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    • 10. 发明申请
    • High-frequency treatment apparatus
    • 高频治疗仪
    • US20070066976A1
    • 2007-03-22
    • US11601183
    • 2006-11-17
    • Tsuyoshi HayashidaKazunori TaniguchiShigeo NagayamaKazuya Hijii
    • Tsuyoshi HayashidaKazunori TaniguchiShigeo NagayamaKazuya Hijii
    • A61B18/14
    • A61B18/149A61B2018/1475A61B2218/002
    • According to the present invention, a high-frequency treatment apparatus includes: an electrode assembly electrically connected to the high-frequency generating unit for generating a high-frequency current, the assembly having at the distal end thereof a current-applying electrode for discharging the high-frequency current, the proximal end of the current-applying electrode being covered with a first insulating member; an insertion section receiving the electrode assembly such that the electrode assembly is movable in predetermined directions, the insertion section being located on the return side of the high-frequency current applied from the current-applying electrode; a liquid supply unit for supplying an irrigation liquid to the vicinity of the current-applying electrode; and a second insulating member for covering a predetermined area on the surface of base part of the current-applying electrode, the base part being exposed from the distal end of the first insulating member.
    • 根据本发明,高频处理装置包括:电连接到高频发生单元的电极组件,用于产生高频电流,该组件在其远端处具有电流施加电极,用于将 高频电流,电流施加电极的近端被第一绝缘构件覆盖; 插入部,其接收所述电极组件,使得所述电极组件能够沿预定方向移动,所述插入部位于从所述电流施加电极施加的所述高频电流的返回侧; 液体供应单元,用于将冲洗液体供应到电流施加电极附近; 以及第二绝缘构件,用于覆盖电流施加电极的基部的表面上的预定区域,所述基部从第一绝缘构件的远端露出。