会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明授权
    • Laser discharge chamber passivation by plasma
    • 激光放电室通过等离子体钝化
    • US06644324B1
    • 2003-11-11
    • US09518970
    • 2000-03-06
    • Tom A. WatsonRichard L. SandstromRichard G. MortonRobert E. WeeksJohn P. QuitterMark R. Lewis
    • Tom A. WatsonRichard L. SandstromRichard G. MortonRobert E. WeeksJohn P. QuitterMark R. Lewis
    • B08B704
    • B82Y10/00B08B7/0035B08B7/0042G03F7/70025H01J37/32862H01S3/036H01S3/225
    • Methods and apparatus are provided for cleaning and passivating laser discharge chambers with plasmas. In one embodiment, an oxygen based plasma is formed in a plasma source external to the laser discharge chamber by applying a radiofrequency signal to oxygen containing gases. The oxygen based plasma is drawn into the laser discharge chamber, where it reacts with contaminants and cleans internal surfaces. After cleaning, a fluorine based plasma is formed in the plasma source and drawn into the laser discharge chamber to passivate internal surfaces. In another embodiment, cleaning with the oxygen based plasma is not used since some level of cleaning is accomplished with the fluorine based plasma. In another embodiment, oxygen based plasmas and fluorine based plasmas are formed in the laser discharge chamber by applying a radiofrequency signal to a laser discharge chamber electrode. Plasma cleaning and passivation of laser discharge chambers is safer, more efficient, and more effective than conventional thermal cleaning and passivation processes.
    • 提供了用等离子体清洗和钝化激光放电室的方法和装置。 在一个实施例中,通过对含氧气体施加射频信号,在激光放电室外部的等离子体源中形成氧基等离子体。 氧基等离子体被吸入激光放电室,在其中与污染物反应并清洗内表面。 在清洁之后,在等离子体源中形成氟基等离子体并被吸入激光放电室以钝化内表面。 在另一个实施例中,不使用基于氧的等离子体的清洁,因为用氟基等离子体进行一些清洁水平。 在另一个实施例中,通过向激光放电室电极施加射频信号,在激光放电室中形成氧基等离子体和基于氟的等离子体。 激光放电室的等离子体清洁和钝化比传统的热清洗和钝化工艺更安全,更有效,更有效。
    • 4. 发明申请
    • HIGH STABILITY REFLECTIVE ELEMENT MOUNT
    • 高稳定性反射元件安装
    • US20120057254A1
    • 2012-03-08
    • US13221721
    • 2011-08-30
    • David F. ArnoneKen WallaceMichael PushkarskyJason SensibaughBradley Charles SteeleBrian Jacob LongMark R. LewisGregory Hunt Gates
    • David F. ArnoneKen WallaceMichael PushkarskyJason SensibaughBradley Charles SteeleBrian Jacob LongMark R. LewisGregory Hunt Gates
    • G02B7/182
    • G02B7/1824
    • A beam director (360) for directing a beam (356, 358) comprises a director base (464), a reflective element (462), a base pivot (474A), an element pivot (470), and a first element fastener (468A). The director base (464) is positioned adjacent to a mounting base (226). A first interface between the director base (464) and the mounting base (226) is in a first interface plane that is orthogonal to a first axis. The base pivot (474A) provides a base pivot axis for selectively rotating the director base (464) and the reflective element (462) relative to the mounting base (226) about the first axis. The element pivot (470) guides the rotation of the reflective element (462) relative to the director base (464) about a second axis that is orthogonal to the first axis. The first element fastener (468A) is selectively movable between a locked position and an unlocked position to selectively inhibit rotation of the reflective element (462) relative to the director base (464) about the second axis. Additionally, the first element fastener (468A) moves along an axis that is orthogonal to the second axis during movement between the unlocked position and the locked position.
    • 用于引导光束(356,358)的光束指导器(360)包括导向器基部(464),反射元件(462),基部枢轴(474A),元件枢轴(470)和第一元件紧固件 468A)。 导向器基座(464)定位成与安装基座(226)相邻。 引导器基座(464)和安装基座(226)之间的第一接口处于与第一轴线正交的第一接口平面。 基部枢轴(474A)提供基部枢转轴线,用于围绕第一轴线相对于安装基座(226)选择性地旋转导向器基座(464)和反射元件(462)。 元件枢轴(470)围绕与第一轴正交的第二轴引导反射元件(462)相对于导向器基座(464)的旋转。 第一元件紧固件(468A)可选择性地在锁定位置和解锁位置之间移动,以选择性地禁止反射元件(462)相对于引导器基座(464)围绕第二轴线旋转。 另外,在解锁位置和锁定位置之间的运动期间,第一元件紧固件(468A)沿着与第二轴正交的轴线移动。