 , B41M5/382 , C23C14/04 , H01L51/50
CPC分类号： H01L51/0013 , B41M5/382 , B41M5/38242 , C23C14/048 , H01L51/0037 , H01L51/0052 , H01L51/0059 , H01L51/007 , H01L51/0078 , H01L51/5012 , H01L51/5048 , H01L51/5088 , Y10T428/24331 , Y10T428/31504
摘要： The present invention relates to a donor substrate and a method of manufacturing a light-emitting device. The donor substrate includes a reflective layer including an opening portion, a light absorption layer covering the opening portion of the reflective layer over the reflective layer, a heat insulating layer including an opening portion in a position overlapped with the opening portion of the reflective layer over the light absorption layer, and a material layer including a light-emitting material covering the opening portion of the heat insulating layer over the heat insulating layer. A target substrate and the donor substrate are disposed to face each other, and an EL layer is formed over the target substrate by performing light irradiation from a rear surface of the donor substrate.
摘要翻译：本发明涉及施主基板和制造发光器件的方法。供体衬底包括反射层，该反射层包括开口部分，覆盖反射层上的反射层的开口部分的光吸收层，隔热层，其包括与反射层的开口部分重叠的位置的开口部分，光吸收层，以及包含覆盖绝热层上的绝热层的开口部的发光材料的材料层。将靶基板和供体基板相对配置，通过从供体基板的背面进行光照射，在目标基板上形成EL层。

5. 发明授权

US08425974B2 Evaporation donor substrate and method for manufacturing light-emitting device 有权
标题翻译：蒸镀供体基板及其制造方法
公开(公告)号：US08425974B2
公开(公告)日：2013-04-23
申请号：US12272034
申请日：2008-11-17
申请人： Rena Takahashi , Yosuke Sato , Kohei Yokoyama , Tomoya Aoyama
发明人： Rena Takahashi , Yosuke Sato , Kohei Yokoyama , Tomoya Aoyama
IPC分类号： B05D5/12 , B41M5/40
CPC分类号： B32B3/10 , B32B3/12 , B32B3/30 , B32B7/12 , B32B15/043 , B32B15/08 , B32B27/281 , B32B27/304 , B32B27/308 , B32B27/34 , B32B27/36 , B32B2262/101 , B32B2307/206 , B32B2307/416 , B32B2457/20 , C23C14/048 , H01L51/0013 , Y10T428/24339
摘要： A first supporting substrate on a front surface of which a reflective layer having an opening is formed and a second supporting substrate on a front surface of which a light absorption layer patterned into island or stripe shapes and a material layer over the light absorption layer are formed are prepared, the first and second supporting substrates are disposed so that the opening of the reflective layer and the light absorption layer overlap with each other and the reflective layer is in contact with a back surface of the second supporting substrate, the second supporting substrate and a deposition target substrate are disposed so that the front surface of the second supporting substrate faces the deposition target substrate, and the material layer is attached to the deposition target substrate by irradiating the back surface of the first supporting substrate with light and by sublimating the material layer.
摘要翻译：在其表面上形成具有开口的反射层的第一支撑基板和在其表面上形成图案化为岛状或条形的光吸收层和在光吸收层上的材料层的第二支撑基板第一和第二支撑基板被布置成使得反射层和光吸收层的开口彼此重叠，并且反射层与第二支撑基板，第二支撑基板和第二支撑基板的背面接触设置沉积靶基板使第二支撑基板的前表面面向沉积靶基板，并且通过用光照射第一支撑基板的背面并通过升华材料将材料层附着到沉积靶基板层。

6. 发明授权

US08367152B2 Manufacturing method of light-emitting device 有权
标题翻译：发光装置的制造方法
公开(公告)号：US08367152B2
公开(公告)日：2013-02-05
申请号：US12054954
申请日：2008-03-25
申请人： Kohei Yokoyama , Hisao Ikeda , Yosuke Sato , Tomoya Aoyama , Takahiro Ibe , Yoshiharu Hirakata
发明人： Kohei Yokoyama , Hisao Ikeda , Yosuke Sato , Tomoya Aoyama , Takahiro Ibe , Yoshiharu Hirakata
IPC分类号： B05D5/12
CPC分类号： H01L51/0011 , H01L51/0003 , H01L51/0013 , H01L51/56
摘要： For a full-color flat panel display, demands for high definition, high aperture ratio and high reliability have been increasing. Therefore, increasing in the number of pixels and narrowing a pixel pitch have been major issues. According to the present invention, a layer including an organic compound is selectively formed with a light-exposure apparatus used in a photolithography technique without a resist mask. A material layer including a photopolymerization initiator, a material polymerized with the photopolymerization initiator, and an organic compound are formed on a plate, and then are exposed to light and selectively cured. A film-formation substrate is disposed so as to face the plate. The film-formation substrate or the material layer is heated so that the organic compound included in a region exposed to light or a region not exposed to light is evaporated to be selectively deposited on the surface of the film-formation substrate.
摘要翻译：对于全彩平板显示器，高清晰度，高开口率和高可靠性的要求越来越高。因此，增加像素数量和缩小像素间距是主要问题。根据本发明，使用不具有抗蚀剂掩模的光刻技术中使用的曝光装置选择性地形成包含有机化合物的层。在板上形成包含光聚合引发剂，与光聚合引发剂聚合的材料和有机化合物的材料层，然后曝光并选择性固化。成膜基板被设置成面对板。加热成膜基板或材料层，使得暴露于光的区域中包含的有机化合物或不暴露于光的区域被蒸发以选择性地沉积在成膜基板的表面上。

7. 发明申请

US20120251772A1 Method of Manufacturing Light-Emitting Device, and Evaporation Donor Substrate 有权
标题翻译：制造发光装置和蒸发供体基板的方法
公开(公告)号：US20120251772A1
公开(公告)日：2012-10-04
申请号：US13442133
申请日：2012-04-09
申请人： Tomoya Aoyama , Yosuke Sato , Kohei Yokoyama , Rena Takahashi
发明人： Tomoya Aoyama , Yosuke Sato , Kohei Yokoyama , Rena Takahashi
IPC分类号： H05B33/10 , B32B3/22 , B32B3/24
CPC分类号： H01L51/0013 , B41M5/382 , B41M5/38242 , C23C14/048 , H01L51/0037 , H01L51/0052 , H01L51/0059 , H01L51/007 , H01L51/0078 , H01L51/5012 , H01L51/5048 , H01L51/5088 , Y10T428/24331 , Y10T428/31504
摘要： The present invention relates to a donor substrate and a method of manufacturing a light-emitting device. The donor substrate includes a reflective layer including an opening portion, a light absorption layer covering the opening portion of the reflective layer over the reflective layer, a heat insulating layer including an opening portion in a position overlapped with the opening portion of the reflective layer over the light absorption layer, and a material layer including a light-emitting material covering the opening portion of the heat insulating layer over the heat insulating layer. A target substrate and the donor substrate are disposed to face each other, and an EL layer is formed over the target substrate by performing light irradiation from a rear surface of the donor substrate.
摘要翻译：本发明涉及施主基板和制造发光器件的方法。供体衬底包括反射层，该反射层包括开口部分，覆盖反射层上的反射层的开口部分的光吸收层，隔热层，其包括与反射层的开口部分重叠的位置的开口部分，光吸收层，以及包含覆盖绝热层上的绝热层的开口部的发光材料的材料层。将靶基板和供体基板相对配置，通过从供体基板的背面进行光照射，在目标基板上形成EL层。

8. 发明申请

US20090104835A1 Method of Manufacturing Light-Emitting Device, and Evaporation Donor Substrate 有权
标题翻译：制造发光装置和蒸发供体基板的方法
公开(公告)号：US20090104835A1
公开(公告)日：2009-04-23
申请号：US12254966
申请日：2008-10-21
申请人： Tomoya Aoyama , Yosuke Sato , Kohei Yokoyama , Rena Takahashi
发明人： Tomoya Aoyama , Yosuke Sato , Kohei Yokoyama , Rena Takahashi
IPC分类号： H01J9/00 , B32B9/00
CPC分类号： H01L51/0013 , B41M5/382 , B41M5/38242 , C23C14/048 , H01L51/0037 , H01L51/0052 , H01L51/0059 , H01L51/007 , H01L51/0078 , H01L51/5012 , H01L51/5048 , H01L51/5088 , Y10T428/24331 , Y10T428/31504
摘要： The present invention provides a method of manufacturing a light-emitting device and an evaporation donor substrate, by which the precision of patterning of an EL layer of each color can be improved in manufacture of a full color flat panel display using emission colors of red, green, and blue. A first substrate which includes a reflective layer including an opening portion, a heat insulating layer including an opening portion in a position overlapped with the opening portion of the reflective layer over the reflective layer, a light absorption layer covering the opening portion of the reflective layer and the opening portion of the heat insulating layer over the heat insulating layer, and a material layer over the light absorption layer is used. While one surface of the first substrate is disposed close to a deposition target surface of a second substrate, the first substrate is irradiated with light from the other surface of the first substrate. The irradiation light is absorbed in the light absorption layer in the position overlapped with the opening portion of the reflective layer to heat an evaporation material. The heated evaporation material is evaporated onto the second substrate.
摘要翻译：本发明提供一种制造发光器件和蒸发施主衬底的方法，通过该方法可以在使用红色发光颜色的全色平板显示器的制造中提高每种颜色的EL层的图案化精度，绿色和蓝色。 1.一种第一基板，包括具有开口部的反射层，在所述反射层上与所述反射层的开口部重叠的位置的开口部的绝热层，覆盖所述反射层的开口部的光吸收层隔热层上的绝热层的开口部分和光吸收层上的材料层。虽然第一基板的一个表面设置成靠近第二基板的沉积目标表面，但是第一基板被来自第一基板的另一个表面的光照射。照射光在与反射层的开口部分重叠的位置处吸收在光吸收层中以加热蒸发材料。加热的蒸发材料蒸发到第二基底上。

9. 发明授权

US09159923B2 Evaporation donor substrate, method for manufacturing the same, and method for manufacturing light-emitting device 有权
标题翻译：蒸镀供体基板及其制造方法以及发光装置的制造方法
公开(公告)号：US09159923B2
公开(公告)日：2015-10-13
申请号：US12338449
申请日：2008-12-18
申请人： Kohei Yokoyama , Yosuke Sato , Tomoya Aoyama , Rena Takahashi
发明人： Kohei Yokoyama , Yosuke Sato , Tomoya Aoyama , Rena Takahashi
IPC分类号： B05D5/12 , H01L51/00 , C23C14/04
CPC分类号： H01L51/0013 , C23C14/048 , Y10T428/24331
摘要： An evaporation donor substrate that makes it possible to evaporate only a desired evaporation material in the case of performing deposition by an evaporation method. Thus, the use efficiency of an evaporation material can be increased resulting in reduction in production cost, and further a film with high uniformity can be deposited. The evaporation donor substrate can be obtained by forming a reflective layer having an opening over a substrate, forming a thermal insulation layer having a light-transmitting property separately over the substrate and the reflective layer, forming a light absorption layer over the thermal insulation layer, and forming a material layer over the light absorption layer.
摘要翻译：蒸发供体衬底，其可以通过蒸发法进行沉积的情况下仅蒸发所需的蒸发材料。因此，可以提高蒸发材料的使用效率，从而降低生产成本，并且还可以沉积高均匀性的膜。可以通过在基板上形成具有开口的反射层，在基板和反射层上分别形成具有透光性的隔热层，在绝热层上形成光吸收层，并在光吸收层上形成材料层。

10. 发明授权

US08277871B2 Evaporation donor substrate and method for manufacturing light-emitting device 有权
标题翻译：蒸镀供体基板及其制造方法
公开(公告)号：US08277871B2
公开(公告)日：2012-10-02
申请号：US12254944
申请日：2008-10-21
申请人： Tomoya Aoyama , Yosuke Sato , Kohei Yokoyama , Rena Takahashi
发明人： Tomoya Aoyama , Yosuke Sato , Kohei Yokoyama , Rena Takahashi
IPC分类号： B05D5/06
CPC分类号： H05B33/10 , B32B7/02 , B32B2255/00 , B32B2307/302 , B32B2307/40 , B32B2307/416 , B32B2457/206 , C23C14/048 , C23C14/12 , C23C14/24 , C23C14/28 , C23C14/568 , H01L27/3211 , H01L51/0013 , H01L51/56 , Y10T428/24298 , Y10T428/24314 , Y10T428/24331
摘要： To provide an evaporation donor substrate which is used for deposition by an evaporation method and which allows reduction in manufacturing cost and high uniformity of a film which is deposited. In addition, to provide a method for manufacturing a light-emitting device using the evaporation donor substrate. The evaporation donor substrate includes a reflective layer having an opening which is formed over a substrate, a heat insulating layer having a light-transmitting property which is formed over the substrate and the reflective layer, a light absorption layer which is formed over the heat insulating layer; and a material layer which is formed over the light absorption layer.
摘要翻译：提供用于通过蒸发法沉积的并且允许降低制造成本和沉积的膜的高均匀性的蒸发供体基板。此外，提供一种使用该蒸发供体基板来制造发光装置的方法。蒸发供体基板包括具有形成在基板上的开口的反射层，形成在基板和反射层上的具有透光性的隔热层，形成在隔热层上的光吸收层层; 以及形成在光吸收层上的材料层。

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