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    • 8. 发明申请
    • Semiconductor device
    • 半导体器件
    • US20060097292A1
    • 2006-05-11
    • US11261531
    • 2005-10-31
    • Kazutoshi NakamuraTomoko MatsudaiNorio Yasuhara
    • Kazutoshi NakamuraTomoko MatsudaiNorio Yasuhara
    • H01L29/76
    • H01L29/0847H01L29/1045H01L29/42368H01L29/7835
    • A semiconductor device includes a second conductivity type layer selectively formed by changing impurity concentrations on a semiconductor substrate, a first conductivity type source region formed on the second conductivity type layer, a first conductivity type drain region formed on the second conductivity type layer apart from the first conductivity type source region, a gate electrode formed between the first conductivity type source region and the first conductivity type drain region across an insulation film, and a second conductivity type contact layer formed adjacent to the first conductivity type source region, wherein the second conductivity type layer in the source region side has a higher impurity concentration than the impurity concentration of the second conductivity type layer in the drain region side.
    • 半导体器件包括通过改变半导体衬底上的杂质浓度选择性地形成的第二导电类型层,形成在第二导电类型层上的第一导电型源极区,形成在第二导电类型层上的第一导电类型漏极区, 第一导电型源极区,形成在绝缘膜之间的第一导电型源极区域和第一导电型漏极区域之间的栅电极和与第一导电型源极区域相邻形成的第二导电型接触层,其中第二导电型源极区域 源极区侧的杂质浓度比漏区侧的第二导电型层的杂质浓度高。