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    • 2. 发明授权
      US07147936B2 Layer configuration with improved stability to sunlight exposure 有权
    • Layer configuration with improved stability to sunlight exposure
    • 层状结构具有改善的阳光照射的稳定性
    • US07147936B2
    • 2006-12-12
    • US10642933
    • 2003-08-18
    • Frank Louwet , Geert Van Dyck , Johan Loccufier , Bert Groenendaal , Hieronymus Andriessen
    • Frank Louwet , Geert Van Dyck , Johan Loccufier , Bert Groenendaal , Hieronymus Andriessen
    • C07D211/021 , H01L51/50
    • C08G61/126 , C08L25/08 , C08L2666/06 , C09J165/00 , H01G11/48 , H01G11/56 , Y02E60/13 , Y10S428/917
    • A layer configuration on a support, the layer configuration comprising a layer containing a polymer containing optionally substituted 3,4-alkylenedioxythiophene structural units, in which the two alkoxy groups may be the same or different or together represent an optionally substituted oxy-alkylene-oxy bridge, and a compound selected from the group consisting of polyphosphoric acids, polyphosphoric acid salts, thia-alkanedicarboxylic acids, cyclohexadiene compounds and polyhydroxy-compounds selected from the group consisting of tetronic acid derivatives; ortho-dihydroxybenzene compounds with at least one sulpho group, compounds according to formula (I): HO—CH2—CH(OH)—(CH2)m—S—CH2—C(R1)(R2)—CH2—S—(CH2)n—CH(OH)—CH2—OH  (I) wherein R1 and R2 are independently H, —OH or alkyl, and n and m are independently 1, 2 or 3; compounds according to formula (II): HO—(CH2)p—S—CH2—S—(CH2)q—OH  (II) wherein p and q are independently 2, 3 or 4; compounds hydrolyzable to tetronic acid derivatives; compounds hydrolyzable to compounds according to formula (I); and sulpho-substituted 2-thia-alkyl-benzimidazole compounds.
    • 在支撑体上的层构型，该层构型包括含有含有任选取代的3,4-亚烷基二氧噻吩结构单元的聚合物的层，其中两个烷氧基可以相同或不同，或一起代表任选取代的氧基 - 桥，以及选自多磷酸，多磷酸盐，硫杂烷二羧酸，环己二烯化合物和选自由以下组成的组的多羟基化合物的化合物：四氢酸衍生物; 具有至少一个磺酸基的邻二羟基苯化合物，根据式（I）的化合物：<？in-line-formula description =“In-line formula”end =“lead”？> HO-CH 2 -CH（OH） - （CH 2 CH 2）m -S- CH 2 -C（R 1） （R 2） - CH 2 -S-（CH 2）n - （CH 2）n - （CH 2） -CH 2 -O-OH（I）<β在线公式描述=“在线式”末端=“尾”→其中R 1和R 2， SUP> 2独立地是H，-OH或烷基，n和m独立地是1,2或3; 根据式（II）的化合物：<？in-line-formula description =“In-line Formulas”end =“lead”？> HO-（CH 2） > -S-CH 2 -S-（CH 2）2 -O-OH（II）<β在线配方说明书=“ 其中p和q独立地为2,3或4; 可水解成四氢酸衍生物的化合物; 可水解成根据式（I）的化合物的化合物的化合物; 和磺基取代的2-硫代 - 烷基 - 苯并咪唑化合物。
    • 基本信息 添加关注 加入工作空间 PDF全文 PDF下载 全文下载 相似专利 双屏查看 权利要求书 说明书全文 Espacenet 法律信息 同族专利 专利引用
    • 3. 发明申请
      US20070105041A1 Lithographic printing plate comprising bi-functional compounds 有权
    • Lithographic printing plate comprising bi-functional compounds
    • 含有双功能化合物的平版印刷版
    • US20070105041A1
    • 2007-05-10
    • US11546830
    • 2006-10-12
    • Johan Loccufier , Hieronymus Andriessen
    • Johan Loccufier , Hieronymus Andriessen
    • G03C1/00
    • B41C1/1041
    • A heat-sensitive lithographic printing plate precursor comprising on a grained and anodized aluminum support a compound which is capable of converting form a hydrophobic state to a hydrophilic state or vice versa upon exposure to heat, and is represented by the following formula: A-(L)n-Bwherein L represents a linking group, n represents 0 or 1 and B represents a thermo-labile group; characterized in that the compound further comprises the group A which is a functional group capable of interacting with the surface of a grained and anodized aluminum support and is selected from the list consisting of a halosilanyl group, an alkoxysilanyl group, a phosphonic acid group or a salt thereof, a phosphoric acid group or a salt thereof, a salicylic acid group or a salt thereof, a boronic acid group or an ester or a salt thereof, an optionally substituted di or tri-hydroxyaryl group, an optionally substituted salicaldoxime group, an optionally substituted salicaldimine group, an optionally substituted hydroxyheteroaryl group, an amidine group, a 1,3-dicarbonyl group or a group represented by the formula (i) wherein Q and Z independently represent the necessary atoms to form an optionally substituted five or six membered aromatic or heteroaromatic ring.
    • 包含在颗粒和阳极氧化的铝上的热敏平版印刷版前体包含能够在暴露于热时将其形成疏水状态或反之亦然的化合物，并且由下式表示： -line-formula description =“In-line Formulas”end =“lead”？> A-（L） -B <？in-line-formula description =“In-line Formulas”end =“尾”→其中L表示连接基，n表示0或1，B表示热不稳定基团; 其特征在于，所述化合物还包含基团A，其是能够与粒状和阳极氧化的铝载体的表面相互作用的官能团，并且选自卤代西兰基，烷氧基硅烷基，膦酸基或 其盐，磷酸基或其盐，水杨酸基或其盐，硼酸基或其酯或其盐，任选取代的二或三羟基芳基，任选取代的salicaldoxime基团， 任选取代的水杨基，任选取代的羟基杂芳基，脒基，1,3-二羰基或由式（ⅰ）表示的基团，其中Q和Z独立地表示必要的原子以形成任选被取代的五或六元 芳族或杂芳族环。
    • 基本信息 添加关注 加入工作空间 PDF全文 PDF下载 全文下载 相似专利 双屏查看 权利要求书 说明书全文 Global Dossier Espacenet 法律信息 同族专利 专利引用
    • 4. 发明授权
      US08313885B2 Lithographic printing plate precursor comprising bi-functional compounds 有权
    • Lithographic printing plate precursor comprising bi-functional compounds
    • 含有双功能化合物的平版印刷版前体
    • US08313885B2
    • 2012-11-20
    • US11546830
    • 2006-10-12
    • Johan Loccufier , Hieronymus Andriessen
    • Johan Loccufier , Hieronymus Andriessen
    • G03F7/00 , G03F7/26
    • B41C1/1041
    • A heat-sensitive lithographic printing plate precursor comprising on a grained and anodized aluminum support a compound which is capable of converting form a hydrophobic state to a hydrophilic state or vice versa upon exposure to heat, and is represented by the following formula: A-(L)n-B wherein L represents a linking group, n represents 0 or 1 and B represents a thermo-labile group; characterized in that the compound further comprises the group A which is a functional group capable of interacting with the surface of a grained and anodized aluminum support and is selected from the list consisting of a halosilanyl group, an alkoxysilanyl group, a phosphonic acid group or a salt thereof, a phosphoric acid group or a salt thereof, a salicylic acid group or a salt thereof, a boronic acid group or an ester or a salt thereof, an optionally substituted di or tri-hydroxyaryl group, an optionally substituted salicaldoxime group, an optionally substituted salicaldimine group, an optionally substituted hydroxyheteroaryl group, an amidine group, a 1,3-dicarbonyl group or a group represented by the formula (i) wherein Q and Z independently represent the necessary atoms to form an optionally substituted five or six membered aromatic or heteroaromatic ring.
    • 包含在颗粒和阳极氧化铝上的热敏平版印刷版原版支持能够在暴露于热后将其形成疏水状态或反之亦然的化合物，并由下式表示：A-（ L）nB其中L表示连接基团，n表示0或1，B表示热不稳定基团; 其特征在于，所述化合物还包含基团A，其是能够与粒状和阳极氧化的铝载体的表面相互作用的官能团，并且选自卤代西兰基，烷氧基硅烷基，膦酸基或 其盐，磷酸基或其盐，水杨酸基或其盐，硼酸基或其酯或其盐，任选取代的二或三羟基芳基，任选取代的salicaldoxime基团， 任选取代的水杨基，任选取代的羟基杂芳基，脒基，1,3-二羰基或由式（ⅰ）表示的基团，其中Q和Z独立地表示必要的原子以形成任选被取代的五或六元 芳族或杂芳族环。
    • 基本信息 添加关注 加入工作空间 PDF全文 PDF下载 全文下载 相似专利 双屏查看 权利要求书 说明书全文 Espacenet 法律信息 同族专利 专利引用
    • 6. 发明授权
      US07097961B2 Stabilizers for use in substantially light-insensitive thermographic recording materials 有权
    • Stabilizers for use in substantially light-insensitive thermographic recording materials
    • US07097961B2
    • 2006-08-29
    • US11127645
    • 2005-05-12
    • Frank Louwet , Johan Loccufier
    • Frank Louwet , Johan Loccufier
    • G03C1/494 , G03C1/34
    • G03C1/4989 , G03C1/49845 , Y10S430/165 , Y10S430/166
    • A substantially light-insensitive black and white monosheet thermographic recording material comprising a support and a thermosensitive element, said thermosensitive element containing a substantially light-insensitive organic silver salt, an organic reducing agent therefor in thermal working relationship therewith, at least one binder and at least one stabilizer represented by formula (I): wherein R1, R2, R3 and R4 are independently selected from the group consisting of a hydrogen atom, halogen atoms and aliphatic, alkoxy, nitro, acyl, sulfonyl, nitrile, alkaryl, aryl, amino, thioalkyl, aldehyde, urea, —O—(C═O)-alkyl, —O—(C═O)-aryl, —O—(C═O)—O-alkyl, —O—(C═O)—O-aryl, —NH—(C═O)-alkyl, —NH—(C═O)-aryl, —(C═O)—NH-alkyl, —(C═O)—NH-aryl, —NH—(SO2)-alkyl, —NH—(SO2)-aryl, —(SO2)—NH-alkyl, —(SO2)—NH-aryl groups; X is represented by -A(-M)n or is selected from the group consisting of substituted aliphatic groups, unsubstituted aliphatic groups, substituted cycloaliphatic groups, unsubstituted cycloaliphatic groups, substituted aromatic groups and unsubstituted aromatic groups where in each of said groups one or more of the chain or ring carbon atoms may be substituted by one of more atoms selected from the group consisting of S, O, Si, N and P atoms; n is 2, 3 or 4; A is selected from the group consisting of substituted aliphatic groups, unsubstituted aliphatic groups, substituted cycloaliphatic groups, unsubstituted cycloaliphatic groups, substituted aromatic groups and unsubstituted aromatic groups where in each of said groups one or more of the chain or ring carbon atoms may be substituted by one of more atoms selected from the group consisting of S, O, Si, N and P atoms; each (-M) is independently a substituted or unsubstituted group selected from the group consisting of -(2-S-imidazole) groups and -(2-S-imidazole) groups annelated with an aromatic ring system, the optional substituents for -M being selected from the group consisting of halogen atoms and aliphatic, alkoxy, nitro, acyl, sulfonyl, nitrile, alkaryl and aryl groups.
    • 基本信息 添加关注 加入工作空间 PDF全文 PDF下载 全文下载 相似专利 双屏查看 权利要求书 说明书全文 Espacenet 法律信息 同族专利 专利引用
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